Patents by Inventor Feng-Meei WU

Feng-Meei WU has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220363944
    Abstract: An inkjet ink is provided. The inkjet ink includes a modified high-performance engineering plastic, a polar solvent, and a wetting agent. Additionally, a 3D printing method and a 3D printing object are provided. The modified high-performance engineering plastic includes modified polyphenylene sulfide, modified polyether-ether-ketone, modified polyether sulfone, modified polyphenylsulfone, or modified polysulfone.
    Type: Application
    Filed: April 29, 2022
    Publication date: November 17, 2022
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Yi-Tsung PAN, Shinn-Jen CHANG, Wesley Jen-Yang CHANG, Feng-Meei WU, Po-Hsien HO, Chung-Han YU
  • Publication number: 20200384687
    Abstract: A composite material is provided, which includes powder of a polymer uniformly distributed in a blend of the polymer and a compound. The polymer and the compound have similar molecular structure. The compound has a first initially melting temperature and a first completely melting temperature. The polymer has a second initially melting temperature and a second completely melting temperature. The first completely melting temperature is lower than the second initially melting temperature.
    Type: Application
    Filed: June 8, 2020
    Publication date: December 10, 2020
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Yi-Tsung PAN, Shinn-Jen CHANG, Wesley Jen-Yang CHANG, Jer-Young CHEN, Feng-Meei WU
  • Publication number: 20190127599
    Abstract: A dispersion of IR absorption particles is provided, which includes 100 parts by weight of IR absorption particles, 5 to 30 parts by weight of diblock copolymer, and 200 to 910 parts by weight of water, wherein the diblock copolymer includes (a) first block of and (b) second block of wherein (a) first block is chemically bonded to (b) second block; R1 is H or CH3; R2 is H or CH3; R3 is R4 is C1-10 alkyl group; M? is Na+, NH4+, or NH(C2H4OH)3+; m=10-20; n=2-20; and x=0-4.
    Type: Application
    Filed: October 30, 2018
    Publication date: May 2, 2019
    Applicant: Industrial Technology Research Institute
    Inventors: Jer-Young CHEN, Yi-Tsung PAN, Shinn-Jen CHANG, Cha-Wen CHANG, Feng-Meei WU, Chen-Yu CHEN, Ping-Chen CHEN, Ching-Sung CHEN