Patents by Inventor Farhana Khan

Farhana Khan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Compositions and methods for dielectric CMP
    Patent number: 7677956
    Abstract: The invention is directed to a chemical-mechanical polishing composition comprising (a) an abrasive consisting essentially of aggregated silica, (b) an acid, and (c) a liquid carrier, wherein the polishing composition has a pH of about 5 or less. The invention is also directed to a method of polishing a substrate comprising a dielectric layer using the polishing composition.
    Type: Grant
    Filed: May 10, 2002
    Date of Patent: March 16, 2010
    Assignee: Cabot Microelectronics Corporation
    Inventors: Phillip Carter, Gregory H Bogush, Farhana Khan, Timothy P Johns, Robert Vacassy
  • System and method for universe generation
    Publication number: 20090300061
    Abstract: A system and method for automatically generating the universe from the documented MS-Excel file is disclosed. The methods for the Generate Universe, Migrate Universe, Update Universe and Document Universe are disclosed. The method helps in reduction of build effort of the project and removes the problem of corruption of the universe file of link being lost. The method provides easy maintenance of the universe versions and multi-user development environments and updating of universe files.
    Type: Application
    Filed: December 3, 2008
    Publication date: December 3, 2009
    Applicant: Infosys Technologies Ltd.
    Inventors: Bhanu Prashanthi Murthy, Farhana Khan
  • Compositions and methods for dielectric CMP
    Publication number: 20030211815
    Abstract: The invention is directed to a chemical-mechanical polishing composition comprising (a) an abrasive consisting essentially of aggregated silica, (b) an acid, and (c) a liquid carrier, wherein the polishing composition has a pH of about 5 or less. The invention is also directed to a method of polishing a substrate comprising a dielectric layer using the polishing composition.
    Type: Application
    Filed: May 10, 2002
    Publication date: November 13, 2003
    Applicant: Cabot Microelectronics Corporation
    Inventors: Phillip Carter, Gregory H. Bogush, Farhana Khan, Timothy P. Johns, Robert Vacassy