Abstract: The present invention is directed to an ultra-thick high strength aluminum alloy, comprising 7.5 to 8.4 wt. % Zn, 1.6 to 2.3 wt. % Mg, 1.4 to 2.1 wt. % Cu, and 0.05 to 0.15 wt. % Zr. This alloy can be fabricated to produce 2-10 inch thick plate, extrusion or forging products, and is especially suitable for aerospace structural components, especially large commercial airplane wing structure applications. The aluminum product has a minimum yield strength of [75 ksi?0.8×(thickness in inch?3.94 inch)] in LT direction and [76 ksi?0.8×(thickness in inch?3.94 inch)] in L direction for more than 2 inch thick product in T7651 temper. Besides strength, product provides necessary damage tolerance performance as well as corrosion resistance performance suitable for aerospace application.

Abstract: A sputtering target is described herein, which includes: a) a surface material, and b) a core material coupled to the surface material, wherein at least one of the surface material or the core material has less than 100 ppm defect volume. Methods for producing sputtering targets are described that include: a) providing at least one sputtering target material, b) melting the at least one sputtering target material to provide a molten material, c) degassing the molten material, d) pouring the molten material into a target mold. In some embodiments, pouring the molten material into a target mold comprises under-pouring or under-skimming the molten material from the crucible into the target mold. Sputtering targets and related apparatus formed by and utilizing these methods are also described herein. In addition, uses of these sputtering targets are described herein.