Patents by Inventor Fabio Zocchi

Fabio Zocchi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9057962
    Abstract: A source-collector module for an extreme ultraviolet (EUV) lithography system, the module including a laser-produced plasma (LPP) that generates EUV radiation and a grazing-incidence collector (GIC) mirror arranged relative thereto and having an input end and an output end. The LPP is formed using an LPP target system wherein a pulsed laser beam travels on-axis through the GIC and is incident upon solid, moveable LPP target. The GIC mirror is arranged relative to the LPP to receive the EUV radiation therefrom at its input end and focus the received EUV radiation at an intermediate focus adjacent the output end. An example GIC mirror design is presented that includes a polynomial surface-figure correction to compensate for GIC shell thickness effects, thereby improve far-field imaging performance.
    Type: Grant
    Filed: December 2, 2012
    Date of Patent: June 16, 2015
    Assignee: Media Lario S.R.L.
    Inventors: Natale M. Ceglio, Giovanni Nocerino, Fabio Zocchi
  • Patent number: 8895946
    Abstract: Source-collector modules for use with EUV lithography systems are disclosed, wherein the source-collector modules employ a laser-produced plasma EUV radiation source and a grazing-incidence collector. The EUV radiation source is generated by first forming an under-dense plasma, and then irradiating the under-dense plasma with infrared radiation of sufficient intensity to create a final EUV-emitting plasma. The grazing incidence collector can include a grating configured to prevent infrared radiation from reaching the intermediate focus. Use of debris mitigation devices preserves the longevity of operation of the source-collector modules.
    Type: Grant
    Filed: February 7, 2013
    Date of Patent: November 25, 2014
    Assignee: Media Lario S.R.L.
    Inventors: Natale M. Ceglio, Daniel Stearns, Jacques Kools, Giuseppe Valsecchi, Fabio Zocchi, Riccardo Binda
  • Patent number: 8746975
    Abstract: Systems, assemblies and methods for thermally managing a grazing incidence collector (GIC) for EUV lithography applications are disclosed. The GIC thermal management assembly includes a GIC mirror shell interfaced with a jacket to form a sealed chamber. An open cell, heat transfer (OCHT) material is disposed within the metal chamber and is thermally and mechanically bonded with the GIC mirror shell and jacket. A coolant is flowed in an azimuthally symmetric fashion through the OCHT material between input and output plenums to effectuate cooling when the GIC thermal management assembly is used in a GIC mirror system configured to receive and form collected EUV radiation from an EUV radiation source.
    Type: Grant
    Filed: January 23, 2012
    Date of Patent: June 10, 2014
    Assignee: Media Lario S.R.L.
    Inventors: Giovanni Bianucci, Fabio Zocchi, Robert Banham, Marco Pedrali, Boris Grek, Natale Ceglio, Dean Shough, Gordon Yue, Daniel Stearns, Richard A. Levesque, Giuseppe Valsecchi
  • Publication number: 20140152967
    Abstract: A source-collector module for an extreme ultraviolet (EUV) lithography system, the module including a laser-produced plasma (LPP) that generates EUV radiation and a grazing-incidence collector (GIC) mirror arranged relative thereto and having an input end and an output end. The LPP is formed using an LPP target system wherein a pulsed laser beam travels on-axis through the GIC and is incident upon solid, moveable LPP target. The GIC mirror is arranged relative to the LPP to receive the EUV radiation therefrom at its input end and focus the received EUV radiation at an intermediate focus adjacent the output end. An example GIC mirror design is presented that includes a polynomial surface-figure correction to compensate for GIC shell thickness effects, thereby improve far-field imaging performance.
    Type: Application
    Filed: December 2, 2012
    Publication date: June 5, 2014
    Inventors: Natale M. Ceglio, Giovanni Nocerino, Fabio Zocchi
  • Patent number: 8686381
    Abstract: A source-collector module (SOCOMO) for generating a laser-produced plasma (LPP) that emits EUV radiation, and a grazing-incidence collector (GIC) mirror arranged relative to the LPP and having an input end and an output end. The LPP is formed using an LPP target system having a light source portion and a target portion, wherein a pulsed laser beam from the light source portion irradiates Sn vapor from a Sn vapor source of the target portion. The GIC mirror is arranged relative to the LPP to receive the EUV radiation at its input end and focus the received EUV radiation at an intermediate focus adjacent the output end. A radiation collection enhancement device may be used to increase the amount of EUV radiation provided to the intermediate focus. An EUV lithography system that utilizes the SOCOMO is also disclosed.
