Patents by Inventor Ferencz S. Denes

Ferencz S. Denes has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20030129107
    Abstract: A plasma generator includes several plasma sources distributed in an array for plasma treatment of surfaces. Each plasma source includes first and second conductive electrodes. Each second electrode has a gas passage defined therein, and one of the first electrodes is situated within the gas passage in spaced relation from the second electrode, with each gas passage thereby constituting the free space for plasma generation between each pair of first and second electrodes. An insulating layer is interposed between the first and second electrodes to facilitate plasma formation via dielectric barrier discharge (DBD) in the gas passages between the first and second electrodes. The first electrodes may be provided in a monolithic structure wherein they all protrude from a common bed, and similarly the second electrodes may be monolithically formed by defining the gas passages within a common second electrode member.
    Type: Application
    Filed: January 8, 2002
    Publication date: July 10, 2003
    Inventors: Ferencz S. Denes, Sorin O. Manolache, Noah Hershkowitz
  • Patent number: 6543460
    Abstract: Seeds are treated in a cold plasma in a reaction chamber to etch the surface of the seeds to remove surface materials, such as fungicides and insecticides, or to disinfect the surfaces. The cold plasma process is carried out using etch gases which do not harm the seeds and for selected periods of time sufficient to remove surface materials without necessarily affecting the viability of live seeds after treatment. Tumbling the seeds while exposing the seeds to the plasma allows the surfaces of the seeds to be etched uniformly.
    Type: Grant
    Filed: June 23, 2000
    Date of Patent: April 8, 2003
    Assignee: Wisconsin Alumni Research Foundation
    Inventors: Ferencz S. Denes, Raymond A. Young, Sorin Manolache, John C. Volin
  • Patent number: 6402899
    Abstract: A wide variety of substrates can be functionalized to attach spacer molecules therein by exposing the substrates to a cold plasma ignited in dichlorosilane, silicon tetrachloride or hexachlorodisilane gas to implant silicon-chlorine functionalities in the substrate surface. The plasma implanted surface functionalities can then be utilized to initiate second stage gas phase derivatization reactions to form linker molecules attached to the substrate. Active biomolecules such as enzymes can then be bound to the exposed linker molecules to bind the bioactive molecules to the substrate while allowing freedom of movement and conformation of the bound molecule comparable to that of the free molecule.
    Type: Grant
    Filed: January 27, 2000
    Date of Patent: June 11, 2002
    Assignee: Wisconsin Alumni Research Foundation
    Inventors: Ferencz S. Denes, Sorin O. Manolache, Majid Sarmadi, Raymond A. Young, Ramaswami Ganapathy, Alvaro de Jesus Martinez-Gomez
  • Publication number: 20020037320
    Abstract: A method and apparatus is utilized for producing colloidal dispersions of nanoparticles of electrically conducting materials. The colloidal dispersions are produced in a dense media plasma reactor comprising at least one static electrode and at least one rotating electrode. The plasma reaction sputters off minute particles of the electrically conducting material from which the electrodes are made. Methods of using the colloidal dispersions thus made are also described. Colloidal dispersions of silver produced in this manner are highly effective for bactericidal purposes.
    Type: Application
    Filed: June 13, 2001
    Publication date: March 28, 2002
    Inventors: Ferencz S. Denes, Sorin O. Manolache, Noah Hershkowitz
  • Patent number: 6082292
    Abstract: A surface treatment gas reactor features a reactor housing and a roller assembly for transporting a bi-dimensional material into and out of a gas reaction chamber. The reactor housing has a reactive gas inlet port and gas outlet or vacuum ports formed therein. Electrodes are mounted within the reactor housing between the gas inlet port and the gas outlet port such that a reactive gas admitted into the reaction chamber through the gas inlet port must pass through a plasma curtain generated by the electrodes before passing out of the outlet ports. The roller assembly includes a central roller having a grounded surface for transporting a bi-dimensional substrate through the reaction chamber on the surface thereof. The central roller is sized so as to reduce the active volume of the reaction chamber. Inside sealing rollers mounted adjacent to the central roller surface have compliant surfaces which form material transport contact points between the central roller and the inside sealing rollers.
    Type: Grant
    Filed: January 5, 1999
    Date of Patent: July 4, 2000
    Assignee: Wisconsin Alumni Research Foundation
    Inventors: Ferencz S. Denes, Majid Sarmadi, Robert J. Sandberg
  • Patent number: 6054018
    Abstract: A surface treatment gas reactor features a roller assembly for transporting a bi-dimensional material into and out of a gas reaction chamber. Either a four-roller or a three-roller assembly may be employed. The roller assembly is configured such that the surface area of the rollers in the roller assembly which are exposed to the interior of the reaction chamber is minimized. Thus, most of the rollers in the roller assembly are located outside of the reaction chamber. Active volume of the reaction chamber is reduced to a minimum by a large freely rotating roller and a specially shaped support piece mounted in the reaction chamber to occupy most of the dead volume in the reaction chamber. A bi-dimensional substrate to be treated is transported by the roller system and the freely rotating roller through a plasma generated in the reaction chamber by electrodes mounted in a removable electrode holder within the chamber. Axial ends of the rollers in the roller system are sealed with minimum surface contact.
    Type: Grant
    Filed: August 28, 1998
    Date of Patent: April 25, 2000
    Assignee: Wisconsin Alumni Research Foundation
    Inventors: Ferencz S. Denes, Robert J. Sandberg
  • Patent number: 5908539
    Abstract: A method and apparatus for reacting dense-medium chemicals in an induced plasma state and novel reaction products resulting from the method are described.
    Type: Grant
    Filed: August 1, 1996
    Date of Patent: June 1, 1999
    Assignee: Wisconsin Alumni Research Foundation
    Inventors: Raymond A. Young, Ferencz S. Denes, Zhong-Quiang Hua
  • Patent number: 5705233
    Abstract: Treatment in a plasma of a composite reinforcing agent improves the bonding of the agent to the cement portion of the composite. This method facilitates the use of inexpensive readily available light, high tensile strength fibers as reinforcing agents. The reinforcing agents are activated by providing on the surface thereof charged atoms compatible with the cementitious portion of a composite desired to be strengthened.
    Type: Grant
    Filed: June 6, 1995
    Date of Patent: January 6, 1998
    Assignee: Wisconsin Alumni Research Foundation
    Inventors: Ferencz S. Denes, Raymond A. Young, Zhong-Qiang Hua, Dorel Feldman, Zhihong Zheng
  • Patent number: 5604038
    Abstract: Liquid phase polymers deposited upon a substrate are cross-linked in the presence of a non-polymer-forming gas plasma to produce solid polymer coatings having improved chemical, thermal, and mechanical properties. The properties of the polymer layers formed in the method may be exploited by producing microelectronic circuitry, optical materials, and barrier coatings for a variety of substrate materials.
    Type: Grant
    Filed: November 18, 1994
    Date of Patent: February 18, 1997
    Assignee: Wisconsin Alumni Research Foundation
    Inventors: Ferencz S. Denes, Raymond A. Young, Abdolmajid Sarmadi, J. Leon Shohet
  • Patent number: 5534232
    Abstract: A method and apparatus for reacting dense-phase chemicals in an induced plasma state, as well as unique reaction products resulting from the method and apparatus, are described. The dense medium plasma reactor generally includes a reaction vessel containing an upper rotatable electrode and a lower static electrode, a device for rotating the upper electrode, a reactant recirculation line, structural elements capable of maintaining the contents of the reaction vessel at atmospheric temperature, and structural elements for cooling the contents of the reaction vessel. Each electrode constitutes a hollow shaft having a first end and a second end which terminates in a disk-shaped planar face. The electrodes are in vertical alignment with one another so that their disc-shaped planar faces are facing one another with a small planar gap located therebetween. The upper rotatable electrode also includes a plurality of ports located circumferentially about its shaft.
    Type: Grant
    Filed: August 11, 1994
    Date of Patent: July 9, 1996
    Assignee: Wisconsin Alumini Research Foundation
    Inventors: Ferencz S. Denes, Raymond A. Young