Patent number: 11613550
Abstract: A compound comprising a first ligand LA of Formula I or Formula II: wherein A1 and A2 are each independently C or Si; wherein each RA, and RB independently represents mono to the maximum allowable substitution, or no substitution; wherein each X1, X2, and X3 is independently C or N; wherein each R, R1, R2, R3, R4 and RA is independently a hydrogen or a substituent selected from the group consisting of deuterium, halogen, alkyl, cycloalkyl, heteroalkyl, heterocycloalkyl, arylalkyl, alkoxy, aryloxy, amino, silyl, boryl, alkenyl, cycloalkenyl, heteroalkenyl, alkynyl, aryl, heteroaryl, acyl, carboxylic acid, ether, ester, nitrile, isonitrile, sulfanyl, sulfinyl, sulfonyl, phosphino, and combinations thereof; wherein LA is complexed to a metal M; wherein M is optionally coordinated to one or more other ligands; wherein the ligand LA is optionally linked with the one or more other ligands to form a tridentate, tetradentate, pentadentate, or hexadentate ligand; and wherein any two substituents are optionally j
Type:
Grant
Filed:
April 21, 2020
Date of Patent:
March 28, 2023
Assignee:
Universal Display Corporation
Inventors:
Scott Beers, Woo-Young So, Hsiao-Fan Chen
Publication number: 20230065887
Abstract: A compound of Formula I, is provided. In Formula I, one of Z1, Z2, and Z3 is N and the remainder are C; each of L1 and L2 is independently selected from a direct bond and a linking group; at least one of R1, R2, RA, RB, RC, RD, and RE comprises a group R* having a structure selected form the group consisting of Formula II, -Q(R3)(R4)a(R5)b, Formula III, and Formula IV, Each R, R?, R?, R1, R2, R3, R4, R5, RA, RB, RC, RD, RE, RF, RG, and RH is independently hydrogen or a General Substituent, with the proviso that group R* is not adamantyl. Formulations, OLEDs, and consumer products containing the compound are also provided.
Type:
Application
Filed:
August 31, 2022
Publication date:
March 2, 2023
Applicant:
UNIVERSAL DISPLAY CORPORATION
Inventors:
Hsiao-Fan CHEN, Geza SZIGETHY, Rasha HAMZE, Nicholas J. THOMPSON, Hojae CHOI, Weiye GUAN, Raghupathi NEELARAPU, Charles J. STANTON, Douglas WILLIAMS, Ving Jick LEE