Patents by Inventor FLASHSILICON, INC.

FLASHSILICON, INC. has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20130224917
    Abstract: Dual Conducting Floating Spacer Metal Oxide Semiconductor Field Effect Transistors (DCFS MOSFETs) and methods for fabricate them using a process that is compatible with forming conventional MOSFETs are disclosed. A DCFS MOSFET can provide multi-bit storage in a single Non-Volatile Memory (NVM) memory cell. Like a typical MOSFET, a DCFS MOSFET includes a control gate electrode on top of a gate dielectric-silicon substrate, thereby forming a main channel of the device. Two electrically isolated conductor spacers are provided on both sides of the control gate and partially overlap two source/drain diffusion areas, which are doped to an opposite type to the conductivity type of the substrate semiconductor. The DCFS MOSFET becomes conducting when a voltage that exceeds a threshold is applied at the control gate and is coupled through the corresponding conducting floating spacer to generate an electrical field strong enough to invert the carriers near the source junction.
    Type: Application
    Filed: March 18, 2013
    Publication date: August 29, 2013
    Applicant: FLASHSILICON, INC.
    Inventor: FLASHSILICON, INC.