Patents by Inventor Falk Milde
Falk Milde has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20230402266Abstract: Disclosed herein are devices, systems, and methods for transporting a substrate for vacuum processing. The transport may be provided by a substrate carrying device that includes a support area by which a substrate carrier may be moveably supported. The substrate carrying device includes a plurality of electrodes that are galvanically separated from one another. The substrate carrying device includes a plurality of substrate carrying regions arranged consecutively in series with respect to one another, each substrate carrying region including an electrode of the plurality of electrodes and also including a substrate receiving device configured to receive a substrate placed in the substrate carrying region, preferably in physical contact with the electrode.Type: ApplicationFiled: May 5, 2023Publication date: December 14, 2023Inventor: Falk MILDE
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Patent number: 9117637Abstract: A method is provided for coating a substrate with the aid of a magnetron cathode and two electrodes which are alternately impinged upon by a positive potential and a negative potential. Also disclosed is an assembly for coating a substrate, comprising a vacuum chamber, a magnetron cathode, two electrodes, and a voltage source. A negative potential is generated at a level that is no greater than the level of the cathode potential, thus preventing the electrode that is to be cleaned from being stripped to a greater extent than the same was coated in the previous half-wave. The magnetron cathode and the electrodes are connected to the voltage source via switching elements without being galvanically such that a negative and a positive voltage generated from the voltage source can be alternatively applied to the electrodes, the level of said voltage being no greater than the cathode voltage.Type: GrantFiled: November 6, 2006Date of Patent: August 25, 2015Assignee: VON ARDENNE GmbHInventors: Goetz Teschner, Falk Milde, Enno Mirring, Frank Meissner, Goetz Grosser
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Patent number: 8828194Abstract: A layer system that can be annealed comprises a transparent substrate, preferably a glass substrate, and a first layer sequence which is applied directly to the substrate or to one or more bottom layers that are deposited onto the substrate. The layer sequence includes a substrate-proximal blocking layer, a selective layer and a substrate-distal blocking layer. Also provided is a method for producing a layer system that can be annealed and has a sufficient quality even under critical climatic conditions and/or undefined conditions of the substrate. During the heat treatment (annealing, bending), the color location of the layer system is maintained substantially stable and the color location can be widely varied at a low emissivity of the layer system. For this purpose, a first dielectric intermediate layer is interposed between the substrate-proximal blocking layer and the selective layer and is configured as a substoichiometric gradient layer.Type: GrantFiled: September 21, 2005Date of Patent: September 9, 2014Assignee: Von Ardenne Anlagentechnik GmbHInventors: Joerg Fiukowski, Matthias List, Hans-Christian Hecht, Falk Milde
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Patent number: 8377578Abstract: An infrared radiation reflecting transparent layer system on a transparent substrate and a method for producing same is provided. The infrared radiation reflecting layer system comprises an infrared radiation reflecting layer sequence which includes a selective function usually consisting of a noble metal, mostly silver, or an alloy thereof and having a good selective reflectivity in the infrared range. The layer sequence is supplemented by at least one transparent dielectric layer of an oxynitride of a metal, a semiconductor or a semiconductor alloy having a low to moderate refractive index arranged directly on the substrate or above the infrared radiation reflecting layer sequence.Type: GrantFiled: January 12, 2012Date of Patent: February 19, 2013Assignee: Von Ardenne Anlagentechnik GmbHInventors: Christoph Koeckert, Holger Proehl, Falk Milde
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Patent number: 8367226Abstract: A layer system that can be annealed comprises a transparent substrate, preferably a glass substrate, and a first layer sequence which is applied directly to the substrate or to one or more bottom layers that are deposited onto the substrate. The layer sequence includes a substrate-proximal blocking layer, a selective layer and a substrate-distal blocking layer. Also provided is a method for producing a layer system that can be annealed and has a sufficient quality even under critical climatic conditions and/or undefined conditions of the substrate. During the heat treatment (annealing, bending), the color location of the layer system is maintained substantially stable and the color location can be widely varied at a low emissivity of the layer system. For this purpose, a first dielectric intermediate layer is interposed between the substrate-proximal blocking layer and the selective layer and is configured as a substoichiometric gradient layer.Type: GrantFiled: July 23, 2010Date of Patent: February 5, 2013Assignee: Von Ardenne Anlagentechnik GmbHInventors: Joerg Fiukowski, Matthias List, Hans-Christian Hecht, Falk Milde
