Abstract: It is disclosed a device for multipole phase division multiplexing and demultiplexing and a spatial division telecommunications system comprising the multiplexing and demultiplexing devices. The multipole phase demultiplexing device comprises a cascade of a beam transformer and a phase corrector, wherein the beam transformer performs a circular-sector transformation of a plurality of multipole phase electromagnetic beams. The multipole phase multiplexing device comprises a cascade of a beam transformer and a phase corrector, wherein the beam transformer performs a combination of |m | circular-sector transformations of a plurality of tilted electromagnetic beams.

Abstract: A mode division demultiplexing optical communication system comprises a multimode optical fiber, an optical device for demultiplexing modes with a different orbital angular momentum and a diffractive optical element. The optical fiber is configured to: receive at the input a first optical signal carried by a first guided mode having an orbital angular momentum, generate at the output the first optical signal carried by a first group of guided modes. The optical demultiplexing device is configured to: receive at the input a free space optical beam, generate at the output a first pair of free space optical beams. The diffractive optical element is configured to: receive at the input the first pair of free space optical beams and generate therefrom at the output a first pair of collimated optical beams, converge the first pair of collimated optical beams into a same first point in the space.

Abstract: A device for secure short-range point-to-point radiocommunication, comprising: first transceiver apparatus for transmission and/or reception of a first EM beam with a non-zero Orbital Angular Momentum OAM value (l10); additional transceiver apparatus for transmission and/or reception of at least one additional EM beam which is co-polar and isofrequential with the first beam that can be generated by the first apparatus and with value (l20; l30) of the topological charge of the OAM different from the OAM topological charge value (l10) of the beam transmittable and/or receivable by the first transceiver apparatus; a first and a second data channel being associated with a respective carrier comprising said first and said at least second EM beam, respectively, thereby forming a high-security physical substrate preventing interception of the radiocommunication information content; wherein the device is included: in a security card, or in a reader device for a security card, or in a portable multimedia device, or in

Abstract: A method and a system for the enhancement of the sensitivity in surface plasmon resonance (SPR) sensors based metallic grating by exploiting the conical configuration is presented. We consider the propagation of surface plasmon polaritons (SPPs) excited by light from the visible to infrared spectrum range, incident on a plasmonic grating at different directions by varying both the zenith and azimuthal angles. For specific azimuthal angles, SPPs propagate in the grating plane perpendicular to the incident light momentum. This is the condition that allows increasing the number of different excited SPPs modes largely. We exploit this effect to increase the sensor sensitivity with the change of refractive index of thin film on the plasmonic grating surface. Polarization effects also contribute to a further modes enhancement and increase the sensitivity. A scheme for a lab-on-chip implementation of a system that allows a parallel detection in microfluidic channels has been shown.

Abstract: A method and a system for the enhancement of the sensitivity in surface plasmon resonance (SPR) sensors based metallic grating by exploiting the conical configuration is presented. We consider the propagation of surface plasmon polaritons (SPPs) excited by light from the visible to infrared spectrum range, incident on a plasmonic grating at different directions by varying both the zenith and azimuthal angles. For specific azimuthal angles, SPPs propagate in the grating plane perpendicular to the incident light momentum. This is the condition that allows increasing the number of different excited SPPs modes largely. We exploit this effect to increase the sensor sensitivity with the change of refractive index of thin film on the plasmonic grating surface. Polarization effects also contribute to a further modes enhancement and increase the sensitivity. A scheme for a lab-on-chip implementation of a system that allows a parallel detection in microfluidic channels has been shown.

Abstract: What is described is a lithographic method for fabricating three-dimensional structures on the micrometric and submicro-metric scale, including the operations of: depositing a layer of a first resist on a substrate; depositing a layer of a second resist on the layer of the first resist; forming a pattern of the second resist by lithography; depositing a further layer of the first resist on the previous layers; and forming a pattern of the first resist by lithography. The second resist is sensitive to exposure to charged particles or to electromagnetic radiation in a different way from the first; in other words, it is transparent to the particles or to the electromagnetic radiation to which the first resist is sensitive, and therefore the processes of exposure and development of the two resists are mutually incompatible to the extent that the exposure and development of one does not interfere with the exposure and development of the other.

Abstract: What is described is a lithographic method for fabricating three-dimensional structures on the micrometric and submicro-metric scale, including the operations of: depositing a layer of a first resist on a substrate; depositing a layer of a second resist on the layer of the first resist; forming a pattern of the second resist by lithography; depositing a further layer of the first resist on the previous layers; and forming a pattern of the first resist by lithography. The second resist is sensitive to exposure to charged particles or to electromagnetic radiation in a different way from the first; in other words, it is transparent to the particles or to the electromagnetic radiation to which the first resist is sensitive, and therefore the processes of exposure and development of the two resists are mutually incompatible to the extent that the exposure and development of one does not interfere with the exposure and development of the other.