Patents by Inventor Fedor Trintchouk

Fedor Trintchouk has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11900595
    Abstract: Disclosed herein, inter alia, are methods and systems of image analysis useful for identifying and/or quantifying features in patterns.
    Type: Grant
    Filed: May 5, 2021
    Date of Patent: February 13, 2024
    Assignee: Singular Genomics Systems, Inc.
    Inventors: Fedor Trintchouk, Eli N. Glezer
  • Publication number: 20240037744
    Abstract: Disclosed herein, inter alia, are methods and systems of image analysis useful for identifying and/or quantifying features in patterns.
    Type: Application
    Filed: September 26, 2023
    Publication date: February 1, 2024
    Inventors: Fedor Trintchouk, Eli N. Glezer
  • Publication number: 20240037742
    Abstract: Disclosed herein, inter alia, are methods and systems of image analysis useful for identifying and/or quantifying features in patterns.
    Type: Application
    Filed: August 1, 2023
    Publication date: February 1, 2024
    Inventor: Fedor Trintchouk
  • Publication number: 20230280274
    Abstract: Disclosed herein, inter alia, are methods and systems of image analysis useful for rapidly identifying and/or quantifying features.
    Type: Application
    Filed: May 10, 2023
    Publication date: September 7, 2023
    Inventors: Fedor TRINTCHOUK, Eli N. GLEZER
  • Patent number: 11686681
    Abstract: Disclosed herein, inter alia, are methods and systems of image analysis useful for rapidly identifying and/or quantifying features.
    Type: Grant
    Filed: June 29, 2022
    Date of Patent: June 27, 2023
    Assignee: SINGULAR GENOMICS SYSTEMS, INC.
    Inventors: Fedor Trintchouk, Eli N. Glezer
  • Publication number: 20220334062
    Abstract: Disclosed herein, inter alia, are methods and systems of image analysis useful for rapidly identifying and/or quantifying features.
    Type: Application
    Filed: June 29, 2022
    Publication date: October 20, 2022
    Inventors: Fedor Trintchouk, Eli N. Glezer
  • Patent number: 11415515
    Abstract: Disclosed herein, inter alia, are methods and systems of image analysis useful for rapidly identifying and/or quantifying features.
    Type: Grant
    Filed: March 24, 2022
    Date of Patent: August 16, 2022
    Assignee: Singular Genomics Systems, Inc.
    Inventors: Fedor Trintchouk, Eli N. Glezer
  • Publication number: 20220214278
    Abstract: Disclosed herein, inter alia, are methods and systems of image analysis useful for rapidly identifying and/or quantifying features.
    Type: Application
    Filed: March 24, 2022
    Publication date: July 7, 2022
    Inventors: Fedor Trintchouk, Eli N. Glezer
  • Publication number: 20210350533
    Abstract: Disclosed herein, inter alia, are methods and systems of image analysis useful for identifying and/or quantifying features in patterns.
    Type: Application
    Filed: May 5, 2021
    Publication date: November 11, 2021
    Inventors: Fedor Trintchouk, Eli N. Glezer
  • Patent number: 7522650
    Abstract: A method and apparatus if disclosed which may comprise a high power high repetition rate gas discharge laser UV light source which may comprise: a gas discharge chamber comprising an interior wall comprising a vertical wall and an adjacent bottom wall; a gas circulation fan creating a gas flow path adjacent the interior vertical wall and the adjacent bottom wall; an in-chamber dust trap positioned a region of low gas flow, which may be along an interior wall and may comprise at least one meshed screen, e.g., a plurality of meshed screens, which may comprise at least two different gauge meshed screens. The dust trap may extend along the bottom interior wall of the chamber and/or a vertical portion of the interior wall. The dust trap may comprise a first meshed screen having a first gauge; a second meshed screen having a second gauge smaller than the first gauge; and the second meshed screen intermediate the first meshed screen and the interior wall.
    Type: Grant
    Filed: March 31, 2004
    Date of Patent: April 21, 2009
    Assignee: Cymer, Inc.
    Inventors: William N. Partlo, Yoshiho Amada, James A. Carmichael, Timothy S. Dyer, Walter D. Gillespie, Bryan G. Moosman, Richard G. Morton, Curtis L. Rettig, Brian D. Strate, Thomas D. Steiger, Fedor Trintchouk, Richard C. Ujazdowski
  • Publication number: 20060227839
    Abstract: A line narrowed gas discharge laser system and method of operation are disclosed which may comprise: an oscillator cavity; a laser chamber comprising a chamber housing containing a lasing medium gas; at least one peaking capacitor electrically connected to the chamber housing and to a first one of a pair of electrodes; a second one of the pair of electrodes connected to an opposite terminal of the at least one peaking capacitor; a current return path connected to the chamber housing; the one terminal, the first one of the electrodes, the lasing medium gas, the second one of the electrodes, the current return path and the second terminal forming a head current inductive loop having an inductance unique to the particular head current inductive loo; a spectral quality tuning mechanism comprising a mechanism for changing the particular head current inductive loop inductance value for the particular head current inductance loop.
    Type: Application
    Filed: March 31, 2005
    Publication date: October 12, 2006
    Applicant: Cymer, Inc.
