Patents by Inventor Feixia Pan

Feixia Pan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8058182
    Abstract: Method and device for forming a membrane includes providing a glass substrate, and depositing a thin layer of chromium on the glass substrate. The thin layer of chromium is patterned to form a deflection electrode and interconnect leads. A sacrificial layer of aluminum is deposited on top of the patterned chromium layer, then the sacrificial layer is patterned to define anchor regions. On top of the sacrificial layer, a thick layer of chromium is deposited, and the thick layer of chromium is patterned to form a membrane. The sacrificial layer is then etched to release the membrane.
    Type: Grant
    Filed: July 1, 2009
    Date of Patent: November 15, 2011
    Assignee: Xerox Corporation
    Inventors: Chingwen Yeh, James B. Boyce, Kathleen Boyce, legal representative, Jingkuang Chen, Feixia Pan, Joel A. Kubby
  • Publication number: 20110003405
    Abstract: Method and device for forming a membrane includes providing a glass substrate, and depositing a thin layer of chromium on the glass substrate. The thin layer of chromium is patterned to form a deflection electrode and interconnect leads. A sacrificial layer of aluminum is deposited on top of the patterned chromium layer, then the sacrificial layer is patterned to define anchor regions. On top of the sacrificial layer, a thick layer of chromium is deposited, and the thick layer of chromium is patterned to form a membrane. The sacrificial layer is then etched to release the membrane.
    Type: Application
    Filed: July 1, 2009
    Publication date: January 6, 2011
    Applicant: XEROX CORPORATION
    Inventors: Chingwen Yeh, James B. Boyce, Kathleen Boyce, Jingkuang Chen, Feixia Pan, Joel A. Kubby
  • Patent number: 6662448
    Abstract: A micro-electromechanical fluid ejector that is easily fabricated in a standard polysilicon surface micromachining process is disclosed, which can be batch fabricated at low cost using existing external foundry capabilities. In addition, the surface micromachining process has proven to be compatible with integrated microelectronics, allowing for the monolithic integration of the actuator with addressing electronics. A voltage drive mode and a charge drive mode for the power source actuating a deformable membrane is also disclosed.
    Type: Grant
    Filed: May 23, 2001
    Date of Patent: December 16, 2003
    Assignee: Xerox Corporation
    Inventors: Joel A. Kubby, Jingkuang Chen, Feixia Pan
  • Patent number: 6473361
    Abstract: A low power, nonvolatile microelectromechanical memory cell stores data. This memory cell uses a pair of cantilevers, to store a bit of information. The on and off state of this mechanical latch is switched by using, for example, electrostatic forces applied sequentially on the two cantilevers. The cantilevers are partially overlapping. Changing the relative position of the cantilevers determines whether they are electrically conducting or not. One state represents a logical “1”. The other state represents a logical “0”. After a bit of data is written, the cantilevers are locked by mechanical forces inherent in the cantilevers and will not change state unless a sequential electrical writing signal is applied. The sequential nature of the required writing signal makes inadvertent or noise related data corruption highly unlikely. This MEMS memory cell can be implemented, for example, using a three-polysilicon-layer surface micro-machining process.
    Type: Grant
    Filed: November 10, 2000
    Date of Patent: October 29, 2002
    Assignee: Xerox Corporation
    Inventors: Jingkuang Chen, Feixia Pan, Joel A. Kubby
  • Patent number: 6357865
    Abstract: A micro-electromechanical fluid ejector that is easily fabricated in a standard polysilicon surface micromachining process is disclosed, which can be batch fabricated at low cost using existing external foundry capabilities. In addition, the surface micromachining process has proven to be compatible with integrated microelectronics, allowing for the monolithic integration of the actuator with addressing electronics. A voltage drive mode and a charge drive mode for the power source actuating a deformable membrane is also disclosed.
    Type: Grant
    Filed: October 12, 1999
    Date of Patent: March 19, 2002
    Assignee: Xerox Corporation
    Inventors: Joel A. Kubby, Jingkuang Chen, Feixia Pan
  • Publication number: 20010023523
    Abstract: A micro-electromechanical fluid ejector that is easily fabricated in a standard polysilicon surface micromachining process is disclosed, which can be batch fabricated at low cost using existing external foundry capabilities. In addition, the surface micromachining process has proven to be compatible with integrated microelectronics, allowing for the monolithic integration of the actuator with addressing electronics. A voltage drive mode and a charge drive mode for the power source actuating a deformable membrane is also disclosed.
    Type: Application
    Filed: May 23, 2001
    Publication date: September 27, 2001
    Applicant: Xerox Corporation
    Inventors: Joel A. Kubby, Jingkuang Chen, Feixia Pan
  • Patent number: 6201633
    Abstract: A micro-electromechanical bistable shutter display device is provided capable of being implemented for both small screen, high resolution devices and for large billboard-type displays. The micro-electromechanical shutter assembly has bi-stability characteristics which allow the use of only a holding voltage to maintain an image. The micro-electromechanical shutter assembly includes a shutter having petal-like shutter segments covering reflective or transmittive films. To expose the film in a particular shutter assembly, its shutter segments are moved from the horizontal to a vertical position using electrostatic attraction forces to “collapse” the torsionally-hinged shutter segments. The shutter assembly can have a number of segments, as long as the resulting shutter assembly shape can be stacked to form a dense 2D array.
    Type: Grant
    Filed: June 7, 1999
    Date of Patent: March 13, 2001
    Assignee: Xerox Corporation
    Inventors: Eric Peeters, Jackson Ho, Feixia Pan, Raj B. Apte, Joel A. Kubby, Ronald T. Fulks, Decai Sun, Patrick Y. Maeda, David Fork, Robert Thornton, Ross Bringans, G. A. Neville Connell, Philip Don Floyd, Tuan Anh Vo, Koenraad Van Schuylenbergh