Patents by Inventor Florence Duclairoir

Florence Duclairoir has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20180331350
    Abstract: Disclosed is a process of manufacturing a chemically reduced graphene oxide/silicon nanowire composite. The formation of the three-dimensional monolith and the chemical reduction of graphene oxide by a reducing agent selected from hydrazine hydrate, ethylene diamine and 1,4-diaminebutane are in one step. Also disclosed is a chemically reduced graphene oxide/silicon nanowire composite that can be obtained by the disclosed process. The composite is a three-dimensional monolith in which the two components are covalently linked each other, having a high degree of reduction with a C/O ratio of 1-50, preferably from 10 to 25, more preferably 16.7, having a porous structure and a high specific surface area of 50-5,000 m2/g, preferably 800-2,500 m2/g, more preferably 1,433 m2/g and having a low resistance to charge transfer from 0.1 to 5 ?, preferably from 0.3 to 1.5 ?. Also disclosed is a lithium-ion battery or a supercapacitor including the composite (or monolith).
    Type: Application
    Filed: May 10, 2018
    Publication date: November 15, 2018
    Inventors: Pascal GENTILE, Harish BANDA, Florence DUCLAIROIR
  • Patent number: 7919046
    Abstract: The invention concerns a method for grafting molecules of interest on a silicon substrate via a spacer compound, said grafting including at least one click chemistry reaction to the supports thus obtained as well as their uses in nanotechnologies and nanobiotechnologies, such as molecular electronics, the manufacture of biochips or of sensors.
    Type: Grant
    Filed: October 25, 2006
    Date of Patent: April 5, 2011
    Assignee: Commissariat a l'Energie Atomique
    Inventors: Guillaume Delapierre, Florence Duclairoir, Jean-Claude Marchon
  • Publication number: 20090188602
    Abstract: The invention concerns a method for grafting molecules of interest on a silicon substrate via a spacer compound, said grafting including at least one click chemistry reaction to the supports thus obtained as well as their uses in nanotechnologies and nanobiotechnologies, such as molecular electronics, the manufacture of biochips or of sensors.
    Type: Application
    Filed: October 25, 2006
    Publication date: July 30, 2009
    Applicant: COMMISSARIAT A L'ENERGIE ATOMIQUE
    Inventors: Guillaume Delapierre, Florence Duclairoir, Jean-Claude Marchon