Patents by Inventor Fardad Hashemi
Fardad Hashemi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11788833Abstract: Method and system for defining basis functions for fitting distortions of profiles of objects in a batch, that has undergone a fabrication process, in a manner adaptable to the fabrication process to reduce the errors between profiles approximated with the use of such basis functions and actual object profiles. Process-specific individual basis functions are defined based on spatially-dense measurement of objects from training sub-set of the batch and applying learning algorithm to results of such measurement. Advantages of process-adaptable basis functions over generic basis functions for fitting distortion shapes of objects include higher accuracy of fitting either at larger or a fewer locations across the object.Type: GrantFiled: May 29, 2020Date of Patent: October 17, 2023Assignee: Nikon CorporationInventors: Travis D. Bow, Henry Pang, Fardad A. Hashemi
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Patent number: 10990024Abstract: Lithographic exposure tool and method for operating thereof are provided that includes modification of the tool (assessed based on the measurements of geometrical distortions caused, in the tool, by the exposure process and used to train the exposure tool) to ensure that such geometrical distortions are reduced for any chosen exposure process. The method includes processing first data (representing distortions caused by initial exposure run(s)) to estimate second data (representing distortions that would occur for another exposure run); and forming a modified exposure tool by changing at least one of a) a geometrical path or a path along which the workpiece stage is repositioned during the operation of the exposure tool; b) one or more of a presence, position, orientation, size and shape of an optical component of an optical projection sub-system of the optical system of the exposure tool; and c) a parameter of scanning synchronization of the exposure tool.Type: GrantFiled: August 29, 2019Date of Patent: April 27, 2021Assignee: Nikon Research Corporation of AmericaInventors: Travis Bow, Fardad Hashemi, Henry Kin Heng Pang
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Publication number: 20200292304Abstract: Method and system for defining basis functions for fitting distortions of profiles of objects in a batch, that has undergone a fabrication process, in a manner adaptable to the fabrication process to reduce the errors between profiles approximated with the use of such basis functions and actual object profiles. Process-specific individual basis functions are defined based on spatially-dense measurement of objects from training sub-set of the batch and applying learning algorithm to results of such measurement. Advantages of process-adaptable basis functions over generic basis functions for fitting distortion shapes of objects include higher accuracy of fitting either at larger or a fewer locations across the object.Type: ApplicationFiled: May 29, 2020Publication date: September 17, 2020Inventors: Travis D. Bow, Henry Pang, Fardad A. Hashemi
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Patent number: 10718606Abstract: Method and system for defining basis functions for fitting distortions of profiles of objects in a batch, that has undergone a fabrication process, in a manner adaptable to the fabrication process to reduce the errors between profiles approximated with the use of such basis functions and actual object profiles. Process-specific individual basis functions are defined based on spatially-dense measurement of objects from training sub-set of the batch and applying learning algorithm to results of such measurement. Advantages of process-adaptable basis functions over generic basis functions for fitting distortion shapes of objects include higher accuracy of fitting either at larger or a fewer locations across the object.Type: GrantFiled: April 14, 2016Date of Patent: July 21, 2020Assignee: Nikon CorporationInventors: Travis D. Bow, Henry Pang, Fardad A. Hashemi
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Publication number: 20200096872Abstract: Lithographic exposure tool and method for operating thereof are provided that includes modification of the tool (assessed based on the measurements of geometrical distortions caused, in the tool, by the exposure process and used to train the exposure tool) to ensure that such geometrical distortions are reduced for any chosen exposure process. The method includes processing first data (representing distortions caused by initial exposure run(s)) to estimate second data (representing distortions that would occur for another exposure run); and forming a modified exposure tool by changing at least one of a) a geometrical path or a path along which the workpiece stage is repositioned during the operation of the exposure tool; b) one or more of a presence, position, orientation, size and shape of an optical component of an optical projection sub-system of the optical system of the exposure tool; and c) a parameter of scanning synchronization of the exposure tool.Type: ApplicationFiled: August 29, 2019Publication date: March 26, 2020Inventors: Travis Bow, Fardad Hashemi, Henry Kin Heng Pang