    Type: Grant
    Filed: June 28, 2010
    Date of Patent: April 1, 2014
    Assignee: Media Lario S.R.L.
    Inventors: Richard Levesque, Natale M. Ceglio, Giovanni Nocerino, Fabio Zocchi
  • Patent number: 8594277
    Abstract: A collector optical system for EUV and X-ray applications is disclosed, wherein the system includes a plurality of mirrors arranged in a nested configuration that is symmetric about an optical axis. The mirrors have first and second reflective surfaces that provide successive grazing incidence reflections of radiation from a radiation source. The first and second reflective surfaces have a corrective shape that compensates for high spatial frequency variations in the far field intensity distribution of the radiation.
    Type: Grant
    Filed: January 28, 2009
    Date of Patent: November 26, 2013
    Assignee: Media Lario S.R.L.
    Inventors: Fabio Zocchi, Pietro Binda, Enrico Benedetti
  • Patent number: 8411815
    Abstract: Grazing incidence collectors (GICs) for extreme ultraviolet (EUV) and X-ray radiation sources, such as laser produced plasma (LPP) sources, are disclosed. Source-collector systems comprising GICs and LPP sources are also disclosed. A laser beam is directed along the collector axis to a fuel target to form the LPP source, and the collector is arranged to collect the radiation and reflect it to an intermediate focus. The collector may include one or more grazing-incidence mirrors, and these mirrors may be electroformed. lithography systems that employ the source-collector systems as disclosed herein.
    Type: Grant
    Filed: January 28, 2009
    Date of Patent: April 2, 2013
    Assignee: Media Lario, SRL
    Inventors: Ian Wallhead, Fabio Zocchi
  • Patent number: 8344339
    Abstract: A source-collector module (SOCOMO) for generating a laser-produced plasma (LPP) that emits EUV radiation, and a grazing-incidence collector (GIC) mirror arranged relative to the LPP and having an input end and an output end. The LPP is formed using an LPP target system having a light source portion and a target portion, wherein a pulsed laser beam from the light source portion irradiates a rotating Sn rod in the target portion to generate the EUV radiation. The GIC mirror is arranged relative to the LPP to receive the EUV radiation at its input end and focus the received EUV radiation at an intermediate focus adjacent the output end. A radiation collection enhancement device having at least one funnel element may be used to increase the amount of EUV radiation provided to the intermediate focus and/or directed to a downstream illuminator. An EUV lithography system that utilizes the SOCOMO is also disclosed.
    Type: Grant
    Filed: August 30, 2010
    Date of Patent: January 1, 2013
    Assignee: Media Lario S.R.L.
    Inventors: Richard A. Levesque, Natale M. Ceglio, Giovanni Nocerino, Fabio Zocchi
  • Patent number: 8330131
    Abstract: A source-collector module for an extreme ultraviolet (EUV) lithography system, the module including a laser-produced plasma (LPP) that generates EUV radiation and a grazing-incidence collector (GIC) mirror arranged relative thereto and having an input end and an output end. The LPP is formed using an LPP target system wherein a pulsed laser beam travels on-axis through the GIC and is incident upon solid, moveable LPP target. The GIC mirror is arranged relative to the LPP to receive the EUV radiation therefrom at its input end and focus the received EUV radiation at an intermediate focus adjacent the output end. An example GIC mirror design is presented that includes a polynomial surface-figure correction to compensate for GIC shell thickness effects, thereby improve far-field imaging performance.
    Type: Grant
    Filed: June 18, 2010
    Date of Patent: December 11, 2012
    Assignee: Media Lario, S.R.L.
    Inventors: Natale M. Ceglio, Giovanni Nocerino, Fabio Zocchi
  • Patent number: 8258485
    Abstract: A source-collector module (SOCOMO) for generating a laser-produced plasma (LPP) that emits EUV radiation, and a grazing-incidence collector (GIC) mirror arranged relative to the LPP and having an input end and an output end. The LPP is formed using an LPP target system having a light source portion and a target portion, wherein a pulsed laser beam from the light source portion irradiates Xenon liquid in the target portion. The GIC mirror is arranged relative to the LPP to receive the EUV radiation at its input end and focus the received EUV radiation at an intermediate focus adjacent the output end. A radiation collection enhancement device having at least one funnel element may be used to increase the amount of EUV radiation provided to the intermediate focus and/or directed to a downstream illuminator. An EUV lithography system that utilizes the SOCOMO is also disclosed.
