Abstract: a memory device includes an array of memory cells. Each memory cell includes a vertical transistor having a semiconductor body vertically extending in a first direction. Each memory cell includes a storage unit coupled to a first end of the semiconductor body and a bit line extending in a second direction perpendicular to the first direction. The bit line is connected to second ends of the semiconductor bodies of a row of the vertical transistors. The bit line includes a semiconductor epitaxial layer extending in the second direction and connected to the second ends of the semiconductor bodies of the row of the vertical transistors at a top surface of the semiconductor epitaxial layer.

Abstract: Embodiments of this application relate to a display method. The method includes: determining, according to a screen projection desktop generation request of the screen projection application, a screen projection desktop that includes an application interface and a mouse icon, where the screen projection desktop is displayed on the external display; and when the mouse icon is moved to the application interface, executing a corresponding hover effect on the screen projection desktop, and/or changing the mouse icon on the clickable application interface. In this application, when the mouse icon is moved to the application interface, it is determined whether the hover effect can be executed; and after it is determined that the hover effect can be executed, a corresponding hover effect is executed according to an interface type of the application interface, and/or a style of the mouse icon is changed.

Abstract: A scatterometry target formed relative to an elevationally outermost surface of a substrate includes features having an optical property that is different from that of spaces between the features. The substrate has spaced-apart parallel elongated blocking lines having an optical property different from that of spaces between the blocking lines. The blocking lines are elevationally inward of the target features. The target features and the blocking lines overlap within a same vertical region of the substrate. Polarized electromagnetic radiation having multiple wavelengths is impinged onto the scatterometry target. Pitch of the blocking lines is less than the smallest wavelength of the impinged radiation. The blocking lines reduce spectrum variation to below a detectable level for any polarized electromagnetic radiation passing to elevationally inward of the blocking lines.

Abstract: A scatterometry target formed relative to an elevationally outermost surface of a substrate includes features having an optical property that is different from that of spaces between the features. The substrate has spaced-apart parallel elongated blocking lines having an optical property different from that of spaces between the blocking lines. The blocking lines are elevationally inward of the target features. The target features and the blocking lines overlap within a same vertical region of the substrate. Polarized electromagnetic radiation having multiple wavelengths is impinged onto the scatterometry target. Pitch of the blocking lines is less than the smallest wavelength of the impinged radiation. The blocking lines reduce spectrum variation to below a detectable level for any polarized electromagnetic radiation passing to elevationally inward of the blocking lines.