Patents by Inventor Fa-Cheng Wang

Fa-Cheng Wang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Alignment mark of mask
    Patent number: 7927768
    Abstract: A lithography mask is disclosed, comprising an alignment mark, including a first bar, a second bar crossing the first bar, and a specific pattern having different signatures with the first and second bars connecting to the second bar.
    Type: Grant
    Filed: October 2, 2008
    Date of Patent: April 19, 2011
    Assignee: VisEra Technologies Company Limited
    Inventors: Chih-Shen Fan, Li-Wei Chen, I-Chin Sung, Fa-Cheng Wang
  • ALIGNMENT MARK OF MASK
    Publication number: 20100086194
    Abstract: A lithography mask is disclosed, comprising an alignment mark, including a first bar, a second bar crossing the first bar, and a specific pattern having different signatures with the first and second bars connecting to the second bar.
    Type: Application
    Filed: October 2, 2008
    Publication date: April 8, 2010
    Inventors: Chih-Shen FAN, Li-Wei Chen, I-Chin Sung, Fa-Cheng Wang