Patents by Inventor Fayçal Bouamrane

Fayçal Bouamrane has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Process for fabricating high-precision objects by high-resolution lithography and dry deposition and objects thus obtained
    Patent number: 9796581
    Abstract: The invention relates to a process for fabricating a high-precision object made of at least one inorganic material, comprising the following steps: using a high-resolution photolithography process, employing X-rays or UV rays depending on the desired degree of precision, in a chosen direction Z, to form a negative mold, which does not deform at the microscale during the steps of the process, in a material able to withstand a step for forming the object by dry deposition and capable of either being removed without altering the object fabricated or being separated from said object; choosing, independently of the normal redox potential of its constituent elements, at least one inorganic material from the set of materials that can be deposited by dry deposition and that allow the object to be fabricated to meet its thermomechanical and environmental specifications; and forming, by means of the non-deformable negative mold, the object to be fabricated by dry deposition of said at least one inorganic material, ther
    Type: Grant
    Filed: December 26, 2011
    Date of Patent: October 24, 2017
    Assignee: ONERA (OFFICE NATIONAL D'ETUDES ET DE RECHERCHES AEROSPATIALES)
    Inventors: Stéphane Landais, Fayçal Bouamrane, Thomas Bouvet, Olivier Dessornes, Pierre Josso, Stéphan Megtert, Roger Valle
  • Process for Fabricating High-Precision Objects by High-Resolution Lithography and Dry Deposition and Objects thus Obtained
    Publication number: 20140057104
    Abstract: The invention relates to a process for fabricating a high-precision object made of at least one inorganic material, comprising the following steps: using a high-resolution photolithography process, employing X-rays or UV rays depending on the desired degree of precision, in a chosen direction Z, to form a negative mould, which does not deform at the microscale during the steps of the process, in a material able to withstand a step for forming the object by dry deposition and capable of either being removed without altering the object fabricated or being separated from said object; choosing, independently of the normal redox potential of its constituent elements, at least one inorganic material from the set of materials that can be deposited by dry deposition and that allow the object to be fabricated to meet its thermomechanical and environmental specifications; and forming, by means of the non-deformable negative mould, the object to be fabricated by dry deposition of said at least one inorganic material, th
    Type: Application
    Filed: December 26, 2011
    Publication date: February 27, 2014
    Inventors: Stéphane Landais, Fayçal Bouamrane, Thomas Bouvet, Olivier Dessornes, Pierre Josso, Stéphan Megtert, Valle Roger