Abstract: A stripping and cleaning composition for the removal of residue from metal and dielectric surfaces in the manufacture of semi-conductors and microcircuits. The composition is an aqueous system including organic polar solvents including corrosive inhibitor component from a select group of aromatic carboxylic acids used in effective inhibiting amounts. A method in accordance with this invention for the removal of residues from metal and dielectric surfaces comprises the steps of contacting the metal or dielectric surface with the above inhibited compositions for a time sufficient to remove the residues.

Abstract: There is provided corrosion inhibitors for aqueous stripping and/or cleaning compositions containing organic polar solvents. The inhibitors are aliphatic dicarboxylic acid compounds or their anhydrides. The inhibitors can be utilized in compositions which are free of oxidizing agents and in basic stripping and cleaning compositions.