Patents by Inventor Ferdy Migchelbrink
Ferdy Migchelbrink has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20230314964Abstract: The present invention provides a fluid purging system (100) for an optical element (120), comprising a fluid guiding unit arranged to guide a fluid, provided by a fluid supply system, over at least a curved portion of an optical surface (122) of the optical element. The fluid guiding unit comprises a fluid inlet and a first nozzle unit (110) for providing a fluid to the optical surface. The fluid guiding unit being formed by at least a first wall portion (102) and at least a second wall portion (104), wherein the second wall portion being configured to face the optical surface and to follow a contour of the optical surface. The second wall portion comprises a second nozzle unit (112).Type: ApplicationFiled: May 10, 2021Publication date: October 5, 2023Applicant: ASML Netherlands B.V.Inventors: José Nilton FONSECA JUNIOR, Zhuangxiong HUANG, Franciscus Johannes Leonardus HEUTZ, Ferdy MIGCHELBRINK, Henricus Anita Jozef Wilhelmus VAN DE VEN, Ramo OMEROVIC, Emericus Antoon Theodorus VAN DEN AKKER
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Publication number: 20230205102Abstract: The present invention provides a fluid purging system (100) for an optical element (30), comprising a ring and a fluid supply system (40). The ring being formed of a body entirely surrounding the optical element, the ring defining a space (5) radially inwards thereof and adjacent to the optical element. The ring is formed by at least one first wall portion (10) and at least one second wall portion (20A;20B), wherein an average height of the first wall portion is greater than an average height of the second wall portion. The fluid supply system is positioned radially outwards of the ring and configured to supply fluid to pass over the at least one second wall portion to the space.Type: ApplicationFiled: April 30, 2021Publication date: June 29, 2023Applicant: ASML Netherlands B.V.Inventors: José Nilton FONSECA JUNIOR, Franciscus Johannes Leonardus HEUTZ, Zhuangxiong HUANG, Ferdy MIGCHELBRINK
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Patent number: 11086239Abstract: A cleaning device for an apparatus for processing production substrates, the cleaning device including: a body having dimensions similar to the production substrates so that the cleaning device is compatible with the apparatus, the body having a first major surface and a second major surface facing in the opposite direction to the first major surface; a chamber within the body configured to accommodate contaminants; an inlet from the first major surface to the chamber and configured to allow contaminants to be drawn into the chamber by a flow of fluid; and an outlet from the chamber to the second major surface, the cleaning device being configured to allow the fluid to exit the chamber but to prevent a contaminant leaving the chamber.Type: GrantFiled: March 13, 2019Date of Patent: August 10, 2021Assignee: ASML Netherlands B.V.Inventors: Miao Yu, Petrus Martinus Gerardus Johannes Arts, Erik Henricus Egidius Catharina Eummelen, Giovanni Luca Gattobigio, Maarten Holtrust, Han Henricus Aldegonda Lempens, Ferdy Migchelbrink, Theodorus Wilhelmus Polet, Gheorghe Tanasa
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Publication number: 20210116824Abstract: A cleaning device for an apparatus for processing production substrates, the cleaning device including: a body having dimensions similar to the production substrates so that the cleaning device is compatible with the apparatus, the body having a first major surface and a second major surface facing in the opposite direction to the first major surface; a chamber within the body configured to accommodate contaminants; an inlet from the first major surface to the chamber and configured to allow contaminants to be drawn into the chamber by a flow of fluid; and an outlet from the chamber to the second major surface, the cleaning device being configured to allow the fluid to exit the chamber but to prevent a contaminant leaving the chamber.Type: ApplicationFiled: March 13, 2019Publication date: April 22, 2021Applicant: ASML NETHERLANDS B.V.Inventors: Miao YU, Petrus, Martinus, Gerardus, Jothannes ARTS, Erik, Henricus, Egidius, Catharina EUMMELEN, Giovanni Luca GATTOBIGIO, Maarten HOLTRUST, Han, Henricus, Aldegonda LEMPENS, Ferdy MIGCHELBRINK, Theodorus Wilhelmus POLET, Gheorghe TANASA
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Patent number: 10802410Abstract: A plurality of extraction conduits is provided to remove immersion liquid into a chamber. The extraction conduits are arranged at different distances from a target portion of the substrate. From the chamber, a passage is provided to which a suction force is applied. When all the conduits are filled with immersion liquid, the extraction capacity will be greater than when one or more of the conduits comprise gas.Type: GrantFiled: October 20, 2016Date of Patent: October 13, 2020Assignee: ASML NETHERLANDS B.V.Inventors: Nicolaas Rudolf Kemper, Marcel Beckers, Stefan Philip Christiaan Belfroid, Ferdy Migchelbrink, Sergei Shulepov
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Patent number: 10725390Abstract: An inspection substrate for inspecting a component, such as a liquid confinement system, of an apparatus for processing production substrates is discussed. The inspection substrate includes a body having dimensions similar to a production substrate so that the inspection substrate is compatible with the apparatus, an illumination device, such as light emitting diodes, embedded in the body, a sensor, such as an imaging device or a pressure sensor, that is embedded in the body and configured to generate inspection information, such as image data, relating to a parameter of the component of the apparatus proximate to the inspection substrate, and a storage device embedded in the body and configured to store the inspection information.Type: GrantFiled: January 16, 2019Date of Patent: July 28, 2020Assignee: ASML Netherlands B.V.Inventors: Seerwan Saeed, Petrus Martinus Gerardus Johannes Arts, Harold Sebastiaan Buddenberg, Erik Henricus Egidius Catharina Eummelen, Giovanni Luca Gattobigio, Floor Lodewijk Keukens, Ferdy Migchelbrink, Jeroen Arnoldus Leonardus Johannes Raaymakers, Arnoldus Johannes Martinus Jozeph Ras, Gheorghe Tanasa, Jimmy Matheus Wilhelmus Van De Winkel, Daan Daniel Johannes Antonius Van Sommeren, Marijn Wouters, Miao Yu
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Patent number: 10495984Abstract: A barrier member configured to at least partly confine a liquid in a space between a projection system and a substrate table of an immersion lithographic system, the barrier member including: a liquid inlet configured to provide liquid to the space, a liquid outlet configured to remove liquid from the space, the liquid outlet having a porous member located in a surface configured toward face the substrate, a first gas inlet configured to provide gas to the space, the first gas inlet arranged to face toward the substrate and the first gas inlet located outward, relative to a central portion of the barrier member, of the porous member, and a second gas inlet configured to provide gas to the space, the second gas inlet arranged to face toward the substrate and the second gas inlet located outward, relative to the central portion, of the first gas inlet.Type: GrantFiled: February 15, 2019Date of Patent: December 3, 2019Assignee: ASML Netherlands B.V.Inventors: Marcel Beckers, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Johannes Henricus Wilhelmus Jacobs, Nicolaas Ten Kate, Nicolaas Rudolf Kemper, Ferdy Migchelbrink, Elmar Evers
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Publication number: 20190179232Abstract: A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations.Type: ApplicationFiled: February 15, 2019Publication date: June 13, 2019Applicant: ASML NETHERLANDS B.V.Inventors: Marcel BECKERS, Sjoerd Nicolaas Lambertus DONDERS, Christiaan Alexander HOOGENDAM, Johannes Henricus Wilhelmus JACOBS, Nicolaas TEN KATE, Nicolaas Rudolf KEMPER, Ferdy MIGCHELBRINK, Elmar EVERS
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Publication number: 20190146352Abstract: An inspection substrate for inspecting a component, such as a liquid confinement system, of an apparatus for processing production substrates is discussed. The inspection substrate includes a body having dimensions similar to a production substrate so that the inspection substrate is compatible with the apparatus, an illumination device, such as light emitting diodes, embedded in the body, a sensor, such as an imaging device or a pressure sensor, that is embedded in the body and configured to generate inspection information, such as image data, relating to a parameter of the component of the apparatus proximate to the inspection substrate, and a storage device embedded in the body and configured to store the inspection information.Type: ApplicationFiled: January 16, 2019Publication date: May 16, 2019Applicant: ASML Netherlands B.V.Inventors: Seerwan Saeed, Petrus Martinus Gerardus Johannes Arts, Harold Sebastiaan Buddenberg, Erik Henricus Egidius Catharina Eummelen, Giovanni Luca Gattobigio, Floor Lodewijk Keukens, Ferdy Migchelbrink, Jeroen Arnoldus Leonardus Johannes Raaymakers, Arnoldus Johannes Martinus Jozeph Ras, Gheorghe Tanasa, Jimmy Matheus Wilhelmus Van De Winkel, Daan Daniel Johannes Antonius Van Sommeren, Marijn Wouters, Miao Yu
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Patent number: 10216100Abstract: An inspection substrate for inspecting a component, such as a liquid confinement system, of an apparatus for processing production substrates is discussed. The inspection substrate includes a body having dimensions similar to a production substrate so that the inspection substrate is compatible with the apparatus, an illumination device, such as light emitting diodes, embedded in the body, a sensor, such as an imaging device or a pressure sensor, that is embedded in the body and configured to generate inspection information, such as image data, relating to a parameter of the component of the apparatus proximate to the inspection substrate, and a storage device embedded in the body and configured to store the inspection information.Type: GrantFiled: June 16, 2016Date of Patent: February 26, 2019Assignee: ASML Netherlands B.V.Inventors: Seerwan Saeed, Petrus Martinus Gerardus Johannes Arts, Harold Sebastiaan Buddenberg, Erik Henricus Egidius Catharina Eummelen, Giovanni Luca Gattobigio, Floor Lodewijk Keukens, Ferdy Migchelbrink, Jeroen Arnoldus Leonardus Johannes Raaymakers, Arnoldus Johannes Martinus Jozeph Ras, Gheorghe Tanasa, Jimmy Matheus Wilhelmus Van De Winkel, Daan Daniel Johannes Antonius Van Sommeren, Marijn Wouters, Miao Yu
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Patent number: 10209629Abstract: A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations.Type: GrantFiled: November 28, 2017Date of Patent: February 19, 2019Assignee: ASML Netherlands B.V.Inventors: Marcel Beckers, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Johannes Henricus Wilhelmus Jacobs, Nicolaas Ten Kate, Nicolaas Rudolf Kemper, Ferdy Migchelbrink, Elmar Evers
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Publication number: 20180181004Abstract: An inspection substrate for inspecting a component, e.g. a liquid confinement system, of an apparatus for processing production substrates, e.g. a lithographic apparatus, the inspection substrate comprising: a body having dimensions similar to a production substrate so that the inspection substrate is compatible with the apparatus; an illumination device, e.g. light emitting diodes, embedded in the body; a sensor, e.g. an imaging device or a pressure sensor, for generating inspection information relating to a parameter of a component of the apparatus proximate to the inspection substrate, the sensor embedded in the body; and a storage device embedded in the body, the storage device configured to store the inspection information, e.g. image data.Type: ApplicationFiled: June 16, 2016Publication date: June 28, 2018Applicant: ASML Netherlands B.V.Inventors: Seerwan SAEED, Petrus Martinus Gerardus Johannes ARTS, Harold Sebastiaan BUDDENBERG, Erik Henricus Egidius Catharina EUMMELEN, Giovanni Luca GATTOBIGIO, Floor Lodewijk KEUKENS, Ferdy MIGCHELBRINK, Jeroen Arnoldus Leonardus Johanne RAAYMAKERS, Arnoldus Johannes Martinus Jozeph RAS, Gheorghe TANASA, Jimmy Matheus Wilhelmus VAN DE WINKEL, Daan Daniel Johannes Antonius VAN SOMMEREN, Marijn WOUTERS, Miao YU
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Publication number: 20180081285Abstract: A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations.Type: ApplicationFiled: November 28, 2017Publication date: March 22, 2018Applicant: ASML NETHERLANDS B.V.Inventors: Marcel BECKERS, Sjoerd Nicolaas Lambertus DONDERS, Christiaan Alexander HOOGENDAM, Johannes Henricus Wilhelmus JACOBS, Nicolaas TEN KATE, Nicolaas Rudolf KEMPER, Ferdy MIGCHELBRINK, Elmar EVERS
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Patent number: 9857695Abstract: A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations.Type: GrantFiled: August 29, 2016Date of Patent: January 2, 2018Assignee: ASML NETHERLANDS B.V.Inventors: Marcel Beckers, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Johannes Henricus Wilhelmus Jacobs, Nicolaas Ten Kate, Nicolaas Rudolf Kemper, Ferdy Migchelbrink, Elmar Evers
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Publication number: 20170038695Abstract: A plurality of extraction conduits is provided to remove immersion liquid into a chamber. The extraction conduits are arranged at different distances from a target portion of the substrate. From the chamber, a passage is provided to which a suction force is applied. When all the conduits are filled with immersion liquid, the extraction capacity will be greater than when one or more of the conduits comprise gas.Type: ApplicationFiled: October 20, 2016Publication date: February 9, 2017Applicant: ASML NETHERLANDS B.V.Inventors: Nicolaas Rudolf KEMPER, Marcel BECKERS, Stefan Philip Christiaan BELFROID, Ferdy MIGCHELBRINK, Sergei SHULEPOV
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Publication number: 20160370713Abstract: A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations.Type: ApplicationFiled: August 29, 2016Publication date: December 22, 2016Applicant: ASML NETHERLANDS B.V.Inventors: Marcel BECKERS, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Johannes Henricus Wilhelmus Jacobs, Nicolaas Ten Kate, Nicolaas Rudolf Kemper, Ferdy Migchelbrink, Elmar Evers
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Patent number: 9477158Abstract: A plurality of extraction conduits are provided to remove immersion liquid into a chamber. The extraction conduits are arranged at different distances from a target portion of the substrate. From the chamber, a passage is provided to which a suction force is applied. When all the conduits are filled with immersion liquid, the extraction capacity will be greater than when one or more of the conduits comprise gas.Type: GrantFiled: April 14, 2006Date of Patent: October 25, 2016Assignee: ASML NETHERLANDS B.V.Inventors: Nicolaas Rudolf Kemper, Marcel Beckers, Stefan Philip Christiaan Belfroid, Ferdy Migchelbrink, Sergei Shulepov
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Patent number: 9429853Abstract: A lithographic apparatus, including a movable table, a projection system configured to project a patterned radiation beam onto a substrate, and a liquid supply system configured to provide liquid to a space between a final element of the projection system and the table, the liquid supply system including an inlet configured to provide liquid to the space, the inlet including an array of inlet orifices located below a bottom surface of the final element and configured to provide an essentially horizontal flow of liquid therefrom, the array of inlet orifices extending along a side of an exposure field of the patterned radiation beam, and an extractor configured to remove liquid from the space, the extractor including a two dimensional array of outlet orifices, extending at least partly in a horizontal direction, through which the liquid can be extracted from the space.Type: GrantFiled: March 20, 2015Date of Patent: August 30, 2016Assignee: ASML NETHERLANDS B.V.Inventors: Marcel Beckers, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Johannes Henricus Wilhelmus Jacobs, Nicolaas Ten Kate, Nicolaas Rudolf Kemper, Ferdy Migchelbrink, Elmar Evers
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Publication number: 20150309420Abstract: A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations.Type: ApplicationFiled: March 20, 2015Publication date: October 29, 2015Applicant: ASML NETHERLANDS B.V.Inventors: Marcel BECKERS, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Johannes Henricus Wilhelmus Jacobs, Nicolaas Ten Kate, Nicolaas Rudolf Kemper, Ferdy Migchelbrink, Elmar Evers
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Patent number: 8988651Abstract: A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations.Type: GrantFiled: September 23, 2011Date of Patent: March 24, 2015Assignee: ASML Netherlands B.V.Inventors: Marcel Beckers, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Johannes Henricus Wilhelmus Jacobs, Nicolaas Ten Kate, Nicolaas Rudolf Kemper, Ferdy Migchelbrink, Elmar Evers