Patents by Inventor Felix Godfried Peter Peeters

Felix Godfried Peter Peeters has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12285209
    Abstract: According to an aspect, there is provided a personal care device (52) for performing a light-based hair removal or photo-epilation operation on a body of a subject. The personal care device (52) comprises a housing (54) that includes a first window or opening (68), a light source configured to generate light to perform the light-based hair removal or photo-epilation operation, wherein the light source is arranged in the housing such that light emitted by the light source illuminates a part of the body, a receiving member in or on the housing (54) for receiving and retaining a consumer electronic device (62) in or on the personal care device (52), and an optical system (80) in the housing (54) for enabling an imaging unit (78) of a consumer electronic device (62) retained in the recess (60) to obtain images of a part of the body via the first window or opening (68).
    Type: Grant
    Filed: April 14, 2021
    Date of Patent: April 29, 2025
    Assignee: KONINKLIJKE PHILIPS N.V.
    Inventors: Edgar Van Gool, Felix Godfried Peter Peeters, Marjolein Yvonne Jansen, Eyob Atanfu Amra, Eric Gerard Marie Van Kempen, Lars Christian Casper, Wilbert Bernard Roger Pennings, Tim Tielemans
  • Patent number: 10705432
    Abstract: A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.
    Type: Grant
    Filed: March 15, 2019
    Date of Patent: July 7, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Aleksey Yurievich Kolesnychenko, Johannes Jacobus Matheus Baselmans, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Hans Jansen, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Felix Godfried Peter Peeters, Bob Streefkerk, Franciscus Johannes Herman Maria Teunissen, Helmar Van Santen
  • Publication number: 20190212662
    Abstract: A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.
    Type: Application
    Filed: March 15, 2019
    Publication date: July 11, 2019
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Aleksey Yurievich KOLESNYCHENKO, Johannes Jacobus Matheus Baselmans, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Hans Jansen, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Felix Godfried Peter Peeters, Bob Streefkerk, Franciscus Johannes Herman Maria Teunissen, Helmar Van Santen
  • Patent number: 10234768
    Abstract: A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.
    Type: Grant
    Filed: May 3, 2018
    Date of Patent: March 19, 2019
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Aleksey Yurievich Kolesnychenko, Johannes Jacobus Matheus Baselmans, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Hans Jansen, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Felix Godfried Peter Peeters, Bob Streefkerk, Franciscus Johannes Herman Maria Teunissen, Helmar Van Santen
  • Publication number: 20180246418
    Abstract: A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.
    Type: Application
    Filed: May 3, 2018
    Publication date: August 30, 2018
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Aleksey Yurievich Kolesnychenko, Johannes Jacobus Matheus Baselmans, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Hans Jansen, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Felix Godfried Peter Peeters, Bob Streefkerk, Franciscus Johannes Herman Maria Teunissen, Helmar Van Santen
  • Patent number: 9989861
    Abstract: A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.
    Type: Grant
    Filed: November 27, 2017
    Date of Patent: June 5, 2018
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Aleksey Yurievich Kolesnychenko, Johannes Jacobus Matheus Baselmans, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Hans Jansen, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Felix Godfried Peter Peeters, Bob Streefkerk, Franciscus Johannes Herman Maria Teunissen, Helmar Van Santen
  • Patent number: 9829799
    Abstract: A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.
    Type: Grant
    Filed: February 13, 2017
    Date of Patent: November 28, 2017
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Aleksey Yurievich Kolesnychenko, Johannes Jacobus Matheus Baselmans, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Hans Jansen, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Felix Godfried Peter Peeters, Bob Streefkerk, Franciscus Johannes Herman Maria Teunissen, Helmar Van Santen
  • Patent number: 9568840
    Abstract: A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.
