Abstract: Provided is a method of using a nanowire diode with an array of more than 100 nanowires functionalized with binding agents that bind to one or more specific biomarkers, the nanowires being non-horizontally aligned on a substrate, and the nanowires being electrically connected to each other, to measure the presence or absence of the one or more specific biomarkers. The method comprises exposing the nanowires to a solution of interest, shining light with a wavelength between 350 nm and 700 nm on the nanowire diode, measuring electrical current that is optically induced in the nanowire diode by the light, and comparing the optically induced electrical current with and without the solution of interest present to deduce a concentration of the one or more specific biomarkers in the solution of interest.

Abstract: An apparatus and method of treatment of an animal using the apparatus are disclosed. The apparatus includes a scalpel, a laser included in the scalpel, and a visible light source included in the scalpel. The visible light source provides a visible targeting beam. The method of treatment includes activating a visible targeting beam in a laser scalpel. The visible targeting beam has an illumination intensity. The method further includes illuminating a tumor that includes cancerous cells and non-cancerous cells with the visible targeting beam, activating an invisible mid-infrared laser included in the scalpel to produce a laser spot at the tumor, and ablating the cancerous cells while leaving the non-cancerous cells substantially undamaged.

Abstract: A solar control film having a frequency selective surface is provided. The frequency selective surface includes two layers. The first layer and the second layer which includes a metal surface. The frequency selective surface provides at least one UV absorptive material that permits substantial transmission of visible light. Products comprising the solar control film having the frequency selective surface are provided.

Abstract: Provided is a biosensor including a nanowire array. According to an example, the nanowire may include at least 1000 nanowires per cm2, the at least 1000 nanowires per cm2 including individual nanowires each defined by a longitudinal surface and a vertical surface, the longitudinal surface being at least two times longer than the vertical surface, where the vertical surfaces of each of the individual nanowires is configured to couple to a substrate.

Abstract: Provided is a biosensor including a nanowire array. According to an example, the nanowire may include at least 1000 nanowires per cm2, the at least 1000 nanowires per cm2 including individual nanowires each defined by a longitudinal surface and a vertical surface, the longitudinal surface being at least two times longer than the vertical surface, where the vertical surfaces of each of the individual nanowires is configured to couple to a substrate.

Abstract: A method (300) for etching a silicon surface (116) to reduce reflectivity. The method (300) includes electroless deposition of copper nanoparticles about 20 nanometers in size on the silicon surface (116), with a particle-to-particle spacing of 3 to 8 nanometers. The method (300) includes positioning (310) the substrate (112) with a silicon surface (116) into a vessel (122). The vessel (122) is filled (340) with a volume of an etching solution (124) so as to cover the silicon surface (116). The etching solution (124) includes an oxidant-etchant solution (146), e.g., an aqueous solution of hydrofluoric acid and hydrogen peroxide. The silicon surface (116) is etched (350) by agitating the etching solution (124) with, for example, ultrasonic agitation, and the etching may include heating (360) the etching solution (124) and directing light (365) onto the silicon surface (116). During the etching, copper nanoparticles enhance or drive the etching process.

Abstract: A method (300) for etching a silicon surface (116) to reduce reflectivity. The method (300) includes electroless deposition of copper nanoparticles about 20 nanometers in size on the silicon surface (116), with a particle-to-particle spacing of 3 to 8 nanometers. The method (300) includes positioning (310) the substrate (112) with a silicon surface (116) into a vessel (122). The vessel (122) is filled (340) with a volume of an etching solution (124) so as to cover the silicon surface (116). The etching solution (124) includes an oxidant-etchant solution (146), e.g., an aqueous solution of hydrofluoric acid and hydrogen peroxide. The silicon surface (116) is etched (350) by agitating the etching solution (124) with, for example, ultrasonic agitation, and the etching may include heating (360) the etching solution (124) and directing light (365) onto the silicon surface (116). During the etching, copper nanoparticles enhance or drive the etching process.