Abstract: A method of imprint lithography mold defect mitigation and a masked imprint lithography mold employ a masking layer to selectively cover a surface defect. The method of imprint lithography mold defect mitigation includes depositing a masking layer on a surface of an imprint lithography mold to selectively cover a defect on the surface and form a masked imprint lithography mold. The method of imprint lithography mold defect mitigation further includes forming a negative imprint lithography mold from the masked imprint lithography mold. The masked imprint lithography mold includes an imprint lithography mold having a surface with a defect and a patterned masking layer affixed to the surface and configured to selectively cover the defect. The patterned masking layer that selectively covers the defect is configured to mitigate an effect of the defect when the masked imprint lithography mold is employed in imprint lithography.