Patents by Inventor Faith S. Ichishita

Faith S. Ichishita has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Chlorofluorocarbon additives for enhancing etch rates in fluorinated halocarbon/oxidant plasmas
    Patent number: 4836887
    Abstract: A plasma comprised of a fluorinated gas, an oxidant, and up to 15%-20% chlorofluorocarbon gas etches non-insulating materials such as tungsten and silicon at very high etch rates while providing enhanced etch rate ratios to photoresist and insulators.
    Type: Grant
    Filed: November 23, 1987
    Date of Patent: June 6, 1989
    Assignee: International Business Machines Corporation
    Inventors: Timothy H. Daubenspeck, Faith S. Ichishita