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Publication number: 20120171441Abstract: An infrared radiation reflecting transparent layer system on a transparent substrate and a method for producing same is provided. The infrared radiation reflecting layer system comprises an infrared radiation reflecting layer sequence which includes a selective function usually consisting of a noble metal, mostly silver, or an alloy thereof and having a good selective reflectivity in the infrared range. The layer sequence is supplemented by at least one transparent dielectric layer of an oxynitride of a metal, a semiconductor or a semiconductor alloy having a low to moderate refractive index arranged directly on the substrate or above the infrared radiation reflecting layer sequence.Type: ApplicationFiled: January 12, 2012Publication date: July 5, 2012Applicant: VON ARDENNE ANLAGENTECHNIK GMBHInventors: Christoph KOECKERT, Holger PROEHL, Falk MILDE
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Patent number: 8197222Abstract: A highly efficient getter pump with low maintenance requirements is applied to a vacuum coating installation, allowing a substrate to be coated to remain uncontaminated by a dusting of getter material. The getter pump comprises a pump housing with an exposure opening. The housing has a getter body, of getter material that essentially closes the exposure opening and can move in relation to the exposure opening. An inner sub-section of the surface of the getter body points towards the interior of the pump housing and an outer sub-section points towards the exterior of the pump housing through the exposure opening. The positions of the inner and outer sub-sections are interchangeable by movement of the getter body. The getter pump is equipped with a device for removing getter material from the inner sub-section.Type: GrantFiled: July 4, 2007Date of Patent: June 12, 2012Assignee: Von Ardenne Anlagentechnik GmbHInventors: Falk Milde, Hans-Christian Hecht, Joern Brueckner
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Patent number: 8119194Abstract: An infrared radiation reflecting transparent layer system on a transparent substrate and a method for producing same is provided. The infrared radiation reflecting layer system comprises an infrared radiation reflecting layer sequence which includes a selective function usually consisting of a noble metal, mostly silver, or an alloy thereof and having a good selective reflectivity in the infrared range. The layer sequence is supplemented by at least one transparent dielectric layer of an oxynitride of a metal, a semiconductor or a semiconductor alloy having a low to moderate refractive index arranged directly on the substrate or above the infrared radiation reflecting layer sequence.Type: GrantFiled: May 17, 2007Date of Patent: February 21, 2012Assignee: VON ARDENNE Anlagentechnik GmbHInventors: Christoph Koekert, Holger Proehl, Falk Milde
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Publication number: 20110180390Abstract: A method is provided for coating a substrate with the aid of a magnetron cathode and two electrodes which are alternately impinged upon by a positive potential and a negative potential. Also disclosed is an assembly for coating a substrate, comprising a vacuum chamber, a magnetron cathode, two electrodes, and a voltage source. A negative potential is generated at a level that is no greater than the level of the cathode potential, thus preventing the electrode that is to be cleaned from being stripped to a greater extent than the same was coated in the previous half-wave. The magnetron cathode and the electrodes are connected to the voltage source via switching elements without being galvanically such that a negative and a positive voltage generated from the voltage source can be alternatively applied to the electrodes, the level of said voltage being no greater than the cathode voltage.Type: ApplicationFiled: April 5, 2011Publication date: July 28, 2011Applicant: VON ARDENNE ANLAGENTECHNIK GMBHInventors: Goetz TESCHNER, Falk MILDE, Enno MIRRING, Frank MEISSNER, Goetz GROSSER
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Publication number: 20100291393Abstract: A layer system that can be annealed comprises a transparent substrate, preferably a glass substrate, and a first layer sequence which is applied directly to the substrate or to one or more bottom layers that are deposited onto the substrate. The layer sequence includes a substrate-proximal blocking layer, a selective layer and a substrate-distal blocking layer. Also provided is a method for producing a layer system that can be annealed and has a sufficient quality even under critical climatic conditions and/or undefined conditions of the substrate. During the heat treatment (annealing, bending), the color location of the layer system is maintained substantially stable and the color location can be widely varied at a low emissivity of the layer system. For this purpose, a first dielectric intermediate layer is interposed between the substrate-proximal blocking layer and the selective layer and is configured as a substoichiometric gradient layer.Type: ApplicationFiled: July 23, 2010Publication date: November 18, 2010Applicant: VON ARDENNE Anlagentechnik GmbHInventors: Joerg FIUKOWSKI, Matthias List, Hans-Christian Hecht, Falk Milde
