Abstract: A method of mounting flip-chip for lowering the on-resistance of power transistor in the protection circuit of rechargeable battery, which comprises a power field effect transistor and a protection IC, has the following steps: first, serially connect drain metal contacts of two transistors to form a chip cell during fabrication of wafer; then, use welding torch to point weld the metal wire on contact of each chip cell, so that the source and gate contacts will form welding metal bumps respectively; cut the wafer to form bare chip cells of two serially connected gate electrodes; stain said chip cell with tin so that said welding metal bumps on contacts are attached with tin balls; apply plastic material to positioned points of printed circuit board; use flip-chip technology to make drain of a bare chip cell face upward, so that said tin balls are aligned with the positioned points of printed circuit board; finally, passing through an oven for heating and pressuring, so that said tin balls will fuse and said pl

Abstract: A wireless bonded semiconductor device comprises a semiconductor chip packaged on a metal lead frame, in which the semiconductor chip contains at least one contact electrically connected to a lead frame and a connecting-pin terminal leading out from its bottom face, and at least one contact and a plurality of individual connecting-pin terminals leading out from its top face, there is no metal bonding wire exists between the surface contact and individual connecting-pin terminals, instead a matrix of the connecting-pin terminal with pre-determined extension length that directly folded and bonded onto the surface contact of the semiconductor chip is employed.

Abstract: A method of mounting flip-chip for lowering the on-resistance of power transistor in the protection circuit of rechargeable battery, which comprises a power field effect transistor and a protection IC, has the following steps: first, serially connect drain metal contacts of two transistors to form a chip cell during fabrication of wafer; then, use welding torch to point weld the metal wire on contact of each chip cell, so that the source and gate contacts will form welding metal bumps respectively; cut the wafer to form bare chip cells of two serially connected gate electrodes; stain said chip cell with tin so that said welding metal bumps on contacts are attached with tin balls; apply plastic material to positioned points of printed circuit board; use flip-chip technology to make drain of a bare chip cell face upward, so that said tin balls are aligned with the positioned points of printed circuit board; finally, passing through an oven for heating and pressuring, so that said tin balls will fuse and said pl

Abstract: The invention disclosed a power MOSFET with reduced snap-back and being capable increasing avalanche-breakdown current endurance, which has sequentially a drain with N+ silicon substrate, an N− epitaxial layer formed on said N+ silicon substrate, a source contact region formed of N+ doped well and P+ doped well implanted after etching in a P− well formed on said N− epitaxial layer, and a gate electrode with deposition of polysilicon above a channel between said N− epitaxial layer and N+ source contact region, said device is characterized in that: Said source contact region is formed by etching into said P− well first and implanting P+ dopant to the interface between said N− epitaxial layer and P− well, and the source contact region of said N+ well and that of said P+ well are not at the same level, by which it is possible to increase the avalanche-breakdown current endurance of the power MOSFET device.

Abstract: The invention disclosed a power MOSFET with reduced snap-back and being capable increasing avalanche-breakdown current endurance, which has sequentially a drain with N+ silicon substrate, an N31 epitaxial layer formed on said N+ silicon substrate, a source contact region formed of N+ doped well and P+ doped well implanted after etching in a P− well formed on said N− epitaxial layer, and a gate electrode with deposition of polysilicon above a channel between said N− epitaxial layer and N+ source contact region, said device is characterized in that: Said source contact region is formed by etching into said P− well first and implanting P+ dopant to the interface between said N− epitaxial layer and P− well, and the source contact region of said N+ well and that of said P+ well are not at the same level, by which it is possible to increase the avalanche-breakdown current endurance of the power MOSFET device.

Abstract: A wireless bonded semiconductor device comprises a semiconductor chip packaged on a metal lead frame, in which the semiconductor chip contains at least one contact electrically connected to a lead frame and a connecting-pin terminal leading out from its bottom face, and at least one contact and a plurality of individual connecting-pin terminals leading out from its top face, there is no metal bonding wire exists between the surface contact and individual connecting-pin terminals, instead a matrix of the connecting-pin terminal with pre-determined extension length that directly folded and bonded onto the surface contact of the semiconductor chip is employed.

Abstract: A wireless bonded semiconductor device comprises a semiconductor chip packaged on a metal lead frame, in which the semiconductor chip contains at least one contact electrically connected to a lead frame and a connecting-pin terminal leading out from its bottom face, and at least one contact and a plurality of individual connecting-pin terminals leading out from its top face, there is no metal bonding wire exists between the surface contact and individual connecting-pin terminals, instead a matrix of the connecting-pin terminal with pre-determined extension length that directly folded and bonded onto the surface contact of the semiconductor chip is employed.

Abstract: A method of mounting flip-chip for lowering the on-resistance of power transistor in the protection circuit of rechargeable battery, which comprises a power field effect transistor and a protection IC, has the following steps: first, serially connect drain metal contacts of two transistors to form a chip cell during fabrication of wafer; then, use welding torch to point weld the metal wire on contact of each chip cell, so that the source and gate contacts will form welding metal bumps respectively; cut the wafer to form bare chip cells of two serially connected gate electrodes; stain said chip cell with tin so that said welding metal bumps on contacts are attached with tin balls; apply plastic material to positioned points of printed circuit board; use flip-chip technology to make drain of a bare chip cell face upward, so that said tin balls are aligned with the positioned points of printed circuit board; finally, passing through an oven for heating and pressuring, so that said tin balls will fuse and said pl

Abstract: A bandwidth enhancement method by adding a peaking capacitor to a transimpedance amplifier for creating peaking effect is to add a peaking capacitor to a transimpedance amplifier for obtaining an extra pole that can alter circuit phase and enhance bandwidth of the transimpedance amplifier without changing the framework and DC gain of the original amplifier circuit.