Patents by Inventor FENG FAN CHANG

FENG FAN CHANG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240163075
    Abstract: The present disclosure provides a privacy computing method based on homomorphic encryption, which includes steps as follows. The ciphertext data is received, where the ciphertext data has a floating-point homomorphic encryption data structure, and the floating-point homomorphic encryption data structure of the ciphertext data includes the ciphertext mantissa, exponent parameter and gain parameter. The gain parameter sets the precision of the floating point corresponding to the ciphertext mantissa. The exponent parameter is adapted to multiplication or division. The artificial intelligence model performs operations on the ciphertext data to return the ciphertext result.
    Type: Application
    Filed: February 17, 2023
    Publication date: May 16, 2024
    Inventors: Yu Te KU, Chih-Fan HSU, Wei-Chao CHEN, Feng-Hao LIU, Ming-Ching CHANG
  • Publication number: 20240080180
    Abstract: The federated learning system includes a moderator and client devices. Each client device performs a method for verifying model update as follows: receiving a hash function and a general model; training a client model according to the general model and raw data; calculating a difference as an update parameter between the general model and the client model, sending the update parameter to the moderator; inputting the update parameter to the hash function to generate a hash value; sending the hash value to other client devices, and receiving other hash values; summing all the hash values to generate a trust value; receiving an aggregation parameter calculated according to the update parameters; inputting the aggregation parameter to the hash function to generate a to-be-verified value; and updating the client model according to the aggregation parameter when the to-be-verified value equals the trust value.
    Type: Application
    Filed: December 20, 2022
    Publication date: March 7, 2024
    Inventors: Chih-Fan HSU, Wei-Chao CHEN, Jing-Lun Huang, Ming-Ching Chang, Feng-Hao Liu
  • Publication number: 20110297225
    Abstract: A photovoltaic cell structure includes a substrate, a metal layer, a p-type semiconductor layer, an n-type semiconductor layer, a transparent conductive layer and a high resistivity layer. The metal layer is formed on the substrate. The p-type semiconductor layer is formed on the metal layer and may include a compound of copper indium gallium selenium sulfur (CIGSS), copper indium gallium selenium (CIGS), copper indium sulfur (CIS), copper indium selenium (CIS) or a compound of at least two of copper, selenium or sulfur. The n-type semiconductor layer exhibits photo catalyst behavior that can increase carrier mobility by receiving light, and is formed on the p-type semiconductor layer, thereby forming a p-n junction. The transparent conductive layer is formed on the n-type semiconductor layer. The high resistivity layer is formed between the metal layer and the transparent conductive layer.
    Type: Application
    Filed: August 19, 2011
    Publication date: December 8, 2011
    Applicant: PVNEXT CORPORATION
    Inventors: FENG FAN CHANG, HSIN HUNG LIN, HSIN CHIH LIN, CHI HUA HSIEH, TSUNG LUNG LEE
  • Publication number: 20100258167
    Abstract: A photovoltaic cell structure includes a substrate, a metal layer, a p-type semiconductor layer, an n-type semiconductor layer, a high resistivity layer, an assistant electrode layer, and a transparent conductive layer. The metal layer is formed on the substrate, and comprises a plurality of p-type electrode units separated from each other. The p-type semiconductor layer is formed on the metal layer. The n-type semiconductor is formed on the p-type semiconductor layer, thereby forming a p-n junction. The high resistivity layer is formed on the n-type semiconductor layer. The assistant electrode layer is formed on the high resistivity layer and the p-type electrode units. The transparent conductive layer is formed on the assistant electrode layer, the high resistivity layer and the p-type electrode units. Accordingly, at least one cell is formed on each of the p-type electrode units. The assistant electrode layer and the transparent conductive layer are connected to the cells in series.
    Type: Application
    Filed: April 8, 2010
    Publication date: October 14, 2010
    Applicant: PVNEXT CORPORATION
    Inventors: FENG FAN CHANG, HSIN CHIH LIN, HSIN HUNG LIN, CHI HAU HSIEH, TZUNG ZONE LI
  • Publication number: 20100243044
    Abstract: A photovoltaic cell structure includes a substrate, a metal layer, a p-type semiconductor layer, an n-type semiconductor layer, a transparent conductive layer and a high resistivity layer. The metal layer is formed on the substrate. The p-type semiconductor layer is formed on the metal layer and may include a compound of copper indium gallium selenium sulfur (CIGSS), copper indium gallium selenium (CIGS), copper indium sulfur (CIS), copper indium selenium (CIS) or a compound of at least two of copper, selenium or sulfur. The n-type semiconductor layer exhibits photo catalyst behavior that can increase carrier mobility by receiving light, and is formed on the p-type semiconductor layer, thereby forming a p-n junction. The transparent conductive layer is formed on the n-type semiconductor layer. The high resistivity layer is formed between the metal layer and the transparent conductive layer.
    Type: Application
    Filed: July 23, 2009
    Publication date: September 30, 2010
    Inventors: FENG FAN CHANG, HSIN HUNG LIN, HSIN CHIH LIN, CHI HAU HSIEH, TZUNG ZONE LI
  • Publication number: 20100139757
    Abstract: A photovoltaic cell structure includes a substrate, a metal layer, a high resistivity layer, a p-type semiconductor layer, an n-type semiconductor layer and a transparent conductive layer. The metal layer may include molybdenum and be formed on the substrate to be a back contact metal layer of the cell. The high resistivity layer (e.g., V2O5) is formed on the metal layer. The p-type semiconductor layer is formed on the high resistivity layer and may include compound of CIGS or CIS. The n-type semiconductor layer (e.g., CdS) is formed on the p-type semiconductor layer, thereby forming a p-n junction. The transparent conductive layer is formed on the n-type semiconductor layer.
    Type: Application
    Filed: February 27, 2009
    Publication date: June 10, 2010
    Applicant: RITDISPLAY CORPORATION
    Inventors: FENG FAN CHANG, HSIN CHIH LIN, HSIN HUNG LIN, CHI HAU HSIEH, TZUNG ZONE LI
  • Publication number: 20100139758
    Abstract: A photovoltaic cell structure includes a substrate, a metal layer, a p-type semiconductor layer, an n-type semiconductor layer and a transparent conductive layer. The substrate has a rough surface. The metal layer may include molybdenum and be formed on the rough surface. The p-type semiconductor layer is formed on the metal layer and may include CIGSS, CIGS, CIS, or compound of two or more of copper, selenium, sulfur. The n-type semiconductor layer is formed on the p-type semiconductor layer thereby forming a rough p-n junction surface. The n-type semiconductor layer may include CdS. The transparent conductive layer is formed on the n-type semiconductor layer. In an embodiment, the roughness Ra of the rough surface is between 0.01 to 100 ?m.
    Type: Application
    Filed: February 27, 2009
    Publication date: June 10, 2010
    Applicant: RITDISPLAY CORPORATION
    Inventors: FENG FAN CHANG, HSIN CHIH LIN, HSIN HUNG LIN, CHI HAU HSIEH, TZUNG ZONE LI