Abstract: The invention relates to a process for the production of polymer fibers from polymers dissolved in ionic liquids by means of an air gap spinning process, characterized in that a) a spinning solution that contains an ionic liquid and a dissolved polymer is produced; b) said spinning solution is guided through an extruder before it is divided into fibers via a die; and c) the obtained fibers are guided via an air gap through a coagulation bath.

Abstract: The invention relates to a process for the production of polymer fibers from polymers dissolved in ionic liquids by means of an air gap spinning process, characterized in that a) a spinning solution that contains an ionic liquid and a dissolved polymer is produced; b) said spinning solution is guided through an extruder before it is divided into fibers via a die; and c) the obtained fibers are guided via an air gap through a coagulation bath.

Abstract: The present invention is in the field of processes for the generation of thin inorganic films on substrates, in particular atomic layer deposition processes. The present invention relates to a process for the generation of inorganic films comprising depositing the compound of general formula (I) onto a solid substrate (I), wherein M is Mn, Ni or Co, X is a ligand which coordinates M, n is 0, 1, 2, 3, or 4, R1 is an alkyl group, an alkenyl group, an aryl group, a halogen, or a silyl group, R2 is an alkyl group, an alkenyl group, an aryl group, or a silyl group, p and q are 1 or 2, wherein p+q=3, and m is 1, 2, or 3.

Abstract: The invention relates to a process for producing carbon fibers from cellulosic fibers, characterized in that cellulosic fibers, which contain a sulfonic acid salt of formula (I), wherein R1 represents a hydrocarbon group and K+ represents a cation, are converted into carbon fibers.

Abstract: The present invention is in the field of processes for the generation of thin inorganic films on substrates, in particular atomic layer deposition processes. The present invention relates to a process comprising bringing a compound of general formula (I) into the gaseous or aerosol state and depositing the compound of general formula (I) from the gaseous or aerosol state onto a solid substrate, wherein R1, R2, R3, and R4 are independent of each other an alkyl group, an aryl group or a trialkylsilyl group, M is Mn, Ni or Co, X is a ligand which coordinates M, wherein at least one X is a neutrally charged ligand, m is 1, 2 or 3 and n is at least 1 wherein the molecular weight of the compound of general formula (I) is up to 1000 g/mol.

Abstract: Processes for the generation of thin inorganic films on substrates, in particular atomic layer deposition processes. In particular, a process of bringing a compound of general formula (I) into the gaseous or aerosol state Ln - - - M - - - Xm??(I) and depositing the compound of general formula (I) from the gaseous or aerosol state onto a solid substrate, wherein M is a metal, L is a ligand which coordinates to M and contains at least one phosphorus-carbon multiple bond, wherein L contains a phosphorus-containing heterocyclic ring or a phosphorus-carbon triple bond, X is a ligand which coordinates to M, n is 1 to 5, and m is 0 to 5.

Abstract: The present invention is in the field of etching metal- or semimetal-containing materials by atomic layer etching. In particular the present invention relates to a process for etching a metal- or semimetal-containing material comprising bringing a metal- or semimetal-containing material having an activated surface in contact with an organic compound containing a leaving group which is capable of forming a volatile compound upon coming in contact with the metal- or semi-metal-containing material and a group which is capable of coordinating to a metal or semimetal atom in the metal- or semimetal-containing material.

Abstract: The present invention is in the field of processes for the generation of thin inorganic films on substrates, in particular atomic layer deposition processes. It relates to a process for preparing metal films comprising (a) depositing a metal-containing compound from the gaseous state onto a solid substrate and (b) bringing the solid substrate with the deposited metal-containing compound in contact with a reducing agent in the gaseous state, wherein the reducing agent is or at least partially forms at the surface of the solid substrate a carbene, a silylene or a phosphor radical.

Abstract: The present invention is in the field of processes for the generation of thin inorganic films on substrates, in particular atomic layer deposition processes. It relates to a process for preparing metal films comprising (a) depositing a metal-containing compound from the gaseous state onto a solid substrate and (b) bringing the solid substrate with the deposited metal-containing compound in contact with a compound of general formula (la), (lb), (lc), (Id), (lla), (lib), (lie), or (lid) wherein A is O or NRN, R and RN is hydrogen, an alkyl group, an alkenyl group, an aryl group, or a silyl group, R1, R2, R3, and R4 is hydrogen, an alkyl group, an alkenyl group, an aryl group, a silyl group, or an ester group, and E is nothing, oxygen, methylene, ethylene, or 1,3-propylene.

Abstract: The present invention is in the field of processes for the generation of thin inorganic films on substrates, in particular atomic layer deposition processes. The present invention relates to a process for the generation of inorganic films comprising depositing the compound of general formula (I) onto a solid substrate (I), wherein M is Mn, Ni or Co, X is a ligand which coordinates M, n is 0, 1, 2, 3, or 4, R1 is an alkyl group, an alkenyl group, an aryl group, a halogen, or a silyl group, R2 is an alkyl group, an alkenyl group, an aryl group, or a silyl group, p and q are 1 or 2, wherein p+q=3, and m is 1, 2, or 3.

