Abstract: Some embodiments are directed towards an image sensor device. A photodetector is disposed in a semiconductor substrate, and a transfer transistor is disposed over photodetector. The transfer transistor includes a transfer gate having a lateral portion extending over a frontside of the semiconductor substrate and a vertical portion extending to a first depth below the frontside of the semiconductor substrate. A gate dielectric separates the lateral portion and the vertical portion from the semiconductor substrate. A backside trench isolation structure extends from a backside of the semiconductor substrate to a second depth below the frontside of the semiconductor substrate. The backside trench isolation structure laterally surrounds the photodetector, and the second depth is less than the first depth such that a lowermost portion of the vertical portion of the transfer transistor has a vertical overlap with an uppermost portion of the backside trench isolation structure.

Abstract: The present disclosure describes an image sensor device and a method for forming the same. The image sensor device can include a semiconductor layer. The semiconductor layer can include a first surface and a second surface. The image sensor device can further include an interconnect structure formed over the first surface of the semiconductor layer, first and second radiation sensing regions formed in the second surface of the semiconductor layer, a metal stack formed over the second radiation sensing region, and a passivation layer formed through the metal stack and over a top surface of the first radiation sensing region. The metal stack can be between the passivation layer and an other top surface of the second radiation sensing region.

Abstract: A polysilicon well is formed at a cross-road portion between a plurality of pixel sensors in a pixel sensor array. Moreover, the underlying oxide layer between the polysilicon well and a semiconductor layer of the pixel sensor array may be thinner than other areas of the oxide layer. The polysilicon well and the thinner oxide layer may reduce the likelihood of and/or the magnitude of lateral etching that occurs during etching of the semiconductor layer to form recesses in which a BDTI structure of the pixel sensor array is formed. Moreover, the bottom of the BDTI structure being surrounded by the polysilicon well enables a voltage bias to be applied to the BDTI structure through the polysilicon well to passivate damage that might have occurred to the semiconductor layer around the bottom of the BDTI structure.

Abstract: An image sensor includes an array of image pixels and black level correction (BLC) pixels. Each BLC pixel includes a BLC pixel photodetector, a BLC pixel sensing circuit, and a BLC pixel optics assembly configured to block light that impinges onto the BLC pixel photodetector. Each BLC pixel optics assembly may include a first portion of a layer stack including a vertically alternating sequence of first material layers having a first refractive index and second material layers having a second refractive index. Additionally or alternatively, each BLC pixel optics assembly may include a first portion of a layer stack including at least two metal layers, each having a respective wavelength sub-range having a greater reflectivity than another metal layer. Alternatively or additionally, each BLC pixel optics assembly may include an infrared blocking material layer that provides a higher absorption coefficient than color filter materials within image pixel optics assemblies.

Abstract: A modified structure of pipe reel incorporates a main frame, which is provided with a pipe groove to accommodate the water pipe. The first end of the water pipe is placed at the central outlet of the swing frame, while the second end is placed at a preset cross groove at one side of the main frame. There is an outlet limit base provided at the central outlet of the swing frame and a cross-hole is available for connection; and there is a connection base, which is provided within the outlet limit base. The inner end can be connected to the first end of the water pipe, and the outer end can penetrate the cross-hole of the outlet limit base to give shape of a convex provided with a connection end, available with the configurations of water pipe head and sprinkler connector for connection.