Patents by Inventor Fabrizio Porro
Fabrizio Porro has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10429335Abstract: It is described an integrated gas sensor device comprising a silicon substrate and an oxide layer on the silicon substrate, as well as a working electrode, a counter electrode and a reference electrode, on the oxide layer, the working electrode and the counter electrode having respective active area exposed to an environmental air through at least a plurality of first openings and a plurality of second openings in the oxide layer in correspondence of the working electrode and of the counter electrode, further comprising an electrolyte layer portion and a hydrogel layer portion on the electrolyte layer portion, the electrolyte and hydrogel layer portions having a same size, suitable to cover at least the working, counter and reference electrodes, the hydrogel layer portion acting as a “quasi solid state” water reservoir.Type: GrantFiled: July 24, 2017Date of Patent: October 1, 2019Assignee: STMicroelectronics S.r.l.Inventors: Fabrizio Porro, Valeria Casuscelli, Francesco Foncellino, Giovanna Salzillo, Luigi Giuseppe Occhipinti
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Patent number: 9981471Abstract: The present disclosure relates to a method for the application of an antiwetting coating on at least one surface of a substrate of semiconductor material comprising the steps of: a) applying on said at least one surface a metal layer of a material chosen in the group constituted by noble metals, coining metals, their oxides and their alloys; and b) applying on said metal layer a layer of a thiol of formula R—SH, where R is a linear alkyl chain having from 3 to 20 carbon atoms and, optionally, at least one hetero-atom, for obtaining an antiwetting coating. The disclosure further regards a method for the production of a nozzle plate for ink-jet printing and to an integrated ink-jet printhead provided with a nozzle plate obtained according to the method of the disclosure.Type: GrantFiled: June 8, 2016Date of Patent: May 29, 2018Assignee: STMicroelectronics S.R.L.Inventor: Fabrizio Porro
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Publication number: 20170322170Abstract: It is described an integrated gas sensor device comprising a silicon substrate and an oxide layer on the silicon substrate, as well as a working electrode, a counter electrode and a reference electrode, on the oxide layer, the working electrode and the counter electrode having respective active area exposed to an environmental air through at least a plurality of first openings and a plurality of second openings in the oxide layer in correspondence of the working electrode and of the counter electrode, further comprising an electrolyte layer portion and a hydrogel layer portion on the electrolyte layer portion, the electrolyte and hydrogel layer portions having a same size, suitable to cover at least the working, counter and reference electrodes, the hydrogel layer portion acting as a “quasi solid state” water reservoir.Type: ApplicationFiled: July 24, 2017Publication date: November 9, 2017Inventors: Fabrizio Porro, Valeria Casuscelli, Francesco Foncellino, Giovanna Salzillo, Luigi Giuseppe Occhipinti
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Patent number: 9746439Abstract: It is described an integrated gas sensor device comprising a silicon substrate and an oxide layer on the silicon substrate, as well as a working electrode, a counter electrode and a reference electrode, on the oxide layer, the working electrode and the counter electrode having respective active area exposed to an environmental air through at least a plurality of first openings and a plurality of second openings in the oxide layer in correspondence of the working electrode and of the counter electrode, further comprising an electrolyte layer portion and a hydrogel layer portion on the electrolyte layer portion, the electrolyte and hydrogel layer portions having a same size, suitable to cover at least the working, counter and reference electrodes, the hydrogel layer portion acting as a “quasi solid state” water reservoir.Type: GrantFiled: June 27, 2014Date of Patent: August 29, 2017Assignee: STMicroelectronics S.r.l.Inventors: Fabrizio Porro, Valeria Casuscelli, Francesco Foncellino, Giovanna Salzillo, Luigi Giuseppe Occhipinti
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Patent number: 9724921Abstract: To apply an anti-wetting coating to a substrate of a semiconductor material, a method includes applying to a support a solution of a hydrocarbon comprising at least one unsaturated bond and, optionally, at least one hetero-atom for obtaining a layer of hydrocarbons. The method also includes treating at least one surface of the substrate of the semiconductor material with an acid. The layer of hydrocarbons is transferred from the support to the surface of the substrate of the semiconductor material. The layer of hydrocarbons is chemically coupled with the surface of the substrate of the semiconductor material.Type: GrantFiled: March 22, 2016Date of Patent: August 8, 2017Assignee: STMicroelectronics S.r.l.Inventors: Vincenza Di Palma, Fabrizio Porro
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Publication number: 20170182768Abstract: The present disclosure relates to a method for the application of an antiwetting coating on at least one surface of a substrate of semiconductor material comprising the steps of: a) applying on said at least one surface a metal layer of a material chosen in the group constituted by noble metals, coining metals, their oxides and their alloys; and b) applying on said metal layer a layer of a thiol of formula R—SH, where R is a linear alkyl chain having from 3 to 20 carbon atoms and, optionally, at least one hetero-atom, for obtaining an antiwetting coating. The disclosure further regards a method for the production of a nozzle plate for ink-jet printing and to an integrated ink-jet printhead provided with a nozzle plate obtained according to the method of the disclosure.Type: ApplicationFiled: June 8, 2016Publication date: June 29, 2017Inventor: Fabrizio Porro
