Patents by Inventor Fong-Jie DU

Fong-Jie DU has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12237194
    Abstract: To provide an automated apparatus for conveying a rectangular substrate. According to one embodiment, there is provided a substrate conveying apparatus for conveying the rectangular substrate. The substrate conveying apparatus includes a plurality of conveyance rollers, a plurality of roller shafts, a motor, and a pusher. The plurality of conveyance rollers are configured to support a lower surface of the substrate. To the plurality of roller shafts, the plurality of conveyance rollers are mounted. The motor is configured to rotate the plurality of roller shafts. The pusher is for lifting the substrate on the plurality of conveyance rollers such that the substrate is separated away from the plurality of conveyance rollers. The pusher includes a stage configured to pass through a clearance between the plurality of roller shafts.
    Type: Grant
    Filed: July 9, 2019
    Date of Patent: February 25, 2025
    Assignee: EBARA CORPORATION
    Inventors: Akihiro Yazawa, Takashi Koba, Kenichi Kobayashi, Kenichi Akazawa, Fong-Jie Du, Makoto Kashiwagi, Asagi Matsugu, Takahiro Nanjo, Hideharu Aoyama, Takashi Mitsuya, Tetsuji Togawa
  • Patent number: 11331768
    Abstract: A polishing head having a simple construction and a compact size is disclosed. The polishing head includes: a polishing-tool pressing member for supporting a polishing tool; a movable shaft coupled to the polishing-tool pressing member; a housing which houses the movable shaft therein; and a diaphragm which forms a pressure chamber between an end portion of the movable shaft and the housing, the diaphragm including a central portion in contact with the end portion of the movable shaft, an inner wall portion connecting with the central portion and extending along a side surface of the movable shaft, a folded-back portion connecting with the inner wall portion and having a curved cross section, and an outer wall portion connecting with the folded-back portion and located outside the inner wall portion.
    Type: Grant
    Filed: December 17, 2018
    Date of Patent: May 17, 2022
    Assignee: EBARA CORPORATION
    Inventors: Makoto Kashiwagi, Fong-Jie Du, Manao Hoshina
  • Publication number: 20220005716
    Abstract: To provide an automated apparatus for conveying a rectangular substrate. According to one embodiment, there is provided a substrate conveying apparatus for conveying the rectangular substrate. The substrate conveying apparatus includes a plurality of conveyance rollers, a plurality of roller shafts, a motor, and a pusher. The plurality of conveyance rollers are configured to support a lower surface of the substrate. To the plurality of roller shafts, the plurality of conveyance rollers are mounted. The motor is configured to rotate the plurality of roller shafts. The pusher is for lifting the substrate on the plurality of conveyance rollers such that the substrate is separated away from the plurality of conveyance rollers. The pusher includes a stage configured to pass through a clearance between the plurality of roller shafts.
    Type: Application
    Filed: July 9, 2019
    Publication date: January 6, 2022
    Inventors: Akihiro Yazawa, Takashi Koba, Kenichi Kobayashi, Kenichi Akazawa, Fong-Jie Du, Makoto Kashiwagi, Asagi Matsugu, Takahiro Nanjo, Hideharu Aoyama, Takashi Mitsuya, Tetsuji Togawa
  • Patent number: 11180853
    Abstract: There is disclosed a substrate processing apparatus which can align a center of a substrate, such as a wafer, with a central axis of a substrate stage with high accuracy. The substrate processing apparatus includes: an eccentricity detector configured to obtain an amount of eccentricity and an eccentricity direction of a center of the substrate, when held on a centering stage, from a central axis of the centering stage; and an aligner configured to perform a centering operation of moving and rotating the centering stage until the center of the substrate on the centering stage is located on a central axis of a processing stage. The aligner is configured to calculate a distance by which the centering stage is to be moved and an angle through which the centering stage is to be rotated, based on an initial relative position of the central axis of the centering stage with respect to the central axis of the processing stage, the amount of eccentricity, and the eccentricity direction.
    Type: Grant
    Filed: September 3, 2019
    Date of Patent: November 23, 2021
    Assignee: Ebara Corporation
    Inventors: Yu Ishii, Fong-Jie Du, Makoto Kashiwagi
  • Publication number: 20190390335
    Abstract: There is disclosed a substrate processing apparatus which can align a center of a substrate, such as a wafer, with a central axis of a substrate stage with high accuracy. The substrate processing apparatus includes: an eccentricity detector configured to obtain an amount of eccentricity and an eccentricity direction of a center of the substrate, when held on a centering stage, from a central axis of the centering stage; and an aligner configured to perform a centering operation of moving and rotating the centering stage until the center of the substrate on the centering stage is located on a central axis of a processing stage. The aligner is configured to calculate a distance by which the centering stage is to be moved and an angle through which the centering stage is to be rotated, based on an initial relative position of the central axis of the centering stage with respect to the central axis of the processing stage, the amount of eccentricity, and the eccentricity direction.
    Type: Application
    Filed: September 3, 2019
    Publication date: December 26, 2019
    Applicant: Ebara Corporation
    Inventors: Yu ISHII, Fong-Jie DU, Makoto KASHIWAGI
  • Patent number: 10458020
    Abstract: There is disclosed a substrate processing apparatus which can align a center of a substrate, such as a wafer, with a central axis of a substrate stage with high accuracy. The substrate processing apparatus includes: an eccentricity detector configured to obtain an amount of eccentricity and an eccentricity direction of a center of the substrate, when held on a centering stage, from a central axis of the centering stage; and an aligner configured to perform a centering operation of moving and rotating the centering stage until the center of the substrate on the centering stage is located on a central axis of a processing stage. The aligner is configured to calculate a distance by which the centering stage is to be moved and an angle through which the centering stage is to be rotated, based on an initial relative position of the central axis of the centering stage with respect to the central axis of the processing stage, the amount of eccentricity, and the eccentricity direction.
    Type: Grant
    Filed: April 11, 2016
    Date of Patent: October 29, 2019
    Assignee: Ebara Corporation
    Inventors: Yu Ishii, Fong-Jie Du, Makoto Kashiwagi
  • Publication number: 20190184519
    Abstract: A polishing head having a simple construction and a compact size is disclosed. The polishing head includes: a polishing-tool pressing member for supporting a polishing tool; a movable shaft coupled to the polishing-tool pressing member; a housing which houses the movable shaft therein; and a diaphragm which forms a pressure chamber between an end portion of the movable shaft and the housing, the diaphragm including a central portion in contact with the end portion of the movable shaft, an inner wall portion connecting with the central portion and extending along a side surface of the movable shaft, a folded-back portion connecting with the inner wall portion and having a curved cross section, and an outer wall portion connecting with the folded-back portion and located outside the inner wall portion.
    Type: Application
    Filed: December 17, 2018
    Publication date: June 20, 2019
    Inventors: Makoto KASHIWAGI, Fong-Jie DU, Manao HOSHINA