Abstract: A method for controlling a vehicle system of a vehicle which is equipped to carry out an automated driving operation involves localizing the vehicle and approving the vehicle system for activation depending on a result of the localization. The vehicle is localized with at least two different localization methods. The at least two localization methods include at least one landmark-based localization method and one localization method based on at least one global navigation satellite system. The vehicle system is only approved for activation if it is confirmed with each of the applied localization methods that the vehicle is located on a route section approved for automated driving operation.

Abstract: A method for determining the position of a vehicle involves determining a plurality of position hypotheses by comparing landmark objects detected by a sensor system of the vehicle with landmark objects stored in a map, in particular in a map section. By analyzing all position hypotheses and filtering out all false information using probabilistic analysis, a position hypothesis with an integrity value is determined. A position hypothesis with a position accuracy sufficient in a predetermined way for determining the position of the vehicle is determined by filtering according to predetermined limit values.

Abstract: A method for determining measured values using at least two different measuring methods involves, with each of the measuring methods, determining provisional measured values and suppling data for an integrity of the determined provisional measured values. The determined provisional measured values are merged to give combined measured values and information on the integrity of the combined measured values is determined. Depending on the data concerning the integrity of the determined provisional measured values and the combined measured values and depending on a period of time during which the determined provisional measured values and the combined measured values in each case meet specified requirements regarding their integrity, it is decided which of the measured values are supplied for further processing.

Abstract: A method for landmark-based localization of a vehicle involves forming a plurality of position hypotheses for a vehicle position based on a forming of associations between sensor landmark objects detected by sensor and map landmark objects stored in a digital map. A most likely vehicle position is ascertained as the localization result on the basis of a probabilistic filtering of the position hypotheses, and a guaranteed position area is ascertained, in which a predefined error upper limit is not exceeded. This is performed several times with different set-ups of the probabilistic filtering. The localization result with the smallest guaranteed position area is selected as vehicle position if the guaranteed position areas overlap fully in pairs.

Abstract: An apparatus for processing a flexible substrate is provided including a vacuum chamber having a first chamber portion, second chamber portion and third chamber portion. The apparatus further includes an unwinding shaft supporting the flexible substrate to be processed and a winding shaft supporting the flexible substrate after processing, wherein the unwinding shaft and the winding shaft are disposed in the first chamber portion, a first wall separating the first chamber portion from the second chamber portion, wherein the first wall is inclined with respect to a vertical and horizontal orientation, a coating drum having a first portion disposed in the second chamber portion and a second portion disposed in the third chamber portion, and a plurality of processing stations disposed at least partially in the third chamber portion, wherein a majority of the plurality of the processing stations are disposed below a rotational axis of the coating drum.

Abstract: A vacuum processing system for a flexible substrate is provided. The processing system includes a first chamber adapted for housing one of a supply roll for providing the flexible substrate and a take-up roll for storing the flexible substrate; a second chamber adapted for housing one of a supply roll for providing the flexible substrate and a take-up roll for storing the flexible substrate; a maintenance zone between the first chamber and the second chamber; and a first process chamber for depositing material on the flexible substrate, wherein the second chamber is provided between the maintenance zone and the first process chamber. The maintenance zone allows for maintenance access to at least one of the first chamber and the second chamber.

Abstract: An apparatus includes a substrate support having an outer surface for guiding the substrate through a first vacuum processing region and at least one second vacuum processing region. First and second deposition sources correspond to the first processing region and at least one second deposition source corresponds to the at least one second vacuum processing region, wherein at least the first deposition source includes an electrode having a surface that opposes the substrate support. A processing gas inlet and a processing gas outlet are arranged at opposing sides of the surface of the electrode. At least one separation gas inlet how one or more openings, wherein the one or more openings are at least provided at one of opposing sides of the electrode surface such that the processing gas inlet and/or the processing gas outlet are provided between the one or more openings and the surface of the electrode.

Abstract: According to the present disclosure, a method for cleaning the processing chamber of a flexible substrate processing apparatus without breaking the vacuum in the processing chamber is provided. The method for cleaning the processing chamber includes guiding a sacrificial foil into the processing chamber; initiating a first pump process in the processing chamber; plasma cleaning the processing chamber while the sacrificial foil is provided in the processing chamber; initiating a second pump process in the processing chamber; and guiding a flexible substrate into the processing chamber.

Abstract: A processing apparatus for processing a flexible substrate, particularly a vacuum processing apparatus for processing a flexible substrate, is described. The processing apparatus includes a vacuum chamber; a processing drum within the vacuum chamber, wherein the processing drum is configured to rotate around an axis extending in a first direction; and a heating device adjacent to the processing drum, wherein the heating device is configured for spreading the substrate in the first direction or for maintaining a spread of the substrate in the first direction, and wherein the heating device has a dimension in a direction parallel to a substrate transport direction of at least 20 mm.

Abstract: A deposition system for alkali and alkaline earth metals may include a metal sputter target including cooling channels, a substrate holder configured to hold a substrate facing and parallel to the metal sputter target, and multiple power sources configured to apply energy to a plasma ignited between the substrate and the metal sputter target. The target may have a cover configured to fit over the target material, the cover may include a handle for automated removal and replacement of the cover within the deposition system, and a valve for providing access to the volume between the target material and the cover for pumping, purging or pressurizing the gas within the volume. Sputter gas may include noble gas with an atomic weight less than that of the metal target.

Abstract: A deposition rate monitor device for monitoring the deposition rate of a vapor on a substrate is provided, including: a piezoelectric crystal monitor device including a piezoelectric crystal monitor provided in a housing, wherein the housing includes a vapor inlet aperture, and at least one elongated shielding device having a first end and a second end, the first end encompassing the vapor inlet aperture.

Abstract: The invention refers to an evaporation source for depositing of thin layers on substrates, the evaporation source comprising a vapor distribution system having an evaporation pipe made of inorganic non metallic material, with the evaporation pipe having at least one nozzle, wherein the nozzle is disposed in a nozzle element which is made as a separate component being arranged in a nozzle element opening of the evaporation pipe.

Abstract: An arrangement for the regulation of a gas stream or the like is provided, which comprises at least one vaporizer crucible for the vaporization of a material or at least one supply container with material vapor. The vaporized material or the material vapor is conducted via a vapor conduit to a substrate. The at least one vaporizer crucible or the at least one supply container is connected via a dosing pipe with the vapor conduit. A tappet projects into the dosing pipe. By means of a regulator the position of the tappet in the dosing pipe is regulated as a function of a measured variable.