Patents by Inventor Fangqian Teng

Fangqian Teng has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Infrared sensitive photosensitive composition and lithographic plate fabricated by using same
    Patent number: 8722309
    Abstract: An infrared sensitive and chemical treatment free photosensitive composition, includes, based on weight percentage, 30-70% of a water soluble thermally cross-linking resin, 1-20% of a water-soluble photocross-linking polymerized resin, 10-50% of a photopolymerizable oligomer, 1-30% of a multifunctional monomer, 1-20% of a cationic photopolymerization initiator, and 1-20% of an infrared irradiation absorption dye. The photosensitive composition of the present invention is useful for preparation of an infrared sensitive and chemical treatment free lithographic plate. The lithographic plate of the present invention has a high sensitivity and a good mesh point reduction, and after exposure to an infrared light source, can be printed directly after being washed with tapped water or without any washing and processing step, and has a long run length.
    Type: Grant
    Filed: December 23, 2011
    Date of Patent: May 13, 2014
    Assignee: Lucky Huaguang Graphics Co., Ltd.
    Inventors: Qinghai Yang, Fangqian Teng, Xiaowei Song, Hecheng Li, Zhaoyang Wu, Junjun Wu, Xiaohong Chen, Dongli Liu
  • Infrared Sensitive Photosensitive Composition and Lithographic Plate Fabricated by Using Same
    Publication number: 20130052436
    Abstract: An infrared sensitive and chemical treatment free photosensitive composition, includes, based on weight percentage, 30-70% of a water soluble thermally cross-linking resin, 1-20% of a water-soluble photocross-linking polymerized resin, 10-50% of a photopolymerizable oligomer, 1-30% of a multifunctional monomer, 1-20% of a cationic photopolymerization initiator, and 1-20% of an infrared irradiation absorption dye. The photosensitive composition of the present invention is useful for preparation of an infrared sensitive and chemical treatment free lithographic plate. The lithographic plate of the present invention has a high sensitivity and a good mesh point reduction, and after exposure to an infrared light source, can be printed directly after being washed with tapped water or without any washing and processing step, and has a long run length.
    Type: Application
    Filed: December 23, 2011
    Publication date: February 28, 2013
    Applicant: LUCKY HUAGUANG GRAPHICS CO., LTD.
    Inventors: Qinghai Yang, Fangqian Teng, Xiaowei Song, Hecheng Li, Zhaoyang Wu, Junjun Wu, Xiaohong Chen, Dongli Liu