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Patent number: 7785721Abstract: A layer system that filters sun and heat can be applied to glass by a vacuum coating process. The system comprises at least one series of metal layers in addition to a respective series of lower dielectric layers and a respective series of upper dielectric layers. At least one series of metal layers and one series of upper and lower dielectric layers are configured as a sandwich system, wherein one metal layer is encapsulated by an upper and a lower intermediate layer consisting of hypostoichiometrically nitrided or oxidized metal of the metal layer and sandwich systems of the series of layers contain individual sandwich layers of a stoichiometric and hypostoichiometric oxide or nitride of a metal or semiconductor. An oxygen or nitrogen deficit of the sandwich layers increases towards a neighboring sandwich system and the oxide and nitride layers are produced in a vacuum coating process.Type: GrantFiled: November 25, 2004Date of Patent: August 31, 2010Assignee: Von Ardenne Anlagentechnik GmbHInventors: Matthias List, Falk Milde, Christoph Koeckert, Joerg Fiukowski
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Publication number: 20090202362Abstract: A highly efficient getter pump with low maintenance requirements is applied to a vacuum coating installation, allowing a substrate to be coated to remain uncontaminated by a dusting of getter material. The getter pump comprises a pump housing with an exposure opening. The housing has a getter body, of getter material that essentially closes the exposure opening and can move in relation to the exposure opening. An inner sub-section of the surface of the getter body points towards the interior of the pump housing and an outer sub-section points towards the exterior of the pump housing through the exposure opening. The positions of the inner and outer sub-sections are interchangeable by movement of the getter body. The getter pump is equipped with a device for removing getter material from the inner sub-section.Type: ApplicationFiled: July 4, 2007Publication date: August 13, 2009Applicant: VON ARDENNE ANLAGENTECHNIK GMBHInventors: Falk Milde, Hans-Christian Hecht, Joern Brueckner
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Publication number: 20080308410Abstract: A method is provided for coating a substrate with the aid of a magnetron cathode and two electrodes which are alternately impinged upon by a positive potential and a negative potential. Also disclosed is an assembly for coating a substrate, comprising a vacuum chamber, a magnetron cathode, two electrodes, and a voltage source. A negative potential is generated at a level that is no greater than the level of the cathode potential, thus preventing the electrode that is to be cleaned from being stripped to a greater extent than the same was coated in the previous half-wave. The magnetron cathode and the electrodes are connected to the voltage source via switching elements without being galvanically such that a negative and a positive voltage generated from the voltage source can be alternatively applied to the electrodes, the level of said voltage being no greater than the cathode voltage.Type: ApplicationFiled: November 6, 2006Publication date: December 18, 2008Applicant: Von Ardenne Anlagentechnik GmbHInventors: Goetz Teschner, Falk Milde, Enno Mirring, Frank Meissner, Goetz Grosser
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Publication number: 20080057319Abstract: A layer system that can be annealed comprises a transparent substrate, preferably a glass substrate, and a first layer sequence which is applied directly to the substrate or to one or more bottom layers that are deposited onto the substrate. The layer sequence includes a substrate-proximal blocking layer, a selective layer and a substrate-distal blocking layer. Also provided is a method for producing a layer system that can be annealed and has a sufficient quality even under critical climatic conditions and/or undefined conditions of the substrate. During the heat treatment (annealing, bending), the color location of the layer system is maintained substantially stable and the color location can be widely varied at a low emissivity of the layer system. For this purpose, a first dielectric intermediate layer is interposed between the substrate-proximal blocking layer and the selective layer and is configured as a substoichiometric gradient layer.Type: ApplicationFiled: September 21, 2005Publication date: March 6, 2008Applicant: VON ARDENNE ANLAGENTECHNIK GMBHInventors: Joerg Fiukowski, Matthias List, Hans-Christian Hecht, Falk Milde
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Publication number: 20080032157Abstract: An infrared radiation reflecting transparent layer system on a transparent substrate and a method for producing same is provided. The infrared radiation reflecting layer system comprises an infrared radiation reflecting layer sequence which includes a selective function usually consisting of a noble metal, mostly silver, or an alloy thereof and having a good selective reflectivity in the infrared range. The layer sequence is supplemented by at least one transparent dielectric layer of an oxynitride of a metal, a semiconductor or a semiconductor alloy having a low to moderate refractive index arranged directly on the substrate or above the infrared radiation reflecting layer sequence.Type: ApplicationFiled: May 17, 2007Publication date: February 7, 2008Applicant: VON ARDENNE ANLAGENTECHNIK GMBHInventors: Christoph Koekert, Holger Proehl, Falk Milde
