Patents by Inventor Ewoud Vreugdenhil
Ewoud Vreugdenhil has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 8017310Abstract: A method of providing a pattern on a substrate is disclosed. The method includes providing a layer of photoresist on the substrate, providing a layer of top coating over the layer of photoresist, lithographically exposing the photoresist layer and developing the photoresist to form a structure, covering the structure with a coating layer, inducing a chemical reaction between the photoresist and the coating layer, which reaction does not occur in the top coating, to form regions of modified coating layer, and removing unmodified coating layer to leave behind a patterned structure formed from the regions of modified coating layer.Type: GrantFiled: February 2, 2007Date of Patent: September 13, 2011Assignee: ASML Netherlands B.V.Inventors: Richard Franciscus Johannes Van Haren, Ewoud Vreugdenhil
-
Patent number: 7897058Abstract: A method of forming features, e.g. contact holes, at a higher density than is possible with conventional lithographic techniques involves forming an array of sacrificial positive features, conformally depositing a sacrificial layer so that negative features are formed interleaved with the positive features, directionally etching the sacrificial layer and removing the sacrificial features. The result is an array of holes at a higher density than the original sacrificial features. These may then be transferred into the underlying substrate using a desired process. Also, the method may be repeated to create arrays at even higher densities.Type: GrantFiled: May 17, 2006Date of Patent: March 1, 2011Assignees: ASML Netherlands B.V., ASML Holding NVInventors: Richard Johannes Franciscus Van Haren, Maurits Van Der Schaar, Ewoud Vreugdenhil, Harry Sewell
-
Patent number: 7889316Abstract: A multiple-die mask pattern is arranged with dies having the same pattern in mutually opposite orientations. The method for arranging the dies includes analyzing the pattern of a single die to identify a pattern characteristic property which is non uniformly distributed over the area of the die. If the distribution is found to be asymmetric, a line separating the die area into two half-die areas is defined with respect to which the asymmetry is apparent. Half-die areas of different dies with the same pattern characteristic property are grouped together in the mask pattern. The resulting enhanced symmetry of the distribution of the pattern characteristic property over the mask area increases lithographic processability and thereby improves die yield.Type: GrantFiled: May 15, 2006Date of Patent: February 15, 2011Assignee: ASML Netherlands B.V.Inventors: Wilhelmus Petrus De Boeij, Simon De Groot, Ewoud Vreugdenhil, Johannes Wilhelmus De Klerk
-
Patent number: 7507976Abstract: A beam directing element configured to receive a substantially collimated input beam of predetermined wavelength propagating in a first direction and to output a substantially collimated output beam in a second direction includes a prism formed of a transparent material and having input and output faces, wherein the internal angle between the input face and the output face is such that when the input beam is incident on the input face substantially at Brewster's angle, it is internally incident on the output face at Brewster's angle. The beam directing element is useful in lithography, for example in beam delivery systems.Type: GrantFiled: May 31, 2006Date of Patent: March 24, 2009Assignee: ASML Netherlands B.V.Inventors: Hako Botma, Ewoud Vreugdenhil, Joe Sakai
-
Publication number: 20080187845Abstract: A method of providing a pattern on a substrate is disclosed. The method includes providing a layer of photoresist on the substrate, providing a layer of top coating over the layer of photoresist, lithographically exposing the photoresist layer and developing the photoresist to form a structure, covering the structure with a coating layer, inducing a chemical reaction between the photoresist and the coating layer, which reaction does not occur in the top coating, to form regions of modified coating layer, and removing unmodified coating layer to leave behind a patterned structure formed from the regions of modified coating layer.Type: ApplicationFiled: February 2, 2007Publication date: August 7, 2008Applicant: ASML NETHERLANDS B. V.Inventors: Richard Johannes Franciscus Van Haren, Ewoud Vreugdenhil
-
Publication number: 20080067424Abstract: A beam directing element configured to receive a substantially collimated input beam of predetermined wavelength propagating in a first direction and to output a substantially collimated output beam in a second direction includes a prism formed of a transparent material and having input and output faces, wherein the internal angle between the input face and the output face is such that when the input beam is incident on the input face substantially at Brewster's angle, it is internally incident on the output face at Brewster's angle. The beam directing element is useful in lithography, for example in beam delivery systems.Type: ApplicationFiled: May 31, 2006Publication date: March 20, 2008Applicant: ASML Netherlands B.V.Inventors: Hako Botma, Ewoud Vreugdenhil, Joe Sakai
-
