Patents by Inventor Floor Lodewijk KEUKENS
Floor Lodewijk KEUKENS has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11860546Abstract: A fluid handling structure for a lithographic apparatus, the structure having: an aperture for the passage therethrough of a beam; a first part; and a second part, wherein the first and/or second part define a surface for the extraction of immersion fluid, relative movement between the first and second parts is effective to change a position of fluid flow into or out of the surface relative to the aperture, and the first or second part has at least one through-hole for the fluid flow and the other of the first or second part has at least one opening for the fluid flow, the at least one through-hole and at least one opening being in fluid communication when aligned, the relative movement allowing alignment of the at least one opening with different ones of the through-hole to change the position of the fluid flow into or out of the surface.Type: GrantFiled: September 23, 2022Date of Patent: January 2, 2024Assignee: ASML NETHERLANDS B.V.Inventors: Pepijn Van Den Eijnden, Cornelius Maria Rops, Theodorus Wilhelmus Polet, Floor Lodewijk Keukens, Gheorghe Tanasa, Rogier Hendrikus Magdalena Cortie, Koen Cuypers, Harold Sebastiaan Buddenberg, Giovanni Luca Gattobigio, Evert Van Vliet, Nicolaas Ten Kate, Mark Johannes Hermanus Frencken, Jantien Laura Van Erve, Marcel Maria Cornelius Franciscus Teunissen
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Publication number: 20230053840Abstract: A fluid handling structure for a lithographic apparatus, the structure having: an aperture for the passage therethrough of a beam; a first part; and a second part, wherein the first and/or second part define a surface for the extraction of immersion fluid, relative movement between the first and second parts is effective to change a position of fluid flow into or out of the surface relative to the aperture, and the first or second part has at least one through-hole for the fluid flow and the other of the first or second part has at least one opening for the fluid flow, the at least one through-hole and at least one opening being in fluid communication when aligned, the relative movement allowing alignment of the at least one opening with different ones of the through-hole to change the position of the fluid flow into or out of the surface.Type: ApplicationFiled: September 23, 2022Publication date: February 23, 2023Applicant: ASML NETHERLANDS B.V.Inventors: Pepijn VAN DEN EIJNDEN, Cornelius Maria ROPS, Theodorus Wilhelmus POLET, Floor Lodewijk KEUKENS, Gheorghe TANASA, Rogier Hendrikus Magdalena CORTIE, Koen CUYPERS, Harold Sebastiaan BUDDENBERG, Giovanni Luca GATTOBIGIO, Evert VAN VLIET, Nicolaas TEN KATE, Mark Johannes Hermanus FRENCKEN, Jantien Laura VAN ERVE, Marcel Maria Cornelius Franciscus TEUNISSEN
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Patent number: 11454892Abstract: A fluid handling structure for a lithographic apparatus, the structure having: an aperture for the passage therethrough of a beam; a first part; and a second part, wherein the first and/or second part define a surface for the extraction of immersion fluid, relative movement between the first and second parts is effective to change a position of fluid flow into or out of the surface relative to the aperture, and the first or second part has at least one through-hole for the fluid flow and the other of the first or second part has at least one opening for the fluid flow, the at least one through-hole and at least one opening being in fluid communication when aligned, the relative movement allowing alignment of the at least one opening with different ones of the through-hole to change the position of the fluid flow into or out of the surface.Type: GrantFiled: May 10, 2021Date of Patent: September 27, 2022Assignee: ASML NETHERLANDS B.V.Inventors: Pepijn Van Den Eijnden, Cornelius Maria Rops, Theodorus Wilhelmus Polet, Floor Lodewijk Keukens, Gheorghe Tanasa, Rogier Hendrikus Magdalena Cortie, Koen Cuypers, Harold Sebastiaan Buddenberg, Giovanni Luca Gattobigio, Evert Van Vliet, Nicolaas Ten Kate, Mark Johannes Hermanus Frencken, Jantien Laura Van Erve, Marcel Maria Cornelius Franciscus Teunissen
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Publication number: 20210263424Abstract: A fluid handling structure for a lithographic apparatus, the structure having: an aperture for the passage therethrough of a beam; a first part; and a second part, wherein the first and/or second part define a surface for the extraction of immersion fluid, relative movement between the first and second parts is effective to change a position of fluid flow into or out of the surface relative to the aperture, and the first or second part has at least one through-hole for the fluid flow and the other of the first or second part has at least one opening for the fluid flow, the at least one through-hole and at least one opening being in fluid communication when aligned, the relative movement allowing alignment of the at least one opening with different ones of the through-hole to change the position of the fluid flow into or out of the surface.Type: ApplicationFiled: May 10, 2021Publication date: August 26, 2021Applicant: ASML NETHERLANDS B.V.Inventors: Pepijn VAN DEN EIJNDEN, Cornelius Maria ROPS, Theodorus Wilhelmus POLET, Floor Lodewijk KEUKENS, Gheorghe TANASA, Rogier Hendrikus Magdalena CORTIE, Koen CUYPERS, Harold Sebastiaan BUDDENBERG, Giovanni Luca GATTOBIGIO, Evert VAN VLIET, Nicolaas TEN KATE, Mark Johannes Hermanus FRENCKEN, Jantien Laura VAN ERVE, Marcel Maria Cornelius Franciscus TEUNISSEN
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Patent number: 11029607Abstract: A fluid handling structure for a lithographic apparatus, the structure having: an aperture for the passage therethrough of a beam; a first part; and a second part, wherein the first and/or second part define a surface for the extraction of immersion fluid, relative movement between the first and second parts is effective to change a position of fluid flow into or out of the surface relative to the aperture, and the first or second part has at least one through-hole for the fluid flow and the other of the first or second part has at least one opening for the fluid flow, the at least one through-hole and at least one opening being in fluid communication when aligned, the relative movement allowing alignment of the at least one opening with different ones of the through-hole to change the position of the fluid flow into or out of the surface.Type: GrantFiled: August 28, 2017Date of Patent: June 8, 2021Assignee: ASML NETHERLANDS B.V.Inventors: Pepijn Van Den Eijnden, Cornelius Maria Rops, Theodorus Wilhelmus Polet, Floor Lodewijk Keukens, Gheorghe Tanasa, Rogier Hendrikus Magdalena Cortie, Koen Cuypers, Harold Sebastiaan Buddenberg, Giovanni Luca Gattobigio, Evert Van Vliet, Nicolaas Ten Kate, Mark Johannes Hermanus Frencken, Jantien Laura Van Erve, Marcel Maria Cornelius Franciscus Teunissen
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Publication number: 20200409270Abstract: A fluid handling structure for a lithographic apparatus, the structure having: an aperture for the passage therethrough of a beam; a first part; and a second part, wherein the first and/or second part define a surface for the extraction of immersion fluid, relative movement between the first and second parts is effective to change a position of fluid flow into or out of the surface relative to the aperture, and the first or second part has at least one through-hole for the fluid flow and the other of the first or second part has at least one opening for the fluid flow, the at least one through-hole and at least one opening being in fluid communication when aligned, the relative movement allowing alignment of the at least one opening with different ones of the through-hole to change the position of the fluid flow into or out of the surface.Type: ApplicationFiled: August 28, 2017Publication date: December 31, 2020Applicant: ASML NETHERLANDS B.V.Inventors: Pepijn VAN DEN EIJNDEN, Cornelius Maria ROPS, Theodorus Wilhelmus POLET, Floor Lodewijk KEUKENS, Gheorghe TANASA, Rogier Hendrikus Magdalen CORTIE, Koen CUYPERS, Harold Sebastiaan BUDDENBERG, Giovanni Luca GATTOBIGIO, Evert VAN VLIET, Nicolaas TEN KATE, Mark Johannes Hermanus FRENCKEN, Jantien Laura VAN ERVE, Marcel Maria Cornelius Franciscu TEUNISSEN
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Patent number: 10725390Abstract: An inspection substrate for inspecting a component, such as a liquid confinement system, of an apparatus for processing production substrates is discussed. The inspection substrate includes a body having dimensions similar to a production substrate so that the inspection substrate is compatible with the apparatus, an illumination device, such as light emitting diodes, embedded in the body, a sensor, such as an imaging device or a pressure sensor, that is embedded in the body and configured to generate inspection information, such as image data, relating to a parameter of the component of the apparatus proximate to the inspection substrate, and a storage device embedded in the body and configured to store the inspection information.Type: GrantFiled: January 16, 2019Date of Patent: July 28, 2020Assignee: ASML Netherlands B.V.Inventors: Seerwan Saeed, Petrus Martinus Gerardus Johannes Arts, Harold Sebastiaan Buddenberg, Erik Henricus Egidius Catharina Eummelen, Giovanni Luca Gattobigio, Floor Lodewijk Keukens, Ferdy Migchelbrink, Jeroen Arnoldus Leonardus Johannes Raaymakers, Arnoldus Johannes Martinus Jozeph Ras, Gheorghe Tanasa, Jimmy Matheus Wilhelmus Van De Winkel, Daan Daniel Johannes Antonius Van Sommeren, Marijn Wouters, Miao Yu
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Publication number: 20190146352Abstract: An inspection substrate for inspecting a component, such as a liquid confinement system, of an apparatus for processing production substrates is discussed. The inspection substrate includes a body having dimensions similar to a production substrate so that the inspection substrate is compatible with the apparatus, an illumination device, such as light emitting diodes, embedded in the body, a sensor, such as an imaging device or a pressure sensor, that is embedded in the body and configured to generate inspection information, such as image data, relating to a parameter of the component of the apparatus proximate to the inspection substrate, and a storage device embedded in the body and configured to store the inspection information.Type: ApplicationFiled: January 16, 2019Publication date: May 16, 2019Applicant: ASML Netherlands B.V.Inventors: Seerwan Saeed, Petrus Martinus Gerardus Johannes Arts, Harold Sebastiaan Buddenberg, Erik Henricus Egidius Catharina Eummelen, Giovanni Luca Gattobigio, Floor Lodewijk Keukens, Ferdy Migchelbrink, Jeroen Arnoldus Leonardus Johannes Raaymakers, Arnoldus Johannes Martinus Jozeph Ras, Gheorghe Tanasa, Jimmy Matheus Wilhelmus Van De Winkel, Daan Daniel Johannes Antonius Van Sommeren, Marijn Wouters, Miao Yu
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Patent number: 10216100Abstract: An inspection substrate for inspecting a component, such as a liquid confinement system, of an apparatus for processing production substrates is discussed. The inspection substrate includes a body having dimensions similar to a production substrate so that the inspection substrate is compatible with the apparatus, an illumination device, such as light emitting diodes, embedded in the body, a sensor, such as an imaging device or a pressure sensor, that is embedded in the body and configured to generate inspection information, such as image data, relating to a parameter of the component of the apparatus proximate to the inspection substrate, and a storage device embedded in the body and configured to store the inspection information.Type: GrantFiled: June 16, 2016Date of Patent: February 26, 2019Assignee: ASML Netherlands B.V.Inventors: Seerwan Saeed, Petrus Martinus Gerardus Johannes Arts, Harold Sebastiaan Buddenberg, Erik Henricus Egidius Catharina Eummelen, Giovanni Luca Gattobigio, Floor Lodewijk Keukens, Ferdy Migchelbrink, Jeroen Arnoldus Leonardus Johannes Raaymakers, Arnoldus Johannes Martinus Jozeph Ras, Gheorghe Tanasa, Jimmy Matheus Wilhelmus Van De Winkel, Daan Daniel Johannes Antonius Van Sommeren, Marijn Wouters, Miao Yu
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Publication number: 20180181004Abstract: An inspection substrate for inspecting a component, e.g. a liquid confinement system, of an apparatus for processing production substrates, e.g. a lithographic apparatus, the inspection substrate comprising: a body having dimensions similar to a production substrate so that the inspection substrate is compatible with the apparatus; an illumination device, e.g. light emitting diodes, embedded in the body; a sensor, e.g. an imaging device or a pressure sensor, for generating inspection information relating to a parameter of a component of the apparatus proximate to the inspection substrate, the sensor embedded in the body; and a storage device embedded in the body, the storage device configured to store the inspection information, e.g. image data.Type: ApplicationFiled: June 16, 2016Publication date: June 28, 2018Applicant: ASML Netherlands B.V.Inventors: Seerwan SAEED, Petrus Martinus Gerardus Johannes ARTS, Harold Sebastiaan BUDDENBERG, Erik Henricus Egidius Catharina EUMMELEN, Giovanni Luca GATTOBIGIO, Floor Lodewijk KEUKENS, Ferdy MIGCHELBRINK, Jeroen Arnoldus Leonardus Johanne RAAYMAKERS, Arnoldus Johannes Martinus Jozeph RAS, Gheorghe TANASA, Jimmy Matheus Wilhelmus VAN DE WINKEL, Daan Daniel Johannes Antonius VAN SOMMEREN, Marijn WOUTERS, Miao YU