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Publication number: 20070273991Abstract: A layer system that filters sun and heat can be applied to glass by a vacuum coating process. The system comprises at least one series of metal layers in addition to a respective series of lower dielectric layers and a respective series of upper dielectric layers. At least one series of metal layers and one series of upper and lower dielectric layers are configured as a sandwich system, wherein one metal layer is encapsulated by an upper and a lower intermediate layer consisting of hypostoichiometrically nitrided or oxidized metal of the metal layer and sandwich systems of the series of layers contain individual sandwich layers of a stoichiometric and hypostoichiometric oxide or nitride of a metal or semiconductor. An oxygen or nitrogen deficit of the sandwich layers increases towards a neighboring sandwich system and the oxide and nitride layers are produced in a vacuum coating process.Type: ApplicationFiled: November 25, 2004Publication date: November 29, 2007Applicant: VON ARDENNE ANLAGENTECHNIK GMBHInventors: Matthias List, Falk Milde, Christoph Koeckert, Joerg Fiukowski
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Publication number: 20060236935Abstract: A coating installation is provided with diaphragms that are convenient to mechanically install and remove. A coating installation, which has a coating chamber delimited by chamber walls, has at least one cooling device arranged on a chamber wall. A bracket in thermal contact with the cooling device, is configured with a bearing surface to receive the diaphragm. The bearing surface may be a horizontal or an inclined surface on which the diagram can be lowered or pressure fitted so that it is in thermal contact with the bracket. In coating installation operation, heat is conducted from the diagram to the cooling device through the bracket.Type: ApplicationFiled: October 4, 2005Publication date: October 26, 2006Inventors: Jochen Krause, Joern Brueckner, Dietmar Schulze, Falk Milde
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Patent number: 6942768Abstract: A system for coating band-shaped material, where the band-shaped material travels through at least one process chamber in which there is a vacuum, and at least one cooling roller. On the peripheral surface of each cooling roller are at least two magnetron sputter sources that are arranged separate from one another in magnetron chambers, which are formed by separate magnetron chamber walls and allow each chamber to be evacuated, so the pressure in the magnetron chamber can be maintained higher than that in the process chamber. The magnetron chamber walls and the magnetron sputter sources can be mounted on a common carriage, which is displaceable parallel to the cooling roller axis. The result is the reduction in the maintenance costs in cleaning of the magnetron chamber walls and at the same time improvement of the separation of gas between the magnetron chambers and the process chamber.Type: GrantFiled: September 27, 2002Date of Patent: September 13, 2005Assignee: Von Ardenne Anlagentechnik GmbHInventors: Wolfgang Erbkamm, Hans-Christian Hecht, Michael Hofmann, Falk Milde
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Publication number: 20030057090Abstract: A system for coating band-shaped material, where the band-shaped material travels through at least one process chamber in which there is a vacuum, and at least one cooling roller. On the peripheral surface of each cooling roller are at least two magnetron sputter sources that are arranged separate from one another in magnetron chambers, which are formed by separate magnetron chamber walls and allow each chamber to be evacuated, so the pressure in the magnetron chamber can be maintained higher than that in the process chamber. The magnetron chamber walls and the magnetron sputter sources can be mounted on a common carriage, which is displaceable parallel to the cooling roller axis. The result is the reduction in the maintenance costs in cleaning of the magnetron chamber walls and at the same time improvement of the separation of gas between the magnetron chambers and the process chamber.Type: ApplicationFiled: September 27, 2002Publication date: March 27, 2003Inventors: Wolfgang Erbkamm, Hans-Christian Hecht, Michael Hofmann, Falk Milde
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Patent number: 6420863Abstract: Process for monitoring an alternating-voltage discharge between the electrodes of a double electrode and an apparatus. The process includes measuring values of at least one of a discharge current and a discharge voltage for each half-wave within an alternating-voltage discharge period, determining a difference between the measured values of a second half-wave and the measured values of the first half-wave, and comparing the determined differences to specific tolerance values. When the specific tolerance values are exceeded by the determined differences, a power supply is reduced, whereby the discharge is at least briefly suppressed. The apparatus includes a double magnetron including first and second targets arranged to form a double electrode, and a power supply coupled to supply power to the first and second targets.Type: GrantFiled: June 21, 2000Date of Patent: July 16, 2002Assignee: Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.VInventors: Falk Milde, Torsten Winkler, Andreas Fickert, Volker Kirchhoff, Matthias Fahland