Abstract: A shift register circuit includes a first pull-down control circuit, a first pull-down circuit electrically connecting to the first pull-down control circuit, a first inversed pulse signal coupling circuit outputting a first inversed pulse signal, a first pull-up circuit outputting a first gate control signal, and a first main pull-down circuit electrically connecting to the first pull-up circuit. The first pull-up circuit receives a first driving signal and a first pulse signal to output the first gate control signal. The first inversed pulse signal coupling circuit duly outputs the first inversed pulse signal to compensate a surge occurring in the first driving signal.

Abstract: A gate driver circuit includes several shift register stages. One of shifter register stages includes a pull-up unit, a pull-up control unit, and an output unit. The pull-up unit is configured for generating a driving signal according to a first clock signal and an operating signal. The pull-up control unit is configured for generating a next-stage operating signal to a next-stage shift register stage according to the first clock signal, the operating signal and the driving signal. The output unit is configured for receiving the driving signal and generating a first gate driving signal and a second gate driving signal according to a first controlling signal and a second controlling signal, respectively.

Abstract: A shift register is disclosed. The shift register circuit includes a pull up control circuit configured to provide a pull up control signal; a first pull up circuit configured to provide a sensor driving signal in response to the pull up control signal and a second clock signal; a second pull up circuit configured to provide a gate driving signal in response to a first clock signal, the pull up control signal and the second clock signal; a first pull down control circuit configured to output a first pull down control signal; a first pull down circuit configured to pull down the pull up control signal, the sensor driving signal and the gate driving signal in response to the first pull down control signal; and a main pull down circuit configured to pull down the pull up control signal and the gate driving signal.

Abstract: The present disclosure provides a system, method and apparatus for load shaving of a power grid, and a tangible computer readable medium. The system may comprise at least one processor; and at least one memory storing computer executable instructions. The at least one memory and computer executable instructions may be configured to, with the at least one processor, cause the system to profile behavior data for power customers to divide the power customers into at least one group; define, based on usage characteristic of each of the at least one group, a possible load shaving strategy for each of the at least one group; and perform load shaving analysis at least under constraint of the possible load shaving strategy for each of the at least one group, to provide a recommended load shaving strategy for each of the power customers.

Abstract: A display panel is provided. A substrate includes a non-display area and a display area including a center area, a first area, and a second area. First data lines are disposed in the first area and electrically connected to the first source driving circuit. Second data lines are disposed in the second area and electrically connected to the second source driving circuit. At least one first repairing line is electrically connected to the first source driving circuit, passes through the center area of the display area and overlaps with the first data lines, wherein the first repairing line is electrically insulated from the first data lines. At least one second repairing line is electrically connected to the second source driving circuit, passes through the center area of the display area and overlaps with the second data lines, wherein the second repairing line is electrically insulated from the second data lines.

Abstract: A chemical mechanical polishing slurry for polishing a copper layer without excessively or destructively polishing a barrier layer beneath the copper layer is disclosed and includes an acid, a surfactant, and a silica sol having silica polishing particles that are surface modified with a surface charge modifier and that have potassium ions attached thereto. A method for preparing the chemical mechanical polishing slurry and a chemical mechanical polishing method using the chemical mechanical polishing slurry are also disclosed.

Abstract: A chemical mechanical polishing slurry for polishing a copper layer without excessively or destructively polishing a barrier layer beneath the copper layer is disclosed and includes an acid, a surfactant, and a silica sol having silica polishing particles that are surface modified with a surface charge modifier and that have potassium ions attached thereto. A method for preparing the chemical mechanical polishing slurry and a chemical mechanical polishing method using the chemical mechanical polishing slurry are also disclosed.

Abstract: A chemical mechanical polishing slurry for polishing a copper layer without excessively or destructively polishing a barrier layer beneath the copper layer is disclosed and includes an acid, a surfactant, and a silica sol having silica polishing particles that are surface modified with a surface charge modifier and that have potassium ions attached thereto. A method for preparing the chemical mechanical polishing slurry and a chemical mechanical polishing method using the chemical mechanical polishing slurry are also disclosed.

Abstract: A slide assembly includes an outer slide, a blocking member mounted on the outer slide, an inner slide slidably attached to the outer slide, a sliding block slidably mounted on the inner slide, and a long bar slidably attached to an inner side of the inner slide. A groove is defined in the blocking member. The sliding block is inserted in the groove to fix the inner slide on the outer slide. A slanted protrusion extends from the long bar. When the long bar is pulled towards a first direction, the slanted protrusion pushes the sliding block. The sliding block moves towards a second direction substantially perpendicular to the first direction to disengage the inner slide from the outer slide.

Abstract: A slide assembly includes an outer slide, a blocking member mounted on the outer slide, an inner slide slidably attached to the outer slide, a sliding block slidably mounted on the inner slide, and a long bar slidably attached to an inner side of the inner slide. A groove is defined in the blocking member. The sliding block is inserted in the groove to fix the inner slide on the outer slide. A slanted protrusion extends from the long bar. When the long bar is pulled towards a first direction, the slanted protrusion pushes the sliding block. The sliding block moves towards a second direction substantially perpendicular to the first direction to disengage the inner slide from the outer slide.

Abstract: A chemical mechanical polishing composition includes: an abrasive component, a corrosion inhibitor, a surfactant, a diacid compound, a metal residue inhibitor, and water. The metal residue inhibitor is selected from the group of compounds having the following formulas: and combinations thereof, wherein R1, R2, R3, and R4 are independently selected from H, C1-C6 alkyl, C2-C6 alkenyl, and C2-C6 alkylidyne; and R5, R6, R7, R8, R9, and R10 are independently selected from H and C1-C6 alkyl.

Abstract: A chemical mechanical polishing slurry for polishing a copper layer without excessively or destructively polishing a barrier layer beneath the copper layer is disclosed and includes an acid, a surfactant, and a silica sol having silica polishing particles that are surface modified with a surface charge modifier and that have potassium ions attached thereto. A method for preparing the chemical mechanical polishing slurry and a chemical mechanical polishing method using the chemical mechanical polishing slurry are also disclosed.

Abstract: A chemical mechanical polishing composition includes: an abrasive component, a corrosion inhibitor, a surfactant, a diacid compound, a metal residue inhibitor, and water. The metal residue inhibitor is selected from the group of compounds having the following formulas: and combinations thereof, wherein R1, R2, R3, and R4 are independently selected from H, C1-C6 alkyl, C2-C6 alkenyl, and C2-C6 alkylidyne; and R5, R6, R7, R8, R9, and R10 are independently selected from H and C1-C6 alkyl.

Abstract: A double-side display device mainly employs the advantage of the transparent cathode that enables an OLED display device to illuminate on two sides concurrently or adopts a novel design for a conventional single side display OLED such that only one driving module is needed to output signals to display the same picture on the positive (anode) side and the negative (cathode) side concurrently. While the displayed pictures and characters are inverse in terms of the left and the right directions, they may be controlled and rectified through software. Thus on the same OLED display panel, two large display zones may be designed and setup to display on the positive (anode) side and the negative (cathode) side.