Patents by Inventor Ferenc Riesz

Ferenc Riesz has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Apparatus and measurement procedure for the fast, quantitative, non-contact topographic investigation of semiconductor wafers and other mirror like surfaces
    Patent number: 7133140
    Abstract: Apparatus and process for fast, quantitative, non-contact topographic investigation of samples. Apparatus includes a light source, and a collimating concave mirror structured and arranged to produce a parallel beam and to direct the parallel beam to a sample to be investigated. A structured mask is located between the light source and the concave mirror, and an image sensor structured and arranged to receive a beam reflected from the sample and the concave mirror. Relative positions of the mask and the sensor to other elements of the apparatus are chosen to provide an essentially sharp image of the mask on the sensor. The instant abstract is neither intended to define the invention disclosed in this specification nor intended to limit the scope of the invention in any way.
    Type: Grant
    Filed: April 1, 2004
    Date of Patent: November 7, 2006
    Assignees: Fraunhofer-Gesellschaft zur Foerderung der angewandten Forschung E.V., Hungarian Academy of Sciences Research Institute for Technical Physics and Materials Science
    Inventors: István Endre Lukács, János Makai, Lothar Pfitzner, Ferenc Riesz, Béla Szentpali
  • Apparatus and measurement procedure for the fast, quantitative, non-contact topographic investigation of semiconductor wafers and other mirror like surfaces
    Publication number: 20040263864
    Abstract: Apparatus and process for fast, quantitative, non-contact topographic investigation of samples. Apparatus includes a light source, and a collimating concave mirror structured and arranged to produce a parallel beam and to direct the parallel beam to a sample to be investigated. A structured mask is located between the light source and the concave mirror, and an image sensor structured and arranged to receive a beam reflected from the sample and the concave mirror. Relative positions of the mask and the sensor to other elements of the apparatus are chosen to provide an essentially sharp image of the mask on the sensor. The instant abstract is neither intended to define the invention disclosed in this specification nor intended to limit the scope of the invention in any way.
    Type: Application
    Filed: April 1, 2004
    Publication date: December 30, 2004
    Applicants: Fraunhofer-Gesellschaft zur Forderung der angewandten Forschung e.V., Hungarian Academy of Sciences Research Institute for Technizal Physics and Material Science
    Inventors: Istvan Endre Lukacs, Janos Makai, Lothar Pfitzner, Ferenc Riesz, Bela Szentpali