Abstract: A method is used to make an aluminum alloy with excellent tensile strength, low density and excellent radiation. The method includes the steps of providing a base material, adding 0.06 wt % to 0.30 wt % of zirconium and 0.06 wt % to 0.30 wt % of vanadium to the base material, and melting the basic material with the zirconium and vanadium to provide an aluminum alloy. The base material includes 92.55 wt % to 97.38 wt % of aluminum, 0.9 wt % to 1.8 wt % of silicon, less than 0.5 wt % of iron, 0.6 wt % to 1.2 wt % of copper, 0.4 wt % to 1.1 wt % of manganese, 0.6 wt % to 1.4 wt % of magnesium, less than 0.40 wt % of chromium, less than 0.25 wt % of zinc and less than 0.20 wt % of titanium.

Abstract: A method is used to make an aluminum alloy with excellent tensile strength, low density and excellent radiation. The method includes the steps of providing a base material, adding 0.06 wt % to 0.30 wt % of zirconium and 0.06 wt % to 0.30 wt % of vanadium to the base material, and melting the basic material with the zirconium and vanadium to provide an aluminum alloy. The base material includes 92.55 wt % to 97.38 wt % of aluminum, 0.9 wt % to 1.8 wt % of silicon, less than 0.5 wt % of iron, 0.6 wt % to 1.2 wt % of copper, 0.4 wt % to 1.1 wt % of manganese, 0.6 wt % to 1.4 wt % of magnesium, less than 0.40 wt % of chromium, less than 0.25 wt % of zinc and less than 0.20 wt % of titanium.

Abstract: A manufacturing method of sputtering targets uses a direct-chill method to fabricate various aluminum and aluminum alloy ingots. Without the need of follow-up forging processes, the fabricated aluminum alloy ingots can be cut to attain aluminum and aluminum alloy sputtering targets. The method according to the present invention features the advantages of few process steps, high productivity, and high yield. In addition, the fabricated targets have small grains, fine precipitate phases, and homogeneous composition.

Abstract: A manufacturing method of sputtering targets uses a direct-chill method to fabricate various aluminum and aluminum alloy ingots. Without the need of follow-up forging processes, the fabricated aluminum alloy ingots can be cut to attain aluminum and aluminum alloy sputtering targets. The method according to the present invention features the advantages of few process steps, high productivity, and high yield. In addition, the fabricated targets have small grains, fine precipitate phases, and homogeneous composition.