    Inventors: Herve Besaucele, Igor Fomenkov, William Partlo, Fedor Trintchouk, Hao Ton That
  • Publication number: 20060114956
    Abstract: A line narrowing apparatus and method for a narrow band DUV high power high repetition rate gas discharge laser producing output laser light pulse beam pulses in bursts of pulses is disclosed, which may comprise a dispersive center wavelength selection optic contained within a line narrowing module, selecting at least one center wavelength for each pulse determined at least in part by the angle of incidence of the laser light pulse beam containing the respective pulse on a dispersive wavelength selection optic dispersive surface; a first dispersive optic bending mechanism operatively connected to the dispersive center wavelength selection optic and operative to change the curvature of the dispersive surface in a first manner; and, a second dispersive optic bending mechanism operatively connected to the dispersive center wavelength selection optic and operative to change the curvature of the dispersive surface in a second manner.
    Type: Application
    Filed: November 30, 2004
    Publication date: June 1, 2006
    Inventors: Richard Sandstrom, William Partlo, Daniel Brown, J. Martin Algots, Fedor Trintchouk
  • Publication number: 20060114958
    Abstract: A gas discharge laser system bandwidth control mechanism and method of operation for controlling bandwidth in a laser output light pulse generated in the gas discharge laser system is disclosed which may comprise a bandwidth controller which may comprise an active bandwidth adjustment mechanism; a controller actively controlling the active bandwidth adjustment mechanism utilizing an algorithm implementing bandwidth thermal transient correction based upon a model of the impact of laser system operation on the wavefront of the laser light pulse being generated and line narrowed in the laser system as it is incident on the bandwidth adjustment mechanism. The controller algorithm may comprises a function of the power deposition history in at least a portion of an optical train of the gas discharge laser system, e.g., a linear function, e.g., a combination of a plurality of decay functions each comprising a respective decay time constant and a respective coefficient.
    Type: Application
    Filed: October 20, 2005
    Publication date: June 1, 2006
    Applicant: Cymer, Inc.
    Inventors: Fedor Trintchouk, Robert Jacques
  • Patent number: 6963595
    Abstract: An automatic F2 laser gas control, for a modular high repetition rate ultraviolet gas discharge laser. The laser gas control includes techniques, monitors, and processor for monitoring the F2 consumption rates through the operating life of the laser system. These consumption rates are used by a processor programmed with an algorithm to determine F2 injections needed to maintain laser beam quality within a delivery range. Preferred embodiments include F2 controls for a two-chamber MOPA laser system.
    Type: Grant
    Filed: January 31, 2003
    Date of Patent: November 8, 2005
    Assignee: Cymer, Inc.
    Inventors: John A. Rule, Richard C. Morton, Vladimir V. Fleurov, Fedor Trintchouk, Toshihiko Ishihara, Alexander I. Ershov, James A. Carmichael
  • Publication number: 20050226301
    Abstract: A method and apparatus if disclosed which may comprise a high power high repetition rate gas discharge laser UV light source which may comprise: a gas discharge chamber comprising an interior wall comprising a vertical wall and an adjacent bottom wall; a gas circulation fan creating a gas flow path adjacent the interior vertical wall and the adjacent bottom wall; an in-chamber dust trap positioned a region of low gas flow, which may be along an interior wall and may comprise at least one meshed screen, e.g., a plurality of meshed screens, which may comprise at least two different gauge meshed screens. The dust trap may extend along the bottom interior wall of the chamber and/or a vertical portion of the interior wall. The dust trap may comprise a first meshed screen having a first gauge; a second meshed screen having a second gauge smaller than the first gauge; and the second meshed screen intermediate the first meshed screen and the interior wall.
    Type: Application
    Filed: March 31, 2004
    Publication date: October 13, 2005
    Inventors: William Partlo, Yoshiho Amada, James Carmichael, Timothy Dyer, Walter Gillespie, Bryan Moosman, Richard Morton, Curtis Rettig, Brian Strate, Thomas Steiger, Fedor Trintchouk, Richard Ujazdowski
  • Publication number: 20050094698
    Abstract: A multi-chambered excimer or molecular halogen gas discharge laser system comprising at least one oscillator chamber and at least one amplifier chamber producing oscillator output laser light pulses that are amplified in the at least one power chamber, having a fluorine injection control system and a method of using same is disclosed, which may comprise: a halogen gas consumption estimator: estimating the amount of halogen gas that has been consumed in one of the at least one oscillator chamber based upon at least a first operating parameter of one of the least one oscillator chamber and the at least one amplifier chamber, and the difference between a second operating parameter of the at least one oscillator chamber and the at least one amplifier chamber, and estimating the amount of halogen gas that has been consumed in the other of the at least one oscillator chamber and the at least one amplifier chamber based upon at least a third operating parameter of the other of the at least one oscillator chamber and
    Type: Application
    Filed: September 29, 2004
    Publication date: May 5, 2005
    Inventors: Herve Besaucele, Wayne Dunstan, Toshihiko Ishihara, Robert Jacques, Fedor Trintchouk
  • Publication number: 20040022293
    Abstract: An automatic F2 laser gas control, for a modular high repetition rate ultraviolet gas discharge laser. The laser gas control includes techniques, monitors, and processor for monitoring the F2 consumption rates through the operating life of the laser system. These consumption rates are used by a processor programmed with an algorithm to determine F2 injections needed to maintain laser beam quality within a delivery range. Preferred embodiments include F2 controls for a two-chamber MOPA laser system.
    Type: Application
    Filed: January 31, 2003
    Publication date: February 5, 2004
    Inventors: John A. Rule, Thomas Hofmann, Richard G. Morton, Daniel J. W. Brown, Vladimir B. Fleurov, Fedor Trintchouk, Toshihiko Ishihara, Alexander I. Ershov, Christian J. Wittak