Patents by Inventor Fa JI

Fa JI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Advanced in-situ particle detection system for semiconductor substrate processing systems
    Patent number: 10883932
    Abstract: An FI having an in-situ particle detector and a method for particle detection therein are provided. In one aspect, the FI includes a fan, a substrate support, a particle detector, and an exhaust outlet. The fan, substrate support, and particle detector are arranged such that, in operation, the fan directs air towards the exhaust outlet and over a substrate on the substrate support to create laminar flow. The particle detector, positioned downstream from the substrate support and upstream from the exhaust outlet, analyzes the air and detects particle concentration before the particles are exhausted. The collected particle detection data may be combined with data from other sensors in the FI and used to identify the source of particle contamination. The particle detector may also be incorporated into other system components, including but not limited to, a load-lock or buffer chamber to detect particle concentration therein.
    Type: Grant
    Filed: June 27, 2019
    Date of Patent: January 5, 2021
    Assignee: Applied Materials, Inc.
    Inventors: Lin Zhang, Xuesong Lu, Andrew V. Le, Fa Ji, Jang Seok Oh, Patrick L. Smith, Shawyon Jafari, Ralph Peter Antonio
  • ADVANCED IN-SITU PARTICLE DETECTION SYSTEM FOR SEMICONDUCTOR SUBSTRATE PROCESSING SYSTEMS
    Publication number: 20190323960
    Abstract: An FI having an in-situ particle detector and a method for particle detection therein are provided. In one aspect, the FI includes a fan, a substrate support, a particle detector, and an exhaust outlet. The fan, substrate support, and particle detector are arranged such that, in operation, the fan directs air towards the exhaust outlet and over a substrate on the substrate support to create laminar flow. The particle detector, positioned downstream from the substrate support and upstream from the exhaust outlet, analyzes the air and detects particle concentration before the particles are exhausted. The collected particle detection data may be combined with data from other sensors in the FI and used to identify the source of particle contamination. The particle detector may also be incorporated into other system components, including but not limited to, a load-lock or buffer chamber to detect particle concentration therein.
    Type: Application
    Filed: June 27, 2019
    Publication date: October 24, 2019
    Inventors: Lin ZHANG, Xuesong LU, Andrew V. LE, Fa JI, Jang Seok OH, Patrick L. SMITH, Shawyon JAFARI, Ralph Peter ANTONIO
  • Advanced in-situ particle detection system for semiconductor substrate processing systems
    Patent number: 10365216
    Abstract: An FI having an in-situ particle detector and a method for particle detection therein are provided. In one aspect, the FI includes a fan, a substrate support, a particle detector, and an exhaust outlet. The fan, substrate support, and particle detector are arranged such that, in operation, the fan directs air towards the exhaust outlet and over a substrate on the substrate support to create laminar flow. The particle detector, positioned downstream from the substrate support and upstream from the exhaust outlet, analyzes the air and detects particle concentration before the particles are exhausted. The collected particle detection data may be combined with data from other sensors in the FI and used to identify the source of particle contamination. The particle detector may also be incorporated into other system components, including but not limited to, a load-lock or buffer chamber to detect particle concentration therein.
    Type: Grant
    Filed: October 25, 2017
    Date of Patent: July 30, 2019
    Assignee: Applied Materials, Inc.
    Inventors: Lin Zhang, Xuesong Lu, Andrew V. Le, Fa Ji, Jang Seok Oh, Patrick L. Smith, Shawyon Jafari, Ralph Peter Antonio
  • ADVANCED IN-SITU PARTICLE DETECTION SYSTEM FOR SEMICONDUCTOR SUBSTRATE PROCESSING SYSTEMS
    Publication number: 20180156727
    Abstract: An FI having an in-situ particle detector and a method for particle detection therein are provided. In one aspect, the FI includes a fan, a substrate support, a particle detector, and an exhaust outlet. The fan, substrate support, and particle detector are arranged such that, in operation, the fan directs air towards the exhaust outlet and over a substrate on the substrate support to create laminar flow. The particle detector, positioned downstream from the substrate support and upstream from the exhaust outlet, analyzes the air and detects particle concentration before the particles are exhausted. The collected particle detection data may be combined with data from other sensors in the FI and used to identify the source of particle contamination. The particle detector may also be incorporated into other system components, including but not limited to, a load-lock or buffer chamber to detect particle concentration therein.
    Type: Application
    Filed: October 25, 2017
    Publication date: June 7, 2018
    Inventors: Lin ZHANG, Xuesong LU, Andrew V. LE, Fa JI, Jang Seok OH, Patrick L. SMITH, Shawyon JAFARI, Ralph Peter ANTONIO