Patents by Inventor F. Dan Gealy

F. Dan Gealy has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for reducing physisorption during atomic layer deposition
    Publication number: 20040244689
    Abstract: The present invention provides a method and apparatus for an atomic layer deposition process. The apparatus includes a chamber adapted to receive a first precursor gas, at least one surface interior to the chamber, and an acoustic wave driver coupled to the at least one surface and adapted to drive acoustic waves along the interior surface.
    Type: Application
    Filed: March 30, 2004
    Publication date: December 9, 2004
    Applicant: Micron Technology, Inc.
    Inventors: F. Dan Gealy, Cem Basceri
  • Method for reducing physisorption during atomic layer deposition
    Patent number: 6784083
    Abstract: The present invention provides a method and apparatus for an atomic layer deposition process. The apparatus includes a chamber adapted to receive a first precursor gas, at least one surface interior to the chamber, and an acoustic wave driver coupled to the at least one surface and adapted to drive acoustic waves along the interior surface.
    Type: Grant
    Filed: June 3, 2003
    Date of Patent: August 31, 2004
    Assignee: Micron Technology, Inc.
    Inventors: F. Dan Gealy, Cem Basceri