Patents by Inventor Fengzhao Dai

Fengzhao Dai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Multi field point aberration parallel metrology device and method for lithographic projection lens
    Patent number: 9766154
    Abstract: A multi field point aberration parallel detection device for a lithographic projection lens and a detection method therefor, having a spatial light modulator that is respectively arranged on the object plane and the image plane of the projection lens under test, wherein the object plane spatial light modulator and the image plane spatial light modulator are respectively disposed as an object plane grating set comprising multiple one-dimensional gratings and an image plane grating set comprising multiple two-dimensional gratings via computer programming. The gratings in the object plane grating set and the image plane grating set are conjugate one to another in respect of the projection lens under test, with each pair of conjugate grating being measured for the wave aberration of a field point.
    Type: Grant
    Filed: December 30, 2015
    Date of Patent: September 19, 2017
    Assignee: Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences
    Inventors: Fengzhao Dai, Xiangzhao Wang, Feng Tang, Yazhong Zheng
  • MULTI FIELD POINT ABERRATION PARALLEL METROLOGY DEVICE AND METHOD FOR LITHOGRAPHIC PROJECTION LENS
    Publication number: 20170131176
    Abstract: A multi field point aberration parallel detection device for a lithographic projection lens and a detection method therefor, having a spatial light modulator that is respectively arranged on the object plane and the image plane of the projection lens under test, wherein the object plane spatial light modulator and the image plane spatial light modulator are respectively disposed as an object plane grating set comprising multiple one-dimensional gratings and an image plane grating set comprising multiple two-dimensional gratings via computer programming. The gratings in the object plane grating set and the image plane grating set are conjugate one to another in respect of the projection lens under test, with each pair of conjugate grating being measured for the wave aberration of a field point.
    Type: Application
    Filed: December 30, 2015
    Publication date: May 11, 2017
    Inventors: Fengzhao Dai, Xiangzhao Wang, Feng Tang, Yazhong Zheng