Patents by Inventor Feifei Liang

Feifei Liang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240117451
    Abstract: Positive reference spiked in collected sample for use in qualitatively and quantitatively detecting viral RNA.
    Type: Application
    Filed: March 10, 2021
    Publication date: April 11, 2024
    Inventors: Shuwei YANG, Liancheng HUANG, Feifei FENG, Longwen SU, Kun LIN, Can TANG, Chen LIANG, Yuanmei WANG, Yanqing CAI, Yilin PANG, Chuan SHEN, Zhixue YU
  • Publication number: 20230295415
    Abstract: A high-glossiness epoxy molding compound (EMC) film for protecting a chip and a preparation method thereof are disclosed. The high-glossiness EMC film for protecting a chip includes: 40 to 100 parts by mass of an epoxy resin; 2 to 5 parts by mass of glass epoxy; 45 to 55 parts by mass of fused silica; and 1 to 5 parts by mass of a curing system, where the fused silica has a particle size D50 of 0.15 ?m to 0.6 ?m. The glossiness of the protective film of the present disclosure is significantly improved, such that the clarity of characters inscribed by a laser under a bright field of a microscope can be further improved, which allows a device to effectively recognize the characters.
    Type: Application
    Filed: May 24, 2023
    Publication date: September 21, 2023
    Applicant: WUHAN CHOICE TECHNOLOGY CO., LTD.
    Inventors: De WU, Shuhang LIAO, Junxing SU, Feifei LIANG
  • Publication number: 20220250987
    Abstract: The present disclosure discloses a process for producing microcrystalline alpha-alumina by microwave calcination, which relates to the production process of calcined alumina. The product of the present disclosure has stable quality. The yield of the process of the present disclosure is higher than that of the traditional kiln production method. The energy consumption during the preparation of alpha-alumina is greatly reduced, and the zero emission of harmful gases is realized.
    Type: Application
    Filed: April 28, 2022
    Publication date: August 11, 2022
    Applicant: HENAN CHANGXING INDUSTRY CO,LTD.
    Inventors: Zhiang Sun, Feifei Liang, Xiaohui Jiang, Bo Dong, Qian Wang, Dongmei Zhang, Junjian Wang, Yanan Xue, Zhikai Xu, Fang Wang, Yanjun Yang, Mingjing Li, Meishan Shao
  • Patent number: 11286386
    Abstract: A circuit build-up film for wafer-level packaging (WLP) includes 40 to 60 parts by mass of a first epoxy resin, 15 to 30 parts by mass of a second epoxy resin, 25 to 50 parts by mass of a curing agent, 0.1 to 5 parts by mass of a curing accelerator, 5 to 20 parts by mass of an additive, 320 to 650 parts by mass of an inorganic filler, and 0.01 to 5 parts by mass of a silane coupling agent (SCA), where the additive is obtained by subjecting an epoxy resin to a reaction with a polyhydroxyl-terminated dendritic crosslinking agent. The build-up film shows prominent fluidity during heating and curing, and can completely fill gaps among wafers. A packaging process using the build-up film is simple. Regardless of the number of wafers, packaging can be completed through one procedure with the build-up film.
    Type: Grant
    Filed: October 25, 2021
    Date of Patent: March 29, 2022
    Assignee: WUHAN CHOICE TECHNOLOGY CO., LTD.
    Inventors: De Wu, Shuhang Liao, Yi Wang, Junxing Su, Feifei Liang