Abstract: According to an aspect, there is provided a personal care device (52) for performing a light-based hair removal or photo-epilation operation on a body of a subject. The personal care device (52) comprises a housing (54) that includes a first window or opening (68), a light source configured to generate light to perform the light-based hair removal or photo-epilation operation, wherein the light source is arranged in the housing such that light emitted by the light source illuminates a part of the body, a receiving member in or on the housing (54) for receiving and retaining a consumer electronic device (62) in or on the personal care device (52), and an optical system (80) in the housing (54) for enabling an imaging unit (78) of a consumer electronic device (62) retained in the recess (60) to obtain images of a part of the body via the first window or opening (68).

Abstract: A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.

Abstract: A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.

Abstract: A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.

Abstract: A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.

Abstract: A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.

Abstract: The invention provides a microdermabrasion device (1) comprising a vacuum system (100) and a device tip (200), wherein the vacuum system (100) is in fluid communication with a channel inlet (120) at an inlet zone (1200) of the device tip (200), wherein the vacuum system (100) is configured to apply a vacuum to the inlet zone (1200), wherein the inlet zone (1200) further comprises an sensor (400) configured to measure a skin parameter of a part of a skin in the inlet zone (1200) and to provide a corresponding sensor signal, wherein the device tip (200) further comprises a microdermabrasion zone (1240) configured to abrade a part of said skin, and wherein the microdermabrasion device (1) further comprises a control unit (500) configured to control the vacuum as function of sensor signal information derived from the sensor signal and a predetermined relation between the sensor signal information and a vacuum setting.

Abstract: A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.

Abstract: The present invention relates to a device for microdermabrasive treatment comprising, a treatment head (16) having a cavity (18) with inner walls (20), an opening (22) in said inner walls, and a treatment head tip (24) for placing the treatment head (16) on a skin (48) of the user, wherein the treatment head tip (24) comprises a first abrasive surface (26) and the inner walls (20) comprise a second abrasive surface (28), wherein the opening (22) is configured to be connected to a vacuum source (30) for applying an under-pressure (58) within the cavity (18), when the treatment head tip (24) is placed on the skin (48) of the user, and herein the first abrasive surface (26) comprises a different roughness than the second abrasive surface (28).

Abstract: A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.

Abstract: A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.

Abstract: A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.

Abstract: A radiation spot measurement system for a lithographic apparatus, the system having a target onto which a radiation system of the lithographic apparatus may project spots of radiation for a measurement process, the target having a measurement target. The system further includes a radiation detector to detect radiation from one of the spots, and a controller to receive information from the radiation detector and to determine the position of the spot of radiation relative to an intended position of the spot of radiation.

Abstract: A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.

Abstract: A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.

Abstract: A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.

Abstract: A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.

Abstract: A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.

Abstract: A radiation spot measurement system for a lithographic apparatus, the system having a target onto which a radiation system of the lithographic apparatus may project spots of radiation for a measurement process, the target having a measurement target. The system further includes a radiation detector to detect radiation from one of the spots, and a controller to receive information from the radiation detector and to determine the position of the spot of radiation relative to an intended position of the spot of radiation.

Abstract: The invention relates to x-ray filters in a collimator for controlling the energy of an x-ray beam along a projection axis in computed tomography systems. According to the invention, the filter assembly comprises a filter element for attenuating the x-ray beam, and at least a support plate which fixes the filter element. The filter element and the support plate are notch-shaped in the center part of the filter assembly along a direction perpendicular to the projection axis. The design may free space to be used by other collimator parts and further allows use of more than one filter element in a filter assembly for backup purposes. This simplifies replacement of a defective x-ray filter in the field.