    Type: Grant
    Filed: August 30, 2010
    Date of Patent: September 4, 2012
    Assignee: Media Lario SRL
    Inventors: Richard A. Levesque, Natale M. Ceglio, Giovanni Nocerino, Fabio Zocchi
  • Publication number: 20120212719
    Abstract: Systems, assemblies and methods for thermally managing a grazing incidence collector (GIC) for EUV lithography applications are disclosed. The GIC thermal management assembly includes a GIC mirror shell interfaced with a jacket to form a sealed chamber. An open cell, heat transfer (OCHT) material is disposed within the metal chamber and is thermally and mechanically bonded with the GIC mirror shell and jacket. A coolant is flowed in an azimuthally symmetric fashion through the OCHT material between input and output plenums to effectuate cooling when the GIC thermal management assembly is used in a GIC mirror system configured to receive and form collected EUV radiation from an EUV radiation source.
    Type: Application
    Filed: January 23, 2012
    Publication date: August 23, 2012
    Inventors: Giovanni Bianucci, Fabio Zocchi, Robert Banham, Marco Pedrali, Boris Grek, Natale Ceglio, Dean Shough, Daniel Stearns, Richard A. Levesque, Gordon Yue, Giuseppe Valsecchi
  • Publication number: 20120050704
    Abstract: A source-collector module (SOCOMO) for generating a laser-produced plasma (LPP) that emits EUV radiation, and a grazing-incidence collector (GIC) mirror arranged relative to the LPP and having an input end and an output end. The LPP is formed using an LPP target system having a light source portion and a target portion, wherein a pulsed laser beam from the light source portion irradiates Xenon liquid in the target portion. The GIC mirror is arranged relative to the LPP to receive the EUV radiation at its input end and focus the received EUV radiation at an intermediate focus adjacent the output end. A radiation collection enhancement device having at least one funnel element may be used to increase the amount of EUV radiation provided to the intermediate focus and/or directed to a downstream illuminator. An EUV lithography system that utilizes the SOCOMO is also disclosed.
    Type: Application
    Filed: August 30, 2010
    Publication date: March 1, 2012
    Inventors: Richard A. Levesque, Natale M. Ceglio, Giovanni Nocerino, Fabio Zocchi
  • Publication number: 20120050707
    Abstract: A source-collector module (SOCOMO) for generating a laser-produced plasma (LPP) that emits EUV radiation, and a grazing-incidence collector (GIC) mirror arranged relative to the LPP and having an input end and an output end. The LPP is formed using an LPP target system having a light source portion and a target portion, wherein a pulsed laser beam from the light source portion irradiates a Sn wire provided by the target portion. The GIC mirror is arranged relative to the LPP to receive the EUV radiation at its input end and focus the received EUV radiation at an intermediate focus adjacent the output end. A radiation collection enhancement device having at least one funnel element may be used to increase the amount of EUV radiation provided to the intermediate focus and/or directed to a downstream illuminator. An EUV lithography system that utilizes the SOCOMO is also disclosed.
    Type: Application
    Filed: August 30, 2010
    Publication date: March 1, 2012
    Inventors: Richard A. Levesque, Natale M. Ceglio, Giovanni Nocerino, Fabio Zocchi
  • Publication number: 20120050706
    Abstract: A source-collector module (SOCOMO) for generating a laser-produced plasma (LPP) that emits EUV radiation, and a grazing-incidence collector (GIC) mirror arranged relative to the LPP and having an input end and an output end. The LPP is formed using an LPP target system having a light source portion and a target portion, wherein a pulsed laser beam from the light source portion irradiates Xenon ice provided by the target portion to an irradiation location. The GIC mirror is arranged relative to the LPP to receive the EUV radiation at its input end and focus the received EUV radiation at an intermediate focus adjacent the output end. A radiation collection enhancement device having at least one funnel element may be used to increase the amount of EUV radiation provided to the intermediate focus and/or directed to a downstream illuminator. An EUV lithography system that utilizes the SOCOMO is also disclosed.
    Type: Application
    Filed: August 30, 2010
    Publication date: March 1, 2012
    Inventors: Richard A. Levesque, Natale M. Ceglio, Giovanni Nocerino, Fabio Zocchi
  • Publication number: 20120050708
    Abstract: A source-collector module (SOCOMO) for generating a laser-produced plasma (LPP) that emits EUV radiation, and a grazing-incidence collector (GIC) mirror arranged relative to the LPP and having an input end and an output end. The LPP is formed using an LPP target system having a light source portion and a target portion, wherein a pulsed laser beam from the light source portion irradiates a rotating Sn rod in the target portion to generate the EUV radiation. The GIC mirror is arranged relative to the LPP to receive the EUV radiation at its input end and focus the received EUV radiation at an intermediate focus adjacent the output end. A radiation collection enhancement device having at least one funnel element may be used to increase the amount of EUV radiation provided to the intermediate focus and/or directed to a downstream illuminator. An EUV lithography system that utilizes the SOCOMO is also disclosed.
    Type: Application
    Filed: August 30, 2010
    Publication date: March 1, 2012
    Inventors: Richard A. Levesque, Natale M. Ceglio, Glovanni Nocerino, Fabio Zocchi
  • Publication number: 20110318694
    Abstract: A source-collector module (SOCOMO) for generating a laser-produced plasma (LPP) that emits EUV radiation, and a grazing-incidence collector (GIC) mirror arranged relative to the LPP and having an input end and an output end. The LPP is formed using an LPP target system having a light source portion and a target portion, wherein a pulsed laser beam from the light source portion irradiates Sn vapor from a Sn vapor source of the target portion. The GIC mirror is arranged relative to the LPP to receive the EUV radiation at its input end and focus the received EUV radiation at an intermediate focus adjacent the output end. A radiation collection enhancement device may be used to increase the amount of EUV radiation provided to the intermediate focus. An EUV lithography system that utilizes the SOCOMO is also disclosed.
    Type: Application
    Filed: June 28, 2010
    Publication date: December 29, 2011
    Inventors: Richard Levesque, Natale M. Ceglio, Giovanni Nocerino, Fabio Zocchi
  • Patent number: 8050380
    Abstract: A zone-optimized mirror (MZ) for reflecting extreme ultraviolet (EUV) or X-ray radiation (18) includes a reflective surface (S) having two or more substantially discrete zones (Z1, Z2, . . . Zn) that include respective coatings (C1, C2, . . . Cn). Each coating is configured to optimally reflect a select range of incident angles of the radiation incident thereon. An EUV optical system (10) and an EUV lithography system (200) that includes at least one zone-optimized mirror are also disclosed.
    Type: Grant
    Filed: May 5, 2009
    Date of Patent: November 1, 2011
    Assignee: Media Lario, S.r.L.
    Inventors: Fabio Zocchi, Jacques Kools
  • Publication number: 20110168925
    Abstract: A source-collector module for an extreme ultraviolet (EUV) lithography system, the module including a laser-produced plasma (LPP) that generates EUV radiation and a grazing-incidence collector (GIC) mirror arranged relative thereto and having an input end and an output end. The LPP is formed using an LPP target system wherein a pulsed laser beam travels on-axis through the GIC and is incident upon solid, moveable LPP target. The GIC mirror is arranged relative to the LPP to receive the EUV radiation therefrom at its input end and focus the received EUV radiation at an intermediate focus adjacent the output end. An example GIC mirror design is presented that includes a polynomial surface-figure correction to compensate for GIC shell thickness effects, thereby improve far-field imaging performance.
    Type: Application
    Filed: June 18, 2010
    Publication date: July 14, 2011
    Inventors: Natale M. Ceglio, Giovanni Nocerino, Fabio Zocchi
  • Publication number: 20110043779
    Abstract: A collector optical system for EUV and X-ray applications is disclosed, wherein the system includes a plurality of mirrors arranged in a nested configuration that is symmetric about an optical axis. The mirrors have first and second reflective surfaces that provide successive grazing incidence reflections of radiation from a radiation source. The first and second reflective surfaces have a corrective shape that compensates for high spatial frequency variations in the far field intensity distribution of the radiation.
    Type: Application
    Filed: January 28, 2009
    Publication date: February 24, 2011
    Inventors: Fabio Zocchi, Pietro Binda, Enrico Benedetti
  • Publication number: 20100303199
    Abstract: Grazing incidence collectors (GICs) for extreme ultraviolet (EUV) and X-ray radiation sources, such as laser produced plasma (LPP) sources, are disclosed. Source-collector systems comprising GICs and LPP sources are also disclosed. A laser beam is directed along the collector axis to a fuel target to form the LPP source, and the collector is arranged to collect the radiation and reflect it to an intermediate focus. The collector may include one or more grazing-incidence mirrors, and these mirrors may be electroformed. lithography systems that employ the source-collector systems as disclosed herein.
    Type: Application
    Filed: January 28, 2009
    Publication date: December 2, 2010
    Applicant: MEDIA LARIO S.R.L.
    Inventors: Ian Wallhead, Fabio Zocchi