Patents by Inventor Fabienne Judong

Fabienne Judong has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7476609
    Abstract: A method for forming, by dry etch, an opening of a given shape in a silica glass layer, the layer having a doping profile similar to the shape and the etch plasma being a non-carbonated fluorinated plasma causing a non-directional etching.
    Type: Grant
    Filed: October 27, 2006
    Date of Patent: January 13, 2009
    Assignee: STMicroelectronics S.A.
    Inventor: Fabienne Judong
  • Publication number: 20070098344
    Abstract: A method for forming, by dry etch, an opening of a given shape in a silica glass layer, the layer having a doping profile similar to the shape and the etch plasma being a non-carbonated fluorinated plasma causing a non-directional etching.
    Type: Application
    Filed: October 27, 2006
    Publication date: May 3, 2007
    Applicant: STMicroelectronics SA
    Inventor: Fabienne Judong