Patents by Inventor Fan Tseng

Fan Tseng has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210040278
    Abstract: A method for manufacturing anisotropic polymer particles includes the steps of: (a) preparing on a substrate a polymeric composite which includes a film of a first polymer and a plurality of microspheres of a second polymer, (b) subjecting the polymeric composite on the substrate to a first solvent vapor annealing treatment in a vapor atmosphere of a first solvent, and (c) after step b), subjecting the polymeric composite on the substrate to a second solvent vapor annealing treatment in a vapor atmosphere of a second solvent so as to transform the microspheres of the second polymer into the anisotropic polymer particles.
    Type: Application
    Filed: August 8, 2019
    Publication date: February 11, 2021
    Inventors: Jiun-Tai Chen, Hsiao-Fan Tseng, Yu-Jing Chiu
  • Publication number: 20120055704
    Abstract: Embodiments of the present disclosure set forth a sintered talc powder. The sintered talc powder comprising a first X-ray diffraction peak from about 29° to about 30° and having a first intensity and a second X-ray diffraction peak from about 25° to about 27° and having a second intensity, wherein the first intensity is greater than the second intensity.
    Type: Application
    Filed: September 6, 2010
    Publication date: March 8, 2012
    Applicant: TAIWAN UNION TECHNOLOGY CORPORATION
    Inventors: Tsung Fan TSENG, Tsung Hsein LIN, Hsien Te CHEN, Hsuan Hao HSU, Chih Wei LIAO
  • Publication number: 20080020565
    Abstract: A method for creating a dual damascene structure while using only one lithography and masking step. Conventional dual damascene structures utilize two lithography steps: one to mask and expose the via, and a second step to mask and expose the trench interconnection. The novel method for creating a dual damascene structure allows for a smaller number of processing steps, thus reducing the processing time needed to complete the dual damascene structure. In addition, a lower number of masks may be needed. The exemplary mask or reticle used within the process incorporates different regions possessing different transmission rates. During the exposing step, light from an exposing source passes through the mask to expose a portion of the photoresist layer on top of the wafer.
    Type: Application
    Filed: October 6, 2006
    Publication date: January 24, 2008
    Applicant: Semiconductor Manufacturing International (Shanghai) Corporation
    Inventors: Fan Tseng, Chi Wu, Wei Chien
  • Publication number: 20070121213
    Abstract: A tunable micro-aspherical lens is disclosed, which employs two potential differences provided by two sets of electrodes to dynamically change the bottom area and the central height of the liquid polymer lens. The tunable micro-aspherical lens includes a tunable lens, a lower electrode plate, a hydrophobic pattern, an insulation layer and an upper transparent electrode plate. Also, a manufacturing method of a tunable micro-aspherical lens is disclosed, which includes forming a lower electrode plate, forming an insulation layer, determining a position of the tunable lens, controlling the bottom area and the central height of the tunable lens. The tunable micro-aspherical lens of the present invention eliminates spherical aberration and improves the focus spot resolution to shrink the focus spot and thus to provide better optical quality.
    Type: Application
    Filed: May 2, 2006
    Publication date: May 31, 2007
    Applicant: NATIONAL TSING HUA UNIVERSITY
    Inventors: Fan Tseng, Chang Chen
  • Publication number: 20070117367
    Abstract: A fluid injection apparatus is disclosed. A chamber wall is disposed overlying the substrate to define an area. A nozzle plate comprising a nozzle is disposed overlying the chamber wall to form a chamber on the area, wherein the chamber wall and the nozzle plate are integrated into a structure layer. A manifold is disposed in the substrate, communicated with the chamber.
    Type: Application
    Filed: November 21, 2006
    Publication date: May 24, 2007
    Applicant: BENQ CORPORATION
    Inventors: Der Shyn, Wei Chen, Fan Tseng, Wen Chuang, Guang Shen
  • Publication number: 20070109361
    Abstract: A fluid injection apparatus is disclosed. A manifold connects a plurality of fluid chambers to supply fluids thereto. A plurality of nozzles are connected to the fluid chambers respectively to eject the fluids, wherein at least two of the nozzles are not disposed along a column or a row, and distances between the nozzles and the manifold are substantially the same.
    Type: Application
    Filed: November 13, 2006
    Publication date: May 17, 2007
    Applicant: BENQ CORPORATION
    Inventors: Wei Chen, Der Shyn, Fan Tseng
  • Publication number: 20050181970
    Abstract: A clay mixture containing aluminum compounds is provided. The clay mixture includes an aluminum compound in a range from about 10% to about 90% by weight of the clay mixture; a clay in a range from about 5% to 60% by weight of the clay mixture; and a first and a second surfactants, wherein an amount of the first and the second surfactants is in a rage from about 0.2 to about 30% by weight of the clay mixture.
    Type: Application
    Filed: July 2, 2004
    Publication date: August 18, 2005
    Applicant: Walsin Lihwa Corp.
    Inventors: Ching-Yao Huang, Hsi-Fu Lee, Tzu-Fan Tseng, Jeng-Yue Wu
  • Patent number: D456460
    Type: Grant
    Filed: December 21, 2000
    Date of Patent: April 30, 2002
    Inventor: Shih Fan Tseng