Patents by Inventor Fernando Hung

Fernando Hung has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Cleaning composition and method for cleaning semiconductor wafers after CMP
    Patent number: 9828574
    Abstract: The invention provides a composition for cleaning contaminants from semiconductor wafers following chemical-mechanical polishing. The cleaning composition contains one or more quaternary ammonium hydroxides, one or more organic amines, one or more metal inhibitors, and water. The invention also provides methods for using the cleaning composition.
    Type: Grant
    Filed: January 12, 2016
    Date of Patent: November 28, 2017
    Assignee: Cabot Microelectronics Corporation
    Inventors: Roman Ivanov, Fernando Hung, Cheng-Yuan Ko, Fred Sun
  • CLEANING COMPOSITION AND METHOD FOR CLEANING SEMICONDUCTOR WAFERS AFTER CMP
    Publication number: 20160201016
    Abstract: The invention provides a composition for cleaning contaminants from semiconductor wafers following chemical-mechanical polishing. The cleaning composition contains one or more quaternary ammonium hydroxides, one or more organic amines, one or more metal inhibitors, and water. The invention also provides methods for using the cleaning composition.
    Type: Application
    Filed: January 12, 2016
    Publication date: July 14, 2016
    Inventors: Roman Ivanov, Fernando Hung, Cheng-Yuan Ko, Fred Sun