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Patent number: 10444643Abstract: Lithographic exposure tool and method for operating thereof that includes modification of the tool (assessed based on the measurements of geometrical distortions caused, in the tool, by the exposure process and used to train the exposure tool) to ensure that such geometrical distortions are reduced for any chosen exposure process. The method includes processing first data (representing distortions caused by initial exposure run(s)) to estimate second data representing distortions that would occur for another exposure run); and forming a modified exposure tool by changing at least one of a) a geometrical path is a path along which the workpiece stage is repositioned during the operation of the exposure tool; b) one or more of a presence, position, orientation, size and shape of an optical component of an optical projection sub-system of the optical system of the exposure tool; and c) a parameter of scanning synchronization of the exposure tool.Type: GrantFiled: March 26, 2018Date of Patent: October 15, 2019Assignee: Nikon Research Corporation of AmericaInventors: Travis Bow, Fardad Hashemi, Henry Kin Heng Pang
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Patent number: 10259104Abstract: A clamp for selectively inhibiting movement of a first object relative to a second object includes (i) a first clamp component coupled to the first object; (ii) a second clamp component coupled to the second object; and (iii) a fluid source that directs a fluid to the second clamp component to create a fluid bearing between the first clamp component and the second clamp component that allows for movement of the first clamp component relative to the second clamp component, and wherein the fluid source directs less fluid to the second clamp component to inhibit relative movement.Type: GrantFiled: October 28, 2014Date of Patent: April 16, 2019Assignee: NIKON CORPORATIONInventors: Fardad A. Hashemi, Travis D. Bow, Patrick Chang
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Publication number: 20180275525Abstract: Lithographic exposure tool and method for operating thereof that includes modification of the tool (assessed based on the measurements of geometrical distortions caused, in the tool, by the exposure process and used to train the exposure tool) to ensure that such geometrical distortions are reduced for any chosen exposure process. The method includes processing first data (representing distortions caused by initial exposure run(s)) to estimate second data representing distortions that would occur for another exposure run); and forming a modified exposure tool by changing at least one of a) a geometrical path is a path along which the workpiece stage is repositioned during the operation of the exposure tool; b) one or more of a presence, position, orientation, size and shape of an optical component of an optical projection sub-system of the optical system of the exposure tool; and c) a parameter of scanning synchronization of the exposure tool.Type: ApplicationFiled: March 26, 2018Publication date: September 27, 2018Applicant: NIKON RESEARCH CORPORATION OF AMERICAInventors: Travis Bow, Fardad Hashemi, Henry Kin Heng Pang
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Patent number: 9947637Abstract: A system and method for clamping wafers together in alignment using pressure. The system and method involves holding a first wafer and a second wafer together in alignment using a wafer clamp within an ambient environment maintained at a first pressure and creating a second pressure at least partially around and between the first wafer and the second wafer held together by the wafer clamp, wherein the first pressure is greater than the second pressure. The first wafer and the second wafer are clamped together in alignment using a pneumatic force created by a pressure differential between the first pressure and the second pressure.Type: GrantFiled: October 21, 2014Date of Patent: April 17, 2018Assignee: NIKON CORPORATIONInventors: Alton H. Phillips, Fardad A. Hashemi