Abstract: The present invention is in the field of processes for the generation of thin inorganic films on substrates, in particular atomic layer deposition processes. It relates to a process for preparing metal films comprising (a) depositing a metal-containing compound from the gaseous state onto a solid substrate and (b) bringing the solid substrate with the deposited metal-containing compound in contact with a reducing agent in the gaseous state, wherein the reducing agent is or at least partially forms at the surface of the solid substrate a carbene, a silylene or a phosphor radical.

Abstract: The invention relates to a process for producing carbon fibers from cellulosic fibers, characterized in that cellulosic fibers, which contain a sulfonic acid salt of formula (I), wherein R1 represents a hydrocarbon group and K+ represents a cation, are converted into carbon fibers.

Abstract: The invention relates to a process for the production of polymer fibers from polymers dissolved in ionic liquids by means of an air gap spinning process, characterized in that a) a spinning solution that contains an ionic liquid and a dissolved polymer is produced; b) said spinning solution is guided through an extruder before it is divided into fibers via a die; and c) the obtained fibers are guided via an air gap through a coagulation bath.

Abstract: The present invention is in the field of processes for the generation of thin inorganic films on substrates, in particular atomic layer deposition processes. In particular, the present invention relates to a process comprising bringing a compound of general formula (I) into the gaseous or aerosol state Ln . . . M . . . Xm (I) and depositing the compound of general formula (I) from the gaseous or aerosol state onto a solid substrate, wherein M is a metal, L is a ligand which coordinates to M and contains at least one phosphorus-carbon multiple bond, wherein L contains a phosphorus-containing heterocyclic ring or a phosphorus-carbon triple bond, X is a ligand which coordinates to M, n is 1 to 5, and m is 0 to 5.

Abstract: The present invention is in the field of processes for the generation of thin inorganic films on substrates, in particular atomic layer deposition processes. The present invention relates to a process comprising bringing a compound of general formula (I) into the gaseous or aerosol state and depositing the compound of general formula (I) from the gaseous or aerosol state onto a solid substrate, wherein R1, R2, R3, and R4 are independent of each other an alkyl group, an aryl group or a trialkylsilyl group, M is Mn, Ni or Co, X is a ligand which coordinates M, wherein at least one X is a neutrally charged ligand, m is 1, 2 or 3 and n is at least 1 wherein the molecular weight of the compound of general formula (I) is up to 1000 g/mol.

Abstract: The present invention is in the field of processes for the generation of thin inorganic films on substrates. In particular the present invention relates to a process comprising bringing a com-pound of general formula (I) into the gaseous or aerosol state Ln-M-XmL=formula and depositing the compound of general formula (I) from the gaseous or aerosol state onto a solid substrate, wherein R1, R2, R3, R4, are independent of each other hydrogen, an alkyl group, an aryl group, or a SiA3 group with A being an alkyl or aryl group, and at least two of R1, R2, R3, R4 are a SiA3 group, n is an integer from 1 to 4, M is a metal or semimetal, X is a ligand which coordinates M, and m is an integer from 0 to 4.

Abstract: The present invention relates to a process for the generation of thin inorganic films on substrates, in particular an atomic layer deposition process. This process comprises bringing a compound of general formula (I) into the gaseous or aerosol state and depositing the compound of general formula (I) from the gaseous or aerosol state onto a solid substrate, wherein R1, R2, R3, R4, R5, and R6 are independent of each other hydrogen, an alkyl group, or a trialkylsilyl group, n is an integer from 1 to 3, M is a metal or semimetal, 1 X is a ligand which coordinates M, and m is an integer from 0 to 4.

Abstract: A method for starting an electric motor having a rotor, comprising the following steps:—driving the rotor with a first torque in a first rotational direction, wherein a maximum value of the first torque is not higher than a maximum countertorque acting counter to the rotation of the rotor, so that the rotor comes to a standstill in a first stationary position;—driving the rotor starting from the first stationary position in a second rotational direction that is counter to the first rotational direction until the rotor comes to a standstill in a predefined second stationary position; and—starting from the rotor in the first rotational direction starting from the second stationary position.

Abstract: A method for monitoring a controller for controlling and/or monitoring a three-phase electric motor, in particular an asynchronous or synchronous motor, wherein two phase currents are measured and an error signal is generated if at least one of the two measured phase currents is essentially zero. An error signal is also generated if none of the two measured phase currents is essentially zero, but a sum formed of the two measured phase currents is essentially zero.

Abstract: A method for starting an electric motor having a rotor, comprising the following steps: —driving the rotor with a first torque in a first rotational direction, wherein a maximum value of the first torque is not higher than a maximum countertorque acting counter to the rotation of the rotor, so that the rotor comes to a standstill in a first stationary position; —driving the rotor starting from the first stationary position in a second rotational direction that is counter to the first rotational direction until the rotor comes to a standstill in a predefined second stationary position; and —starting from the rotor in the first rotational direction starting from the second stationary position.