Patents by Inventor Fang Shi
Fang Shi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 12360058Abstract: A photomask-inspection system includes a vacuum chamber and a stage, disposed in the vacuum chamber, to support a photomask and to translate the photomask horizontally and vertically. The system also includes an EUV objective, disposed in the vacuum chamber, to collect EUV light from the photomask to inspect the photomask for defects and an optical height sensor, at least partially disposed in the vacuum chamber, to measure heights on a surface of the photomask. The system further includes a stage controller to translate the stage horizontally and vertically in accordance with a focal map for the photomask produced using the measured heights on the surface of the photomask.Type: GrantFiled: June 21, 2021Date of Patent: July 15, 2025Assignee: KLA CorporationInventors: Zefram Marks, Dmitry Skvortsov, Zhengyu Guo, Zhengcheng Lin, Nicolas Steven Juliano, Rui-Fang Shi
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Publication number: 20250216254Abstract: A reflective imaging system disclosed herein includes an illumination source for generating a broad wavelength extreme ultraviolet (EUV) illumination beam, a reflective spectral filter for spectrally filtering the EUV illumination beam to direct spectrically filtered EUV light along a first optical path and reflect out-of-band (OOB) light along a second optical path, one or more detectors to detect the reflected spectrally filtered EUV light and OOB light, and a controller configured to obtain light data from the one or more detectors. The present disclosure further provides a method of spectrally filtering broad wavelength EUV light and embodiments of grating based EUV spectral filters.Type: ApplicationFiled: December 20, 2024Publication date: July 3, 2025Inventors: Alon Rosenthal, Rajeev Rajendran, Farid Atry, Yun Xie, Rui-Fang Shi
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Publication number: 20250164895Abstract: A substrate is mounted on a chuck in a chamber of an EUV tool. An illumination aperture in the chamber provides a beam of light to illuminate the substrate on the chuck. The beam of light includes extreme ultraviolet (EUV) in-band (IB) light and out-of-band (OOB) light. The OOB light has longer wavelengths than the EUV IB light. A beam-narrowing aperture in the chamber, which is switchable into and out of a path for the beam of light, selectively narrows the beam of light to illuminate the substrate. A band-selection filter filters out the OOB light or the EUV IB light. Imaging optics in the chamber relay light from the substrate to an imaging plane. A grating spectrally disperses the light from the substrate. A sensor detects the light from the substrate as relayed by the imaging optics and spectrally dispersed by the grating.Type: ApplicationFiled: November 20, 2023Publication date: May 22, 2025Inventors: Rajeev Rajendran, Michael Xie, Farid Atry, Florian Melsheimer, Rui-Fang Shi
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Patent number: 12225139Abstract: A method and device for issuing an identity certificate to a blockchain node in a blockchain network includes issuing a first identity certificate to a first terminal. a second identity certificate issuance request that is from the first terminal and that is made by using the first identity certificate is received and a second identity certificate is issued to the first terminal, which forwards the second identity certificate to a second terminal. A third identity certificate issuance request that is from the second terminal and that is made by using the second identity certificate is received and a third identity certificate is issued to the second terminal, which forwards the third identity certificate to a third terminal.Type: GrantFiled: February 15, 2024Date of Patent: February 11, 2025Assignee: TENCENT TECHNOLOGY (SHENZHEN) COMPANY LIMITEDInventors: Mao Cai Li, Zong You Wang, Kai Ban Zhou, Chang Qing Yang, Hu Lan, Li Kong, Jin Song Zhang, Yi Fang Shi, Geng Liang Zhu, Qu Cheng Liu, Qiu Ping Chen
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Publication number: 20250026175Abstract: The present invention relates to a method for controlling an air conditioning outlet of a vehicle, including: collecting an ambient temperature and a user set temperature; determining a target value according to the ambient temperature and the user set temperature; determining a target working mode from a plurality of preset working modes of an air conditioning outlet according to the target value, the working mode including a preset air outlet direction; and enabling the air conditioning outlet to work in the target working mode.Type: ApplicationFiled: July 18, 2024Publication date: January 23, 2025Inventors: Qin Huang, Takeshi Matsushita, Shimpei Higami, Masaki Sekiguchi, Takashi Horiuchi, Fang Shi, Maofang Li, Yangyang Xu
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Publication number: 20240426891Abstract: A high-impedance fault positioning method and system based on synchronous Lissajous curve characteristics are provided. The method includes: acquiring a bus zero-sequence differential voltage and a feeder zero-sequence current of a faulty line; constructing a first Lissajous curve in a characteristic frequency band range based on the bus zero-sequence differential voltage and the feeder zero-sequence current; when the proportion of the faulty line is less than a set threshold value and the slope of the first Lissajous curve is negative, determining that high-impedance faults have occurred in the faulty line; constructing a second Lissajous curve based on the bus zero-sequence differential voltage and the section zero-sequence current, performing linear fitting on discrete data points of the second Lissajous curve to obtain a fitted curve; and when the slope of the fitted curve is negative for at least three consecutive periods, determining that high-impedance faults have occurred in the section.Type: ApplicationFiled: March 21, 2024Publication date: December 26, 2024Applicant: Shandong UniversityInventors: Fang SHI, Hengxu ZHANG, Zhaoru HAN, Zongshuai JIN, Xiaobin WANG
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Patent number: 12133318Abstract: An extreme ultraviolet (EUV) light source includes a vacuum chamber with a rotating target assembly therein. The rotating target assembly has an annular groove with a distal wall relative to an axis of rotation. The distal wall includes a porous region. The rotating target assembly is rotated to form a target by centrifugal force with a layer of molten metal on a distal wall of an annular groove in the rotating target assembly.Type: GrantFiled: December 30, 2022Date of Patent: October 29, 2024Assignee: KLA CorporationInventors: Alexander Bykanov, Rui-Fang Shi
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Publication number: 20240353318Abstract: Methods and systems for inspecting a photomask are provided. One system includes an illumination subsystem configured to direct light to the photomask. The system also includes a pupil filter positioned in a path of only the light from the photomask and configured for controlling a polarization of the light in the path by mixing four elements in a Jones matrix for the photomask in a coherent manner. In addition, the system includes a detector configured for detecting the light from the pupil filter and generating output responsive to the detected light. The system further includes a computer subsystem configured for detecting defects on the photomask based on the output.Type: ApplicationFiled: January 22, 2024Publication date: October 24, 2024Inventors: Yun Xie, Rui-Fang Shi, Xin Ye, Heng Zhang
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Patent number: 12092814Abstract: An optical system with aberration correction is disclosed. The optical system may include an illumination source. The optical system may include a detector. The optical system may include one or more collection optics configured to image a sample onto the detector based on illumination from the illumination source. The optical system may include two or more aberration correction plates located in one or more pupil planes of the one or more collection optics. The two or more aberration correction plates may provide at least partial correction of two or more linearly-independent aberration terms. Any particular one of the two or more aberration correction plates may have a spatially-varying thickness profile providing a selected amount of correction for a single particular aberration term of the two or more linearly-independent aberration terms.Type: GrantFiled: January 12, 2022Date of Patent: September 17, 2024Assignee: KLA CorporationInventors: Haifeng Huang, Rui-Fang Shi, Joseph Walsh, Mitchell Lindsay, Eric Vella
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Patent number: 12094101Abstract: Disclosed are methods and apparatus for inspecting a photolithographic reticle. A plurality of reference far field images are simulated by inputting a plurality of reference near field images into a physics-based model, and the plurality of reference near field images are generated by a trained deep learning model from a test portion of the design database that was used to fabricate a test area of a test reticle. The test area of a test reticle, which was fabricated from the design database, is inspected for defects via a die-to-database process that includes comparing the plurality of reference far field reticle images simulated by the physic-based model to a plurality of test images acquired by the inspection system from the test area of the test reticle.Type: GrantFiled: November 24, 2021Date of Patent: September 17, 2024Assignee: KLA-TENCOR CORPORATIONInventors: Hawren Fang, Abdurrahman Sezginer, Rui-fang Shi
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Publication number: 20240195638Abstract: A method and device for issuing an identity certificate to a blockchain node in a blockchain network includes issuing a first identity certificate to a first terminal. a second identity certificate issuance request that is from the first terminal and that is made by using the first identity certificate is received and a second identity certificate is issued to the first terminal, which forwards the second identity certificate to a second terminal. A third identity certificate issuance request that is from the second terminal and that is made by using the second identity certificate is received and a third identity certificate is issued to the second terminal, which forwards the third identity certificate to a third terminal.Type: ApplicationFiled: February 15, 2024Publication date: June 13, 2024Applicant: Tencent Technology (Shenzhen) Company LimitedInventors: Mao Cai LI, Zong You WANG, Kai Ban ZHOU, Chang Qing YANG, Hu LAN, Li KONG, Jin Song ZHANG, Yi Fang SHI, Geng Liang ZHU, Qu Cheng LIU, Qiu Ping CHEN
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Patent number: 11943373Abstract: An identity certificate may be issued to a blockchain node. The issuance may include issuing a first identity certificate to a first terminal and receiving a second identity certificate issuance request that is from the first terminal. A second identity certificate may be issued to the first terminal, and a third identity certificate issuance request is received from the second terminal. A third identity certificate is issued to the second terminal, so that the second terminal forwards the third identity certificate to the third terminal.Type: GrantFiled: June 2, 2021Date of Patent: March 26, 2024Assignee: TENCENT TECHNOLOGY (SHENZHEN) COMPANY LIMITEDInventors: Mao Cai Li, Zong You Wang, Kai Ban Zhou, Chang Qing Yang, Hu Lan, Li Kong, Jin Song Zhang, Yi Fang Shi, Geng Liang Zhu, Qu Cheng Liu, Qiu Ping Chen
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Patent number: 11895242Abstract: A blockchain network includes a service sub-network, a consensus sub-network, and a routing layer configured to isolate the service sub-network from the consensus sub-network. A data processing method in the blockchain network includes: receiving a data processing request transmitted by a service node in the service sub-network; performing identity verification on the service node according to the data processing request; obtaining a running load of each consensus node in the consensus sub-network when the verification succeeds; determining, from the consensus sub-network according to the running load, a target consensus node configured to process the data processing request; and forwarding the data processing request to the target consensus node, and performing corresponding data processing on the data processing request by using the target consensus node.Type: GrantFiled: March 10, 2021Date of Patent: February 6, 2024Assignee: TENCENT TECHNOLOGY (SHENZHEN) COMPANY LIMITEDInventors: Mao Cai Li, Geng Liang Zhu, Zong You Wang, Li Kong, Hu Lan, Kai Ban Zhou, Chang Qing Yang, Yi Fang Shi, Qui Ping Chen, Qu Cheng Liu, Jin Song Zhang, Pan Liu
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Publication number: 20230418167Abstract: A system and method for cleaning an optical element of an EUV optical system is disclosed. The system and method may include receiving design data of one or more samples. The system and method may include simulating a plurality of irradiance distributions at a plane of an EUV optical sub-system based on the design data and one or more parameters. The system and method may include aggregating the plurality of irradiance distributions to generate an aggregated irradiance distribution. The system and method may include determining a predicted contaminate distribution based on both the aggregated irradiance distribution and a contaminate growth rate. The system and method may include determining a cleaning recipe for the one or more optical elements based on the predicted contaminate distribution.Type: ApplicationFiled: September 13, 2022Publication date: December 28, 2023Inventors: Yun Xie, Rui-Fang Shi, Shannon Hill
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Patent number: 11849052Abstract: A method for replacing an identity certificate in a blockchain network includes a service subnet, a consensus subnet, and a routing layer used for isolating the service subnet from the consensus subnet. The method includes: receiving a root certificate replacement notification transmitted by a certificate authentication center; obtaining a public key corresponding to the certificate authentication center; verifying the root certificate replacement notification by using the obtained public key; forwarding the root certificate replacement notification to a consensus node in the consensus subnet after the validation succeeds, so that the consensus node records the root certificate replacement notification into a latest data block after a consensus on the root certificate replacement notification is reached; and requesting, when the data block is received, the certificate authentication center to replace an identity certificate.Type: GrantFiled: January 21, 2021Date of Patent: December 19, 2023Assignee: TENCENT TECHNOLOGY (SHENZHEN) COMPANY LIMITEDInventors: Mao Cai Li, Geng Liang Zhu, Hu Lan, Zong You Wang, Li Kong, Kai Ban Zhou, Chang Qing Yang, Qiu Ping Chen, Qu Cheng Liu, Yi Fang Shi, Jin Song Zhang, Pan Liu
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Publication number: 20230403778Abstract: An extreme ultraviolet (EUV) light source includes a vacuum chamber with a rotating target assembly therein. The rotating target assembly has an annular groove with a distal wall relative to an axis of rotation. The distal wall includes a porous region. The rotating target assembly is rotated to form a target by centrifugal force with a layer of molten metal on a distal wall of an annular groove in the rotating target assembly.Type: ApplicationFiled: December 30, 2022Publication date: December 14, 2023Inventors: Alexander Bykanov, Rui-Fang Shi
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Publication number: 20230341760Abstract: A photomask includes a plurality of distinctly patterned regions to provide different respective intensities of extreme ultraviolet (EUV) light in response to illumination with an EUV beam. The photomask may be part of a system that also includes a time-delay-integration (TDI) inspection tool with an EUV light source and a TDI sensor. The EUV light source is to generate the EUV beam. The photomask is to be loaded into the TDI inspection tool. The system further includes a reference intensity detector to be mounted in the TDI inspection tool to measure intensities of EUV light collected from the photomask.Type: ApplicationFiled: June 28, 2023Publication date: October 26, 2023Inventors: Haifeng Huang, Damon Kvamme, Rui-Fang Shi
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Patent number: 11733605Abstract: To calibrate a TDI photomask inspection tool, a photomask with a plurality of distinctly patterned regions is loaded into the tool. The plurality of distinctly patterned regions is successively illuminated with an EUV beam of light. While illuminating respective distinctly patterned regions, respective instances of imaging of the respective distinctly patterned regions are performed using a TDI sensor in the inspection tool. While performing the respective instances of imaging, a reference intensity detector is used to measure reference intensities of EUV light collected from the photomask. Based on the results of the respective instances of imaging and the measured reference intensities of EUV light, linearity of the TDI sensor is determined.Type: GrantFiled: June 12, 2020Date of Patent: August 22, 2023Assignee: KLA CorporationInventors: Haifeng Huang, Damon Kvamme, Rui-Fang Shi
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Patent number: 11494270Abstract: A data backup method includes querying a first block of a first blockchain for unused transaction output information based on a first condition being met, the first block including each block of all blocks included in the first blockchain; generating transaction information according to the unused transaction output information obtained based on the querying, the transaction information indicating a transaction operation based on an account address to which the unused transaction output information belongs; recording the transaction information in a second block and releasing the second block, and recording the second block on which a consensus is reached on a second blockchain; and backing up the first blockchain into a storage system, and deleting the first blockchain. Counterpart apparatus, terminal, server, and/or non-transitory computer-readable medium are also contemplated.Type: GrantFiled: October 8, 2020Date of Patent: November 8, 2022Assignee: TENCENT TECHNOLOGY (SHENZHEN) COMPANY LTDInventors: Rui Guo, Mao Cai Li, Zong You Wang, Hai Tao Tu, Li Kong, Kai Ban Zhou, Chang Qing Yang, Nan Wang, Yong Ding, Yi Fang Shi
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Patent number: 11481479Abstract: A system may include a fingerprint scanner and a magnetic switch coupled to the fingerprint scanner. The magnetic switch may couple a lid of a computing device to abase of a computing device. The system may further include an infrared (IR) scanner coupled to the magnetic switch. Additionally, the system may include an electronic switch coupled to the IR scanner.Type: GrantFiled: September 28, 2017Date of Patent: October 25, 2022Assignee: Hewlett-Packard Development Company, L.P.Inventors: Kuan-Ting Wu, Wei-Chung Chen, Xuan-Fang Shi