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Publication number: 20160203973Abstract: To apply an anti-wetting coating to a substrate of a semiconductor material, a method includes applying to a support a solution of a hydrocarbon comprising at least one unsaturated bond and, optionally, at least one hetero-atom for obtaining a layer of hydrocarbons. The method also includes treating at least one surface of the substrate of the semiconductor material with an acid. The layer of hydrocarbons is transferred from the support to the surface of the substrate of the semiconductor material. The layer of hydrocarbons is chemically coupled with the surface of the substrate of the semiconductor material.Type: ApplicationFiled: March 22, 2016Publication date: July 14, 2016Applicant: STMicroelectronics S.r.l.Inventors: Vincenza Di Palma, Fabrizio Porro
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Patent number: 9321269Abstract: A method for application of an anti-wetting coating to a substrate of a semiconductor material is described. The method includes applying to a support a solution of a hydrocarbon comprising at least one unsaturated bond and, optionally, at least one hetero-atom for obtaining a layer of hydrocarbons. The method also includes treating at least one surface of the substrate of the semiconductor material with an acid. The layer of hydrocarbons is transferred from the support to the surface of the substrate of the semiconductor material. The layer of hydrocarbons is chemically coupled with the surface of the substrate of the semiconductor material. The method may be applied to an integrated ink jet printhead provided with a nozzle plate in which the nozzle plate serves as the substrate of the semiconductor material.Type: GrantFiled: August 26, 2015Date of Patent: April 26, 2016Assignee: STMICROELECTRONICS S.R.L.Inventors: Vincenza Di Palma, Fabrizio Porro
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Publication number: 20150001076Abstract: It is described an integrated gas sensor device comprising a silicon substrate and an oxide layer on the silicon substrate, as well as a working electrode, a counter electrode and a reference electrode, on the oxide layer, the working electrode and the counter electrode having respective active area exposed to an environmental air through at least a plurality of first openings and a plurality of second openings in the oxide layer in correspondence of the working electrode and of the counter electrode, further comprising an electrolyte layer portion and a hydrogel layer portion on the electrolyte layer portion, the electrolyte and hydrogel layer portions having a same size, suitable to cover at least the working, counter and reference electrodes, the hydrogel layer portion acting as a “quasi solid state” water reservoir.Type: ApplicationFiled: June 27, 2014Publication date: January 1, 2015Inventors: Fabrizio Porro, Valeria Casuscelli, Francesco Foncellino, Giovanna Salzillo, Luigi Giuseppe Occhipinti
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Patent number: 8764997Abstract: A method of metal deposition may include chemically modifying a surface of a substrate to make the surface hydrophobic. The method may further include depositing a layer of metal over the hydrophobic surface and masking at least a portion of the deposited metal layer to define a conductive metal structure. The method may also include using an etching agent to etch unmasked portions of the deposited metal layer.Type: GrantFiled: July 13, 2010Date of Patent: July 1, 2014Assignee: STMicroelectronics S.R.L.Inventors: Fabrizio Porro, Luigi Giuseppe Occhipinti
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Publication number: 20140084519Abstract: The present disclosure relates to mold components and imprint lithography techniques applied on the basis of organic mold materials in order to form polymer microstructure elements. It has been recognized that adapting surface characteristics of at least one mold component may significantly enhance performance of the lithography process, in particular with respect to suppressing residual polymer material, which in conventional strategies may have to be removed on the basis of an additional etch process.Type: ApplicationFiled: September 18, 2013Publication date: March 27, 2014Applicants: Fondazione Istituto Italiano di Tecnologia, STMicroelectronics S.r.l.Inventors: Fabrizio Porro, Antonio Scognamiglio, Raffaele Vecchione, Valeria Casuscelli, Andrea Di Matteo, Luigi Giuseppe Occhipinti, Paolo Netti
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Publication number: 20110006032Abstract: A method of metal deposition may include chemically modifying a surface of a substrate to make the surface hydrophobic. The method may further include depositing a layer of metal over the hydrophobic surface and masking at least a portion of the deposited metal layer to define a conductive metal structure. The method may also include using an etching agent to etch unmasked portions of the deposited metal layer.Type: ApplicationFiled: July 13, 2010Publication date: January 13, 2011Applicant: STMicroelectronics S.r.l.Inventors: Fabrizio PORRO, Luigi Giuseppe Occhipinti
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Patent number: 7071327Abstract: A superabsorbent polysaccharide can be obtained by crosslinking a polysaccharide or derivative thereof with at least 1% by weight of a flexible spacer having a chain length of at least 9 chain atoms and having terminal activated coupling groups. The flexible spacer may comprise a polyalkyleneglycol with a molecular weight from about 400 to 10,000. The coupling groups may be provided by divinyl sulphone units.Type: GrantFiled: March 9, 2001Date of Patent: July 4, 2006Assignee: SCA Hygiene Products ABInventors: Guiseppe Mensitieri, Fabrizio Porro, Luigi Nicolais, Alessandro Sannino