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Publication number: 20160305772Abstract: Method and system for defining basis functions for fitting distortions of profiles of objects in a batch, that has undergone a fabrication process, in a manner adaptable to the fabrication process to reduce the errors between profiles approximated with the use of such basis functions and actual object profiles. Process-specific individual basis functions are defined based on spatially-dense measurement of objects from training sub-set of the batch and applying learning algorithm to results of such measurement. Advantages of process-adaptable basis functions over generic basis functions for fitting distortion shapes of objects include higher accuracy of fitting either at larger or a fewer locations across the object.Type: ApplicationFiled: April 14, 2016Publication date: October 20, 2016Inventors: Travis D. Bow, Henry Pang, Fardad A. Hashemi
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Patent number: 9341942Abstract: A chamber assembly (26) for providing a sealed chamber (40) adjacent to a workpiece (28) to counteract the influence of gravity on the workpiece (28) includes a chamber housing (244), and a seal assembly (33) that expands and/or contracts to better seal against the workpiece (28). Further, the chamber assembly (26) can include one or more transducer assemblies (34) that expand or contract to quickly respond to leaks or injections of fluid in chamber assembly (26) to maintain a constant and stable chamber pressure in the chamber assembly (26). Moreover, the chamber assembly (26) can utilize a pressure source (35) that directs a lager amount of fluid (374) through a fluid passageway (368) to accurately maintain the pressure within the chamber assembly (26).Type: GrantFiled: August 23, 2011Date of Patent: May 17, 2016Assignee: Nikon Research Corporation of AmericaInventors: Fardad Hashemi, Douglas C. Watson, Lorri L. Watson
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Publication number: 20150122412Abstract: A system and method for clamping wafers together in alignment using pressure. The system and method involves holding a first wafer and a second wafer together in alignment using a wafer clamp within an ambient environment maintained at a first pressure and creating a second pressure at least partially around and between the first wafer and the second wafer held together by the wafer clamp, wherein the first pressure is greater than the second pressure. The first wafer and the second wafer are clamped together in alignment using a pneumatic force created by a pressure differential between the first pressure and the second pressure.Type: ApplicationFiled: October 21, 2014Publication date: May 7, 2015Inventors: Alton H. PHILLIPS, Fardad A. HASHEMI
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Publication number: 20150115513Abstract: A clamp for selectively inhibiting movement of a first object relative to a second object includes (i) a first clamp component coupled to the first object; (ii) a second clamp component coupled to the second object; and (iii) a fluid source that directs a fluid to the second clamp component to create a fluid bearing between the first clamp component and the second clamp component that allows for movement of the first clamp component relative to the second clamp component, and wherein the fluid source directs less fluid to the second clamp component to inhibit relative movement.Type: ApplicationFiled: October 28, 2014Publication date: April 30, 2015Inventors: Fardad A. Hashemi, Travis D. Bow, Patrick Chang
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Patent number: 8941814Abstract: An exemplary device includes first and second portions that are movably connected together by first and second sets, respectively, of multiple blades interleaved with each other at an overlap region. When the overlap region is compressed, displacement of the first and second portions relative to each other is prevented so as to provide relatively high stiffness in first and second orthogonal directions (e.g., z- and y-directions) and relatively low stiffness in a third orthogonal direction (e.g., x-direction). The device can be used in coordination with an actuator, wherein operation of the actuator and compression of the overlap region are automated.Type: GrantFiled: June 19, 2012Date of Patent: January 27, 2015Assignee: Nikon CorporationInventors: Fardad Hashemi, Christopher S. Margeson, Lorri L. Watson
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Patent number: 8772999Abstract: An electromechanical resonating structure, including: first level major elements coupled to each other to form a second or higher level hierarchy; and first level sub-micron size minor elements with a characteristic frequency and coupled to each of the first level major elements to form a second level hierarchy in which a signal is effectively amplified by vibrating each of the plurality of major elements in at least one mode determined by the geometry and dimensions of the first level sub-micron minor elements.Type: GrantFiled: October 11, 2007Date of Patent: July 8, 2014Assignee: Sand 9, Inc.Inventors: Pritiraj Mohanty, Alexei Gaidarzhy, Guiti Zolfagharkhani, Fardad Hashemi
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Publication number: 20130250271Abstract: A stage assembly (10) that moves a device (22) includes a device holder (20) that selectively retains the device (22). The device holder (20) includes a pivot (330) that engages the device (22), and a pressure source (326) that creates (i) a pressure controlled, distal zone (336A) that is at a distal pressure, and (ii) a pressure controlled, proximal zone (338A) that is at a proximal pressure. The distal zone (336A) generates a distal moment (344A) and the proximal zone (336B) generates a proximal moment (346A) that can be used to control the shape of the device (22).Type: ApplicationFiled: February 15, 2013Publication date: September 26, 2013Applicant: NIKON CORPORATIONInventors: Alton H. Phillips, Fardad Hashemi, Takeshi Matsuda
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Publication number: 20130155385Abstract: A chamber assembly (26) for providing a sealed chamber (40) adjacent to a workpiece (28) to counteract the influence of gravity on the workpiece (28) includes a chamber housing (244), and a seal assembly (33) that expands and/or contracts to better seal against the workpiece (28). Further, the chamber assembly (26) can include one or more transducer assemblies (34) that expand or contract to quickly respond to leaks or injections of fluid in chamber assembly (26) to maintain a constant and stable chamber pressure in the chamber assembly (26). Moreover, the chamber assembly (26) can utilize a pressure source (35) that directs a lager amount of fluid (374) through a fluid passageway (368) to accurately maintain the pressure within the chamber assembly (26).Type: ApplicationFiled: August 23, 2011Publication date: June 20, 2013Applicant: NIKON CORPORATIONInventors: Fardad Hashemi, Douglas C. Watson
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Patent number: 8441615Abstract: A precision assembly (10) for fabricating a substrate (42) includes a precision fabrication apparatus (12), a pedestal assembly (14) and a suspension system (16). The precision fabrication apparatus (12) fabricates the substrate (42). The pedestal assembly (14) supports at least a portion of the fabrication apparatus (12). The suspension system (16) inhibits the transfer of motion between the mounting base (20) and the pedestal assembly (14). The suspension system (16) can include (i) a first boom (380) that is coupled to the mounting base (20) and the pedestal assembly (14), the first boom (380) being pivotable coupled to at least one of the mounting base (20) and the pedestal assembly (14), and (ii) a first resilient assembly (382) that is coupled between the mounting base (20) and at least one of the first boom (380) and the pedestal assembly (14). The first resilient assembly (382) can function similar to a zero length spring over an operational range of the resilient assembly (382).Type: GrantFiled: August 27, 2009Date of Patent: May 14, 2013Assignee: Nikon CorporationInventors: Fardad A. Hashemi, Douglas C. Watson, Christopher Margeson
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Publication number: 20120320362Abstract: An exemplary device includes first and second portions that are movably connected together by first and second sets, respectively, of multiple blades interleaved with each other at an overlap region. When the overlap region is compressed, displacement of the first and second portions relative to each other is prevented so as to provide relatively high stiffness in first and second orthogonal directions (e.g., z- and y-directions) and relatively low stiffness in a third orthogonal direction (e.g., x-direction). The device can be used in coordination with an actuator, wherein operation of the actuator and compression of the overlap region are automated.Type: ApplicationFiled: June 19, 2012Publication date: December 20, 2012Inventors: Douglas C. Watson, Fardad Hashemi, Christopher S. Margeson, Lorri L. Watson
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Publication number: 20110121682Abstract: An electromechanical resonating structure, including: first level major elements coupled to each other to form a second or higher level hierarchy; and first level sub-micron size minor elements with a characteristic frequency and coupled to each of the first level major elements to form a second level hierarchy in which a signal is effectively amplified by vibrating each of the plurality of major elements in at least one mode determined by the geometry and dimensions of the first level sub-micron minor elements.Type: ApplicationFiled: October 11, 2007Publication date: May 26, 2011Applicant: Sand9, Inc.Inventors: Pritiraj Mohanty, Alexei Gaidarzhy, Guiti Zolfagharkhani, Fardad Hashemi