Patents by Inventor Farzad Arsania

Farzad Arsania has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Integrated process for depositing layer of high-K dielectric with in-situ control of K value and thickness of high-K dielectric layer
    Patent number: 6642066
    Abstract: An apparatus and a method of depositing a dielectric material film, including steps of initiating a process of depositing a dielectric material film under at least one controllable initial condition in an apparatus comprising a dielectric material deposition chamber and a spectroscopic ellipsometer; and measuring, by the spectroscopic ellipsometer, at least one ellipsometric parameter of the dielectric material film during the process of depositing the film.
    Type: Grant
    Filed: May 15, 2002
    Date of Patent: November 4, 2003
    Assignee: Advanced Micro Devices, Inc.
    Inventors: Arvind Halliyal, Farzad Arsania