Abstract: The invention relates to an apparatus (100) and a method for the processing of single molecules, particularly for the sensing or sequencing of single-stranded DNA. A bottom layer (110) and an electrically conductive top layer (120) with a first and a second slit (111,121), respectively, are disposed on top of each other such that an aperture (A) is formed by the slits. The slits (111,121) are preferably perpendicular to each other. An electrical circuit (140) may be connected to the top layer (120), allowing to sense single molecules that pass through the aperture (A).

Abstract: The invention relates to a method for manufacturing an apparatus for the processing of single molecules. According to this method, a self-assembling resist (155) is deposited on a processing layer (110, PL) and allowed to self-assemble into a pattern of two phases (155a, 155b). One of these phases (155a) is then selectively removed, and at least one aperture is generated in the processing layer (110, PL) through the mask of the remaining resist (155b). Thus apertures of small size can readily be produced that allow for the processing of single molecules (M), for example in DNA sequencing.

Abstract: The invention relates to a method for manufacturing an apparatus for the processing of single molecules. According to this method, a self-assembling resist (155) is deposited on a processing layer (110, PL) and allowed to self-assemble into a pattern of two phases (155a, 155b). One of these phases (155a) is then selectively removed, and at least one aperture is generated in the processing layer (110, PL) through the mask of the remaining resist (155b). Thus apertures of small size can readily be produced that allow for the processing of single molecules (M), for example in DNA sequencing.

Abstract: The invention relates to an apparatus(100) and a method for the processing of single molecules, particularly for the sensing or sequencing of single-stranded DNA. A bottom layer(110) and an electrically conductive top layer(120) with a first and a second slit(111,121), respectively, are disposed on top of each other such that an aperture(A) is formed by the slits. The slits(111,121) are preferably perpendicular to each other. An electrical circuit(140) may be connected to the top layer(120), allowing to sense single molecules that pass through the aperture(A).

Abstract: A pattern of very fine features (18) can be produced by illuminating an inorganic negative tone resist layer (16), provided on an electroplating base layer (14), by a beam (EB), which is able to cure the resist to a cured pattern according to the pattern to be formed, removing the non-illuminated portions of the resist layer and electroplating a layer (20) between the cured portions (18) of the resist layer.