Abstract: In at least some embodiments, a semiconductor device structure comprises a first surface comprising a source and a gate; a second surface comprising a drain; a substrate of a first type, wherein the substrate is in contact with the drain; a first column in contact with the substrate and the first surface of the device, the first column comprising a dielectric material; and a mirroring axis, wherein a centerline of the first column is disposed along the mirroring axis, forming a first device side and a second device side, wherein the first device side mirrors the second device side.

Abstract: In at least some embodiments, a semiconductor device structure comprises a first surface comprising a source and a gate; a second surface comprising a drain; a substrate of a first type, wherein the substrate is in contact with the drain; a first column in contact with the substrate and the first surface of the device, the first column comprising a dielectric material; and a mirroring axis, wherein a centerline of the first column is disposed along the mirroring axis, forming a first device side and a second device side, wherein the first device side mirrors the second device side.

Abstract: A method and apparatus for switched mode power supply (SMPS) system includes circuitry configured to produce a voltage output based on an input voltage, the SMPS circuitry includes inductive, capacitive and switching elements configured to generate the voltage output. The switching elements include at least one set of cascode coupled devices, each set of cascode coupled devices including a high electron mobility transistor (HEMT) and one of a diode and a field effect transistor (FET) in a cascode coupling. A controller produces a signal to a gate terminal of the FET of the sets of cascode coupled devices to drive the HEMT switching rate to adjust the output voltage. The circuitry of the SMPS further includes circuitry to couple the substrate of at least one HEMT to a high voltage node of the SMPS system to reduce large voltage spikes or dv/dts.

Abstract: A semiconductor device includes a semiconductor substrate defining a major surface. The device further includes a first region including at least a first pillar of a first conductivity type extending in a vertical orientation with respect to the major surface. The device further includes a second region of the first conductivity type. The first pillar includes a higher doping concentration than the second region. The device further includes a Schottky contact coupled to the second region.

Abstract: A method and apparatus for switched mode power supply (SMPS) system includes circuitry configured to produce a voltage output based on an input voltage, the SMPS circuitry includes inductive, capacitive and switching elements configured to generate the voltage output. The switching elements include at least one set of cascode coupled devices, each set of cascode coupled devices including a high electron mobility transistor (HEMT) and one of a diode and a field effect transistor (FET) in a cascode coupling. A controller produces a signal to a gate terminal of the FET of the sets of cascode coupled devices to drive the HEMT switching rate to adjust the output voltage. The circuitry of the SMPS further includes circuitry to couple the substrate of at least one HEMT to a high voltage node of the SMPS system to reduce large voltage spikes or dv/dts.

Abstract: A semiconductor device includes a semiconductor substrate defining a major surface. The device further includes a first region including at least a first pillar of a first conductivity type extending in a vertical orientation with respect to the major surface. The device further includes a second region of the first conductivity type. The first pillar includes a higher doping concentration than the second region. The device further includes a Schottky contact coupled to the second region.

Abstract: An electronic device can include a switch coupled to a switching node. In an embodiment, the switch has a breakdown voltage is less than 2.0 times the designed operating voltage. In another embodiment, the electronic device can further include another switch, wherein both switches are coupled to each other at a switching node. The switches can have different breakdown voltages. In a particular embodiment, either or both switches can include a field-effect transistor and a zener diode that are connected in parallel. The zener diode can be designed to breakdown at a relatively lower fraction of the designed operating voltage as compared to a conventional device. Embodiments can be used to reduce voltage overshoot and ringing at the switching node that may occur after changing the states of the first and second switches. Processes of forming the electronic device can be implemented without significant complexity.

Abstract: An electronic device can include a switch coupled to a switching node. In an embodiment, the switch has a breakdown voltage is less than 2.0 times the designed operating voltage. In another embodiment, the electronic device can further include another switch, wherein both switches are coupled to each other at a switching node. The switches can have different breakdown voltages. In a particular embodiment, either or both switches can include a field-effect transistor and a zener diode that are connected in parallel. The zener diode can be designed to breakdown at a relatively lower fraction of the designed operating voltage as compared to a conventional device. Embodiments can be used to reduce voltage overshoot and ringing at the switching node that may occur after changing the states of the first and second switches. Processes of forming the electronic device can be implemented without significant complexity.

Abstract: At least one exemplary embodiment is directed to a semiconductor power switching device including a ctrl switch, a sync switch, where a resistor is electrically connected between the ctrl switch and the sync switch.

Abstract: At least one exemplary embodiment is directed to a semiconductor power switching device including a ctrl switch, a sync switch, where a resistor is electrically connected between the ctrl switch and the sync switch.

Abstract: A integrated semiconductor device has a first semiconductor layer of a first conductivity type, a second semiconductor layer of the first conductivity type over the first layer, a third semiconductor layer of a second conductivity type over the second layer, an isolation trench extending through the entire depth of the second and third layers into the first layer, and a first region of the second conductivity type located next to the isolation trench and extending from an interface between the second and third layers, along an interface between the second layer and the isolation trench. This first region can help reduce a concentration of field lines where the isolation trench meets the interface of the second and third layers, and hence provide a better reverse breakdown characteristic.

Abstract: The present invention provides a semiconductor device (20) comprising a trench (5) formed in a semiconductor substrate formed of a stack (4) of layers (1,2,3), a layer (6) of a first, grown dielectric material covering sidewalls and bottom of the trench (5), the layer (6) including one or more notches (13) at the bottom of the trench (5) and one or more spacers (14) formed of a second, deposited dielectric material to fill the one or more notches (13) in the layer (6) formed of the first, grown dielectric material. The semiconductor device (20) according to the present invention shows improved breakdown voltage and on-resistance. The present invention furthermore provides a method for the manufacturing of such semiconductor devices (20).

Abstract: A integrated semiconductor device has a first semiconductor layer of a first conductivity type, a second semiconductor layer of the first conductivity type over the first layer, a third semiconductor layer of a second conductivity type over the second layer, an isolation trench extending through the entire depth of the second and third layers into the first layer, and a first region of the second conductivity type located next to the isolation trench and extending from an interface between the second and third layers, along an interface between the second layer and the isolation trench. This first region can help reduce a concentration of field lines where the isolation trench meets the interface of the second and third layers, and hence provide a better reverse breakdown characteristic.

Abstract: The present invention provides a semiconductor device (20) comprising a trench (5) formed in a semiconductor substrate formed of a stack (4) of layers (1,2,3), a layer (6) of a first, grown dielectric material covering sidewalls and bottom of the trench (5), the layer (6) including one or more notches (13) at the bottom of the trench (5) and one or more spacers (14) formed of a second, deposited dielectric material to fill the one or more notches (13) in the layer (6) formed of the first, grown dielectric material. The semiconductor device (20) according to the present invention shows improved breakdown voltage and on-resistance. The present invention furthermore provides a method for the manufacturing of such semiconductor devices (20).