Patents by Inventor Farrell Good

Farrell Good has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Forming metal silicide resistant to subsequent thermal processing
    Patent number: 6210813
    Abstract: A metal silicide film and method of forming the same are provided. The method comprises depositing metal silicide layers onto a substrate assembly with alternating layers of silicon. The resulting metal silicide film has a disrupted grain structure and smaller grain sizes than prior art films of the same thickness, which increases the resistance of the material to stress cracks in subsequent thermal processing and reduces the overall residual stress of the material.
    Type: Grant
    Filed: September 2, 1998
    Date of Patent: April 3, 2001
    Assignee: Micron Technology, Inc.
    Inventors: Robert Burke, Farrell Good, Anand Srinivasan