Abstract: A method for performing OPC and evaluating OPC solutions is disclosed. An exemplary method includes receiving a design database corresponding to an IC circuit mask. A first lithography simulation and evaluation is performed on the design database utilizing a first set of performance indexes. A modification is made to the design database based on a result of performing the first lithography simulation and evaluation. A second lithography simulation and evaluation is performed on the design database utilizing a second set of performance indexes to verify the modification. If necessary, the design database is modified again based on a result of the second lithography simulation and evaluation. The modified design database is provided to a mask manufacturer for manufacturing the mask corresponding to the modified design database.

Abstract: A toy vehicle including a base frame having a front end and a rear end, with a front fork unit coupled to the front end of the base frame. The front wheel mounted on the front fork is reinforced by solid spoke wheel halves coupled together and a front fender is also coupled to the front fork unit. The front fork unit includes two symmetrical sleeves on each side, one slidable within the other. The outer sleeve has a longitudinal opening and an upper stop surface. The inner sleeve has a corresponding longitudinal opening and mounts the front wheel axle at the lower end thereof. A bearing block is mounted on each side of the fender and is received through said longitudinal openings coupling the fender to the fork unit.