    Type: Grant
    Filed: December 1, 2015
    Date of Patent: February 14, 2017
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Aleksey Yurievich Kolesnychenko, Johannes Jacobus Matheus Baselmans, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Hans Jansen, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Felix Godfried Peter Peeters, Bob Streefkerk, Franciscus Johannes Herman Maria Teunissen, Helmar Van Santen
  • Patent number: 9304401
    Abstract: A radiation spot measurement system for a lithographic apparatus, the system having a target onto which a radiation system of the lithographic apparatus may project spots of radiation for a measurement process, the target having a measurement target. The system further includes a radiation detector to detect radiation from one of the spots, and a controller to receive information from the radiation detector and to determine the position of the spot of radiation relative to an intended position of the spot of radiation.
    Type: Grant
    Filed: February 22, 2012
    Date of Patent: April 5, 2016
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Felix Godfried Peter Peeters, Jozef Petrus Henricus Benschop, Michael Jozef Mathijs Renkens, Gregor Edward Van Baars, Jeroen Dekkers
  • Patent number: 9207543
    Abstract: A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.
    Type: Grant
    Filed: May 8, 2014
    Date of Patent: December 8, 2015
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Aleksey Yurievich Kolesnychenko, Johannes Jacobus Matheus Baselmans, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Hans Jansen, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Felix Godfried Peter Peeters, Bob Streefkerk, Franciscus Johannes Herman Maria Teunissen, Helmar Van Santen
  • Publication number: 20140253890
    Abstract: A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.
    Type: Application
    Filed: May 8, 2014
    Publication date: September 11, 2014
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Aleksey Yurievich KOLESNYCHENKO, Johannes Jacobus Matheus Baselmans, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Hans Jansen, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Felix Godfried Peter Peeters, Bob Streefkerk, Franciscus Johannes Herman Maria Teunissen, Helmar Van Santen
  • Patent number: 8755033
    Abstract: A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.
    Type: Grant
    Filed: September 22, 2011
    Date of Patent: June 17, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Aleksey Yurievich Kolesnychenko, Johannes Jacobus Matheus Baselmans, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Hans Jansen, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Felix Godfried Peter Peeters, Bob Streefkerk, Franciscus Johannes Herman Maria Teunissen, Helmar Van Santen
  • Patent number: 8704998
    Abstract: A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.
    Type: Grant
    Filed: January 24, 2011
    Date of Patent: April 22, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Aleksey Yurievich Kolesnychenko, Johannes Jacobus Matheus Baselmans, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Hans Jansen, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Felix Godfried Peter Peeters, Bob Streefkerk, Franciscus Johannes Herman Maria Teunissen, Helmar Van Santen
  • Publication number: 20130335721
    Abstract: A radiation spot measurement system for a lithographic apparatus, the system having a target onto which a radiation system of the lithographic apparatus may project spots of radiation for a measurement process, the target having a measurement target. The system further includes a radiation detector to detect radiation from one of the spots, and a controller to receive information from the radiation detector and to determine the position of the spot of radiation relative to an intended position of the spot of radiation.
    Type: Application
    Filed: February 22, 2012
    Publication date: December 19, 2013
    Applicant: ASML neTHERLANDS B.V.
    Inventors: Felix Godfried Peter Peeters, Jozef Petrus Henricus Benschop, Michael Jozef Mathijs Renkens, Gregor Edward Van Baars, Jeroen Dekkers
  • Patent number: 8325879
    Abstract: The invention relates to x-ray filters in a collimator for controlling the energy of an x-ray beam along a projection axis in computed tomography systems. According to the invention, the filter assembly comprises a filter element for attenuating the x-ray beam, and at least a support plate which fixes the filter element. The filter element and the support plate are notch-shaped in the center part of the filter assembly along a direction perpendicular to the projection axis. The design may free space to be used by other collimator parts and further allows use of more than one filter element in a filter assembly for backup purposes. This simplifies replacement of a defective x-ray filter in the field.
    Type: Grant
    Filed: December 18, 2008
    Date of Patent: December 4, 2012
    Assignee: Koninklijke Philips Electronics N.V.
    Inventors: Marinus Antonius Dimphna Maria Loos, Felix Godfried Peter Peeters
  • Patent number: 8260505
    Abstract: An apparatus for determining roll angle of a motorcycle (1) as when taking a curve or bend in a road. The apparatus includes a first gyro sensor (11) that provides a roll rate signal, a second gyro sensor (12) that provides a yaw rate signal, and a velocity sensor (36). The apparatus is configured to integrate the roll rate signal to obtain a first intermediate roll angle value and to determine a second intermediate roll angle value from the yaw rate and the vehicle velocity. The apparatus combines the two intermediate roll angle values into an output value for the roll angle that can be used by a servo (50) to adjust the orientation of the headlamp so that the beam pattern remains leveled with the horizon when the motorcycle (1) rolls when taking a curve.
    Type: Grant
    Filed: March 17, 2007
    Date of Patent: September 4, 2012
    Assignee: Koninklijke Philips Electronics N.V.
    Inventors: Felix Godfried Peter Peeters, Hendrikus Martinus Wilhelmus Goossens, Hubert Gerard Jean Joseph Amaury Vroomen
  • Patent number: 8213568
    Abstract: When performing a fly-by or helical CT scan of a subject, radiation dose is limited by positioning a dynamic collimator (142) between the subject and an X-ray source (112). The collimator moves axially with the X-ray source (112) along a volume of interest (VOI) (122) in the subject and gradually opens, such that a narrow portion of the cone beam of X-rays is permitted to pass through the collimator (142) at ends of the VOI (122) and a wider full cone beam is emitted at central portions of the VOI (122). In this manner, tissue surrounding the VOI (122) is not needlessly exposed to X-rays, as would be the case if a full-width cone beam were used for the entire scan of the VOI (122).
    Type: Grant
    Filed: December 12, 2008
    Date of Patent: July 3, 2012
    Assignee: Koninklijke Philips Electronics N.V.
    Inventors: Dominic J. Heuscher, Felix Godfried Peter Peeters
  • Publication number: 20120013867
    Abstract: A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.
    Type: Application
    Filed: September 22, 2011
    Publication date: January 19, 2012
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Aleksey Yurievich KOLESNYCHENKO, Johannes Jacobus Matheus Baselmans, Sjoerd Nicolaas Lambertus Donders, Christian Alexander Hoogendam, Hans Jansen, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Felix Godfried Peter Peeters, Bob Streefkerk, Franciscus Johannes Herman Maria Teunissen, Helmar Van Santen
  • Patent number: 7898642
    Abstract: A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.
    Type: Grant
    Filed: April 14, 2004
    Date of Patent: March 1, 2011
    Assignee: ASML Netherlands B.V.
    Inventors: Aleksey Yurievich Kolesnychenko, Johannes Jacobus Matheus Baselmans, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Hans Jansen, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Felix Godfried Peter Peeters, Bob Streefkerk, Franciscus Johannes Herman Maria Teunissen, Helmar Van Santen
  • Publication number: 20110033030
    Abstract: The invention relates to x-ray filters in a collimator for controlling the energy of an x-ray beam along a projection axis in computed tomography systems. According to the invention, the filter assembly comprises a filter element for attenuating the x-ray beam, and at least a support plate which fixes the filter element. The filter element and the support plate are notch-shaped in the center part of the filter assembly along a direction perpendicular to the projection axis. The design may free space to be used by other collimator parts and further allows use of more than one filter element in a filter assembly for backup purposes. This simplifies replacement of a defective x-ray filter in the field.
    Type: Application
    Filed: December 18, 2008
    Publication date: February 10, 2011
    Applicant: KONINKLIJKE PHILIPS ELECTRONICS N.V.
    Inventors: Marinus Antonius Dimphna Maria Loos, Felix Godfried Peter Peeters