Abstract: A catalyst is provided for fuel reformation with its preparation method. The catalyst is an oxide catalyst of nickel (Ni), lanthanum (La), and cerium (Ce); and is loaded on a honeycomb support substrate. The catalyst comprises an oxide layer of Ni and La; and an oxide layer of Ce between the honeycomb support substrate and the oxide layer of Ni and La. The oxide layer of Ni and La comprises a 10˜20 weight percent (wt %) of Ni and a 1˜20 wt % of rare earth element La. The oxide layer of Ce comprises a 1˜20 wt % of rare earth element Ce. The present invention is applied to solid oxide fuel cell (SOFC) for enhancing the methane conversion rate, heightening the reliability and durability of long-term operation, and improving the energy use efficiency.

Abstract: An apparatus of solid oxide fuel cells (SOFC) is provided. The SOFCs generate power and are grid-tied. The apparatus comprises a power-generating side; and a grid-connecting side using an elementary household power management. The apparatus solves problems like low voltage, high current, voltage oscillation, voltage dips, long generator-starting time, etc. The apparatus is not only used as a stable power supply (base load), but also helps adjust the regional peak electricity demands. The features include the following: 1. A grid is tied, where output power does not pass through a direct-current boost converter and, thus, has no loss from it. 2. Injures, including voltage oscillation and sudden unloading after dumping, are reduced for avoiding further damages to cell sheets. 3. With the coordination of elementary power management and the integration of grid, the limitation of long-awaiting generator-starting time is crossed out and convenience of immediate power use is achieved.

Abstract: An apparatus of solid oxide fuel cells (SOFC) is provided. The SOFCs generate power and are grid-tied. The apparatus comprises a power-generating side; and a grid-connecting side using an elementary household power management. The apparatus solves problems like low voltage, high current, voltage oscillation, voltage dips, long generator-starting time, etc. The apparatus is not only used as a stable power supply (base load), but also helps adjust the regional peak electricity demands. The features include the following: 1. A grid is tied, where output power does not pass through a direct-current boost converter and, thus, has no loss from it. 2. Injures, including voltage oscillation and sudden unloading after dumping, are reduced for avoiding further damages to cell sheets. 3. With the coordination of elementary power management and the integration of grid, the limitation of long-awaiting generator-starting time is crossed out and convenience of immediate power use is achieved.

Abstract: A method of fabricating a polarized color filter wherein a transparent substrate is provided and coated with a photoresist layer. A wave-shaped mask may then be prepared and a periodic wave-shaped surface may be placed in contact with the photoresist layer, treating the photoresist layer with a primary exposure process. An external force may be applied to the wave-shaped mask, and the transparent substrate or wave-shaped mask by be rotated by a predetermined degree. The photoresist layer may be treated with a secondary exposure process, wherein the photoresist layer is developed in order to obtain a photoresist pattern layer. A metal layer may be coated on the transparent substrate with the photoresist pattern layer. The photoresist pattern layer and the portion of the metal layer on the photoresist pattern layer may then be removed such that the remaining metal layer forms a periodic hole substrate.

Abstract: A wave-shaped mask for fabricating a nano-scale structure is disclosed. The wave-shaped mask comprises an elastomeric transparent substrate having an upper surface and a lower surface, and a light-penetrable thin film layer disposed on the upper surface of the elastomeric transparent substrate. The upper surface of the elastomeric transparent substrate and the light-penetrable thin film layer are in a periodic wave shape, and the lower surface of the elastomeric transparent substrate is in a plate shape.

Abstract: A method of fabricating wave-shaped mask is disclosed. The method of fabricating wave-shaped mask comprises the steps of providing an elastomeric transparent substrate comprising an upper surface and a lower surface, applying a stable force to the elastomeric transparent substrate for deforming the elastomeric transparent substrate, forming a light-penetrable thin film layer on the upper surface of the elastomeric transparent substrate, and removing the force applying to the elastomeric transparent substrate, whereby the upper surface of the elastomeric transparent substrate and the light-penetrable thin film layer are in a periodic wave shape and the lower surface of the elastomeric transparent substrate is in a plate shape.

Abstract: A method of fabricating a polarized color filter wherein a transparent substrate is provided and coated with a photoresist layer. A wave-shaped mask may then be prepared and a periodic wave-shaped surface may be placed in contact with the photoresist layer, treating the photoresist layer with a primary exposure process. An external force may be applied to the wave-shaped mask, and the transparent substrate or wave-shaped mask by be rotated by a predetermined degree. The photoresist layer may be treated with a secondary exposure process, wherein the photoresist layer is developed in order to obtain a photoresist pattern layer. A metal layer may be coated on the transparent substrate with the photoresist pattern layer. The photoresist pattern layer and the portion of the metal layer on the photoresist pattern layer may then be removed such that the remaining metal layer forms a periodic hole substrate.

Abstract: A method of fabricating wave-shaped mask is disclosed. The method of fabricating wave-shaped mask comprises the steps of providing an elastomeric transparent substrate comprising an upper surface and a lower surface, applying a stable force to the elastomeric transparent substrate for deforming the elastomeric transparent substrate, forming a light-penetrable thin film layer on the upper surface of the elastomeric transparent substrate, and removing the force applying to the elastomeric transparent substrate, whereby the upper surface of the elastomeric transparent substrate and the light-penetrable thin film layer are in a periodic wave shape and the lower surface of the elastomeric transparent substrate is in a plate shape.

Abstract: A wave-shaped mask for fabricating a nano-scale structure is disclosed. The wave-shaped mask comprises an elastomeric transparent substrate having an upper surface and a lower surface, and a light-penetrable thin film layer disposed on the upper surface of the elastomeric transparent substrate. The upper surface of the elastomeric transparent substrate and the light-penetrable thin film layer are in a periodic wave shape, and the lower surface of the elastomeric transparent substrate is in a plate shape.