Patents by Inventor Ferry Zijp
Ferry Zijp has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11940739Abstract: A metrology tool for determining a parameter of interest of a structure fabricated on a substrate, the metrology tool comprising: an illumination optical system for illuminating the structure with illumination radiation under a non-zero angle of incidence; a detection optical system comprising a detection optical sensor and at least one lens for capturing a portion of illumination radiation scattered by the structure and transmitting the captured radiation towards the detection optical sensor, wherein the illumination optical system and the detection optical system do not share an optical element.Type: GrantFiled: December 27, 2021Date of Patent: March 26, 2024Assignee: ASML Netherlands B.V.Inventors: Nitesh Pandey, Arie Jeffrey Den Boef, Duygu Akbulut, Marinus Johannes Maria Van Dam, Hans Butler, Hugo Augustinus Joseph Cramer, Engelbertus Antonius Fransiscus Van Der Pasch, Ferry Zijp, Jeroen Arnoldus Leonardus Johannes Raaymakers, Marinus Petrus Reijnders
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Publication number: 20240004313Abstract: Disclosed is an optical imaging system, and associated method, comprising a stage module configured to support an object such that an area of the object is illuminated by an illumination beam; an objective lens configured to collect at least one signal beam, the at least one signal beam originating from the illuminated area of the object; an image sensor configured to capture an image formed by the at least one signal beam collected by the objective lens; and a motion compensatory mechanism operable to compensate for relative motion of the stage module with respect to the objective lens during an image acquisition. The motion compensatory mechanism causes a compensatory motion of one or more of: said objective lens or at least one optical element thereof; said image sensor; and/or an optical element comprised within a detection branch and/or illumination branch of the optical imaging system.Type: ApplicationFiled: November 16, 2021Publication date: January 4, 2024Applicant: ASML Netherlands B.V.Inventors: Coen Adrianus VERSCHUREN, Ferry ZIJP, Nitesh PANDEY, Alexander Prasetya KONIJNENBERG
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Publication number: 20230333290Abstract: A lens system including: a first asphercal axicon lens element having a first refractive surface and a second refractive surface; a second aspherical axicon lens element having a third refractive surface similar to the second refractive surface and a fourth refractive surface similar to the first refractive surface, and an aperture stop located between the first asphercal axicon lens element and the second aspherical axicon lens element. The first aspherical axicon lens element and second aspherical axicon lens are mutually oriented such that the second refractive surface and third refractive surface are mutually facing. The first aspherical axicon lens element and the second aspherical axicon lens element are configured to minimize chromatic aberration for at least a spectral range of radiation relayed by the lens system.Type: ApplicationFiled: September 15, 2021Publication date: October 19, 2023Applicant: ASML NETHERLANDS B.V.Inventors: Ferry ZIJP, Ahmet Burak CUNBUL
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Patent number: 11694821Abstract: A reflector comprising a hollow body having an interior surface defining a passage through the hollow body, the interior surface having at least one optical surface part configured to reflect radiation and a supporter surface part, wherein the optical surface part has a predetermined optical power and the supporter surface part does not have the predetermined optical power. The reflector is made by providing an axially symmetric mandrel; shaping a part of the circumferential surface of the mandrel to form at least one inverse optical surface part that is not rotationally symmetric about the axis of the mandrel; forming a reflector body around the mandrel; and releasing the reflector body from the mandrel whereby the reflector body has an optical surface defined by the inverse optical surface part and a supporter surface part defined by the rest of the outer surface of the mandrel.Type: GrantFiled: August 23, 2021Date of Patent: July 4, 2023Assignee: ASML Netherlands B.V.Inventor: Ferry Zijp
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Publication number: 20220172347Abstract: Disclosed is a detection apparatus for simultaneous acquisition of multiple images of an object at a plurality of different focus levels; comprising: a modulator for obtaining multiple beam copies of an incoming beam; and a detector operable to capture said multiple beam copies, such that at two of said multiple beam copies are captured at different focus levels. Also disclosed is an inspection apparatus comprising such a detection system.Type: ApplicationFiled: April 2, 2020Publication date: June 2, 2022Applicant: ASML Netherlands B.V.Inventors: Teunis Willem TUKKER, Arie Jefrey DEN BOEF, Nitesh PANDEY, Marinus Petrus REIJNDERS, Ferry ZIJP
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Publication number: 20220121127Abstract: A metrology tool for determining a parameter of interest of a structure fabricated on a substrate, the metrology tool comprising: an illumination optical system for illuminating the structure with illumination radiation under a non-zero angle of incidence; a detection optical system comprising a detection optical sensor and at least one lens for capturing a portion of illumination radiation scattered by the structure and transmitting the captured radiation towards the detection optical sensor, wherein the illumination optical system and the detection optical system do not share an optical element.Type: ApplicationFiled: December 27, 2021Publication date: April 21, 2022Applicant: ASML Netherlands B.V.Inventors: Nitesh PANDEY, Arie Jeffrey DEN BOEF, Duygu AKBULUT, Marimus Johannes Maria VAN DAM, Hans BUTLER, Hugo Augustinus Joseph CRAMER, Engelbertus Antonius Franciscus VAN DER PASCH, Ferry ZIJP, Jeroen Arnoldus Leonardus Johannes RAAYMAKERS, Marinus Petrus REIJNDERS
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Patent number: 11262661Abstract: A metrology tool for determining a parameter of interest of a structure fabricated on a substrate, the metrology tool comprising: an illumination optical system for illuminating the structure with illumination radiation under a non-zero angle of incidence; a detection optical system comprising a detection optical sensor and at least one lens for capturing a portion of illumination radiation scattered by the structure and transmitting the captured radiation towards the detection optical sensor, wherein the illumination optical system and the detection optical system do not share an optical element.Type: GrantFiled: June 5, 2019Date of Patent: March 1, 2022Assignee: ASML Netherlands B.V.Inventors: Nitesh Pandey, Arie Jeffrey Den Boef, Duygu Akbulut, Marinus Johannes Maria Van Dam, Hans Butler, Hugo Augustinus Joseph Cramer, Engelbertus Antonius Fransiscus Van Der Pasch, Ferry Zijp, Jeroen Arnoldus Leonardus Johannes Raaymakers, Marinus Petrus Reijnders
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Patent number: 11243470Abstract: An optical system delivers illuminating radiation and collects radiation after interaction with a target structure on a substrate. A measurement intensity profile is used to calculate a measurement of the property of the structure. The optical system may include a solid immersion lens. In a method, the optical system is controlled to obtain a first intensity profile using a first illumination profile and a second intensity profile using a second illumination profile. The profiles are used to derive a correction for mitigating the effect of, e.g., ghost reflections. Using, e.g., half-moon illumination profiles in different orientations, the method can measure ghost reflections even where a solid immersion lens would cause total internal reflection. The optical system may include a contaminant detection system to control a movement based on received scattered detection radiation. The optical system may include an optical component having a dielectric coating to enhance evanescent wave interaction.Type: GrantFiled: August 21, 2017Date of Patent: February 8, 2022Assignee: ASML Netherlands B.V.Inventors: Nitish Kumar, Adrianus Johannes Hendrikus Schellekens, Sietse Thijmen Van Der Post, Ferry Zijp, Willem Maria Julia Marcel Coene, Peter Danny Van Voorst, Duygu Akbulut, Sarathi Roy
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Patent number: 11237484Abstract: A metrology tool, an aplanatic singlet lens, and a method of designing an aplanatic singlet lens are provided. The metrology tool is for determining a characteristic of a structure on a substrate. The metrology tool comprises an optical detection system for detecting radiation over a wavelength range. The optical detection system comprises an aplanatic singlet lens for focusing the radiation on to a detector. The aplanatic singlet lens has a n aplanatic wavelength which is within the wavelength range.Type: GrantFiled: May 15, 2020Date of Patent: February 1, 2022Assignee: ASML Netherlands B.V.Inventor: Ferry Zijp
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Publication number: 20210383940Abstract: A reflector comprising a hollow body having an interior surface defining a passage through the hollow body, the interior surface having at least one optical surface part configured to reflect radiation and a supporter surface part, wherein the optical surface part has a predetermined optical power and the supporter surface part does not have the predetermined optical power. The reflector is made by providing an axially symmetric mandrel; shaping a part of the circumferential surface of the mandrel to form at least one inverse optical surface part that is not rotationally symmetric about the axis of the mandrel; forming a reflector body around the mandrel; and releasing the reflector body from the mandrel whereby the reflector body has an optical surface defined by the inverse optical surface part and a supporter surface part defined by the rest of the outer surface of the mandrel.Type: ApplicationFiled: August 23, 2021Publication date: December 9, 2021Applicant: ASML Netherlands B.V.Inventor: Ferry ZIJP
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Patent number: 11145428Abstract: Some embodiment describe a reflector comprising a hollow body having an interior surface defining a passage. The interior surface has an optical surface part configured to reflect radiation and a supporter surface part. The optical surface part has a predetermined optical power and the supporter surface part does not. The reflector can be made by providing an axially symmetric mandrel, shaping a part of the circumferential surface of the mandrel to form an inverse optical surface part that is not rotationally symmetric about the axis of the mandrel, forming a reflector body around the mandrel and releasing the reflector body from the mandrel whereby the reflector body has an optical surface defined by the inverse optical surface part and a supporter surface part defined by the rest of the outer surface of the mandrel.Type: GrantFiled: June 13, 2019Date of Patent: October 12, 2021Assignee: ASML Netherlands B.V.Inventor: Ferry Zijp
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Publication number: 20200363727Abstract: A metrology tool, an aplanatic singlet lens, and a method of designing an aplanatic singlet lens are provided. The metrology tool is for determining a characteristic of a structure on a substrate. The metrology tool comprises an optical detection system for detecting radiation over a wavelength range. The optical detection system comprises an aplanatic singlet lens for focusing the radiation on to a detector. The aplanatic singlet lens has a n aplanatic wavelength which is within the wavelength range.Type: ApplicationFiled: May 15, 2020Publication date: November 19, 2020Applicant: ASML Netherlands B.V.Inventor: Ferry ZIJP
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Patent number: 10725381Abstract: An optical system (OS) for focusing a beam of radiation (B) on a region of interest in a metrology apparatus is described. The beam of radiation (B) comprises radiation in a soft X-ray or Extreme Ultraviolet spectral range. The optical system (OS) comprises a first stage (S1) for focusing the beam of radiation at an intermediate focus region. The optical system (OS) comprises a second stage (S2) for focusing the beam of radiation from the intermediate focus region onto the region of interest. The first and second stages each comprise a Kirkpatrick-Baez reflector combination. At least one reflector comprises an aberration-correcting reflector.Type: GrantFiled: August 30, 2018Date of Patent: July 28, 2020Assignee: ASML Netherlands B.V.Inventors: Sietse Thijmen Van Der Post, Stefan Michael Bruno Bäumer, Peter Danny Van Voorst, Teunis Willem Tukker, Ferry Zijp, Han-Kwang Nienhuys, Jacobus Maria Antonius Van Den Eerenbeemd
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Patent number: 10578979Abstract: A method involving a radiation intensity distribution for a target measured using an optical component at a gap from the target, the method including: determining a value of a parameter of interest using the measured radiation intensity distribution and a mathematical model describing the target, the model including an effective medium approximation for roughness of a surface of the optical component or a part thereof.Type: GrantFiled: February 19, 2019Date of Patent: March 3, 2020Assignee: ASML Netherlands B.V.Inventors: Sietse Thijmen Van Der Post, Ferry Zijp, Sander Bas Roobol
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Publication number: 20190384184Abstract: A metrology tool for determining a parameter of interest of a structure fabricated on a substrate, the metrology tool comprising: an illumination optical system for illuminating the structure with illumination radiation under a non-zero angle of incidence; a detection optical system comprising a detection optical sensor and at least one lens for capturing a portion of illumination radiation scattered by the structure and transmitting the captured radiation towards the detection optical sensor, wherein the illumination optical system and the detection optical system do not share an optical element.Type: ApplicationFiled: June 5, 2019Publication date: December 19, 2019Applicant: ASML Netherlands B.V.Inventors: Nitesh Pandey, Arie Jeffrey Den Boef, Duygu Akbulut, Marinus Johannes Maria Van Dam, Hans Butler, Hugo Augustinus Joseph Cramer, Engelbertus Antonius Fransiscu Van Der Pasch, Ferry Zijp, Jeroen Arnoldus Leonardus Raaymakers, Marinus Petrus Reijnders
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Publication number: 20190385760Abstract: Some embodiment describe a reflector comprising a hollow body having an interior surface defining a passage. The interior surface has an optical surface part configured to reflect radiation and a supporter surface part. The optical surface part has a predetermined optical power and the supporter surface part does not. The reflector can be made by providing an axially symmetric mandrel, shaping a part of the circumferential surface of the mandrel to form an inverse optical surface part that is not rotationally symmetric about the axis of the mandrel, forming a reflector body around the mandrel and releasing the reflector body from the mandrel whereby the reflector body has an optical surface defined by the inverse optical surface part and a supporter surface part defined by the rest of the outer surface of the mandrel.Type: ApplicationFiled: June 13, 2019Publication date: December 19, 2019Applicant: ASML Netherlands B.V.Inventor: Ferry ZIJP
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Publication number: 20190212660Abstract: An optical system delivers illuminating radiation and collects radiation after interaction with a target structure on a substrate. A measurement intensity profile is used to calculate a measurement of the property of the structure. The optical system may include a solid immersion lens. In a method, the optical system is controlled to obtain a first intensity profile using a first illumination profile and a second intensity profile using a second illumination profile. The profiles are used to derive a correction for mitigating the effect of, e.g., ghost reflections. Using, e.g., half-moon illumination profiles in different orientations, the method can measure ghost reflections even where a solid immersion lens would cause total internal reflection. The optical system may include a contaminant detection system to control a movement based on received scattered detection radiation. The optical system may include an optical component having a dielectric coating to enhance evanescent wave interaction.Type: ApplicationFiled: August 21, 2017Publication date: July 11, 2019Applicant: ASML NETHERLANDS B.V.Inventors: Nitish KUMAR, Adrianus Johannes Hendrikus SCHELLEKENS, Sietse Thijmen VAN DER POST, Ferry ZIJP, Willem Maria Julia Marcel COENE, Peter Danny VAN VOORST, Duygu AKBULUT, Sarathi ROY
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Publication number: 20190212655Abstract: A method involving a radiation intensity distribution for a target measured using an optical component at a gap from the target, the method including: determining a value of a parameter of interest using the measured radiation intensity distribution and a mathematical model describing the target, the model including an effective medium approximation for roughness of a surface of the optical component or a part thereof.Type: ApplicationFiled: February 19, 2019Publication date: July 11, 2019Applicant: ASML Netherlands B.V.Inventors: Sietse Thijmen VAN DER POST, Ferry ZIJP, Sander Bas ROOBOL
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Patent number: 10248029Abstract: A method involving a radiation intensity distribution for a target measured using an optical component at a gap from the target, the method including: determining a value of a parameter of interest using the measured radiation intensity distribution and a mathematical model describing the target, the model including an effective medium approximation for roughness of a surface of the optical component or a part thereof.Type: GrantFiled: July 5, 2016Date of Patent: April 2, 2019Assignee: ASML Netherlands B.V.Inventors: Sietse Thijmen Van Der Post, Ferry Zijp, Sander Bas Roobol
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Publication number: 20190072853Abstract: An optical system (OS) for focusing a beam of radiation (B) on a region of interest in a metrology apparatus is described. The beam of radiation (B) comprises radiation in a soft X-ray or Extreme Ultraviolet spectral range. The optical system (OS) comprises a first stage (S1) for focusing the beam of radiation at an intermediate focus region. The optical system (OS) comprises a second stage (S2) for focusing the beam of radiation from the intermediate focus region onto the region of interest. The first and second stages each comprise a Kirkpatrick-Baez reflector combination. At least one reflector comprises an aberration-correcting reflector.Type: ApplicationFiled: August 30, 2018Publication date: March 7, 2019Applicant: ASML Netherlands B.V.Inventors: Sietse Thijmen VAN DER POST, Stefan Michael Bruno BÄUMER, Peter Danny VAN VOORST, Teunis Willem TUKKER, Ferry ZIJP, Han-Kwang NIENHUYS, Jacobus Maria Antonius VAN DEN EERENBEEMD