Publication number: 20070263190Abstract: A multiple-die mask pattern is arranged with dies having the same pattern in mutually opposite orientations. The method for arranging the dies includes analyzing the pattern of a single die to identify a pattern characteristic property which is non uniformly distributed over the area of the die. If the distribution is found to be asymmetric, a line separating the die area into two half-die areas is defined with respect to which the asymmetry is apparent. Half-die areas of different dies with the same pattern characteristic property are grouped together in the mask pattern. The resulting enhanced symmetry of the distribution of the pattern characteristic property over the mask area increases lithographic processability and thereby improves die yield.Type: ApplicationFiled: May 15, 2006Publication date: November 15, 2007Applicant: ASML Netherlands B.V.Inventors: Wilhelmus De Boeij, Simon De Groot, Ewoud Vreugdenhil, Johannes De Klerk
-
Publication number: 20070190762Abstract: A method of forming features, e.g. contact holes, at a higher density than is possible with conventional lithographic techniques involves forming an array of sacrificial positive features, conformally depositing a sacrificial layer so that negative features are formed interleaved with the positive features, directionally etching the sacrificial layer and removing the sacrificial features. The result is an array of holes at a higher density than the original sacrificial features. These may then be transferred into the underlying substrate using a desired process.Type: ApplicationFiled: February 13, 2006Publication date: August 16, 2007Applicant: ASML Netherlands B.V.Inventors: Richard Franciscus Van Haren, Maurits Schaar, Ewoud Vreugdenhil
-
Publication number: 20070187358Abstract: A method of forming features, e.g. contact holes, at a higher density than is possible with conventional lithographic techniques involves forming an array of sacrificial positive features, conformally depositing a sacrificial layer so that negative features are formed interleaved with the positive features, directionally etching the sacrificial layer and removing the sacrificial features. The result is an array of holes at a higher density than the original sacrificial features. These may then be transferred into the underlying substrate using a desired process. Also, the method may be repeated to create arrays at even higher densities.Type: ApplicationFiled: May 17, 2006Publication date: August 16, 2007Applicants: ASML NETHERLANDS B.V., ASML HOLDING N.V.Inventors: Richard Johannes Van Haren, Maurits Schaar, Ewoud Vreugdenhil, Harry Sewell
-
Patent number: 7130023Abstract: A lithographic projection apparatus includes a radiation system for providing a projection beam of radiation, a support structure for supporting a patterning device, the patterning device serving to pattern the projection beam according to a desired pattern, a substrate table for holding a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, an illumination system for conditioning the beam of radiation beam so as to provide a conditioned radiation beam so as to be able to illuminate said patterning means, and a beam delivery system including redirecting elements for redirecting and delivering the projection beam from the radiation system to the illumination system. The radiation beam is arranged to have a predetermined polarization state and the redirecting elements are arranged to provide a minimum radiation loss in relation to the predetermined polarization state of the radiation beam.Type: GrantFiled: December 10, 2003Date of Patent: October 31, 2006Assignee: ASML Netherlands B.V.Inventors: Hako Botma, Ewoud Vreugdenhil
-
Publication number: 20040150807Abstract: A lithographic projection apparatus comprising: a radiation system for providing a projection beam of radiation; a support structure for supporting patterning means, the patterning means serving to pattern the projection beam according to a desired pattern; a substrate table for holding a substrate; a projection system for projecting the patterned beam onto a target portion of the substrate; an illumination system for conditioning said beam of radiation beam so as to provide a conditioned radiation beam so as to be able to illuminate said patterning means; and a beam delivery system comprising redirecting elements for redirecting and delivering said projection beam from said radiation system to said illumination system. The radiation beam is arranged to have a predetermined polarization state and said redirecting elements are arranged to provide a minimum radiation loss in relation to said predetermined polarization state of said radiation beam.Type: ApplicationFiled: December 10, 2003Publication date: August 5, 2004Applicant: ASML NETHERLANDS B.V.Inventors: Hako Botma, Ewoud Vreugdenhil
-
Patent number: 6388402Abstract: Color picture display device comprising a cathode ray tube and a deflection unit. The picture display device comprises compensation means for compensating picture errors. The compensation means is arranged on a side of a deflection unit facing the display screen and comprises four magnet systems which are arranged fourfold symmetrically with respect to the tube axis and extend through an angle &agr; ranging between 24 and 34 degrees or between 40 and 48 degrees.Type: GrantFiled: October 7, 1999Date of Patent: May 14, 2002Assignee: U.S. Philips CorporationInventors: Marteijn De Jong, Ewoud Vreugdenhil, Jacobus H. T. Jamar
-
Patent number: 4771243Abstract: In a magnetic resonance imaging apparatus having a comparatively large measurement region, such as used for medical diagnosis, high-order contributions to the magnetic field are compensated for by the addition of pairs of rings made of a soft-magnetic material, so that the homogeneity of the magnetic field is locally increased to a high degree. This makes possible to use a substantially shorter coil while the field homogeneity in the measurement zone is still improved.Type: GrantFiled: August 1, 1986Date of Patent: September 13, 1988Assignee: U.S. Philips CorporationInventors: Ewoud Vreugdenhil, Franciscus F